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    • 4. 发明公开
    • Superconducting tunnel junction devices and method of making them
    • 超级隧道连接装置及其制造方法
    • EP0109166A3
    • 1986-10-01
    • EP83306047
    • 1983-10-06
    • SPERRY CORPORATION
    • Kroger, Harry
    • H01L39/22H01L39/24
    • H01L39/22Y10S505/874
    • A superconducting tunnel junction device comprises superconducting electrodes 11 and 12 separated by a tunnelling barrier 10 of semiconducting material. According to the invention the tunnelling barrier is not uniform throughout its thickness, the middle portion 14 being treated to reduce the density of localized states, whereas the portions 15 adjacent to the superconducting electrodes are of untreated semiconductor. This enables a device of improved performance to be obtained. In the preferred embodiment described in the specification the superconducting electrodes 11 and 12 are of niobium and the treated portion 14 of the barrier layer is of amorphous silicon containing hydrogen, the untreated portions 15 being of pure amorphous silicon. Various other superconducting materials for the electrodes and semiconductors for the barriers are mentioned, together with other gaseous additives. The devices may be manufactured by deposition steps in vacuum and in inert gas at low pressures.
    • 具有超导电极的超导隧道结装置具有非均匀的非晶半导体材料阻挡层,其中当在含有氢的气体气氛的情况下沉积中心区域时,其中的中心区域的局部状态的密度降低 以便使漏电流最小化,从而导致近似于理想的隧道结器件的改进的电流 - 电压特性。 低漏电流使用均匀沉积的具有铌电极的氢化硅来提高约瑟夫森逻辑电路在隧道势垒上的利润,并提高S-I-S微波和毫米波长检测器和混频器的灵敏度。 在优选实施例中,使用邻接电极的纯硅和氢化非晶硅芯,将铌的超导电极与三层阻挡层结合。 在本实施例中,与现有技术的10mV相比,获得了在4.2K下高达28mV的Vm参数(次隙电阻和临界电流的乘积)。