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    • 2. 发明公开
    • Method of making high density interconnects
    • Verfahren zur Herstellung hochintegrierter Verbindungen。
    • EP0358879A2
    • 1990-03-21
    • EP89112791.2
    • 1989-07-12
    • Hewlett-Packard Company
    • Ruby, Richard C.
    • H01L39/24H01L23/485
    • H01L21/76891H01L23/49888H01L23/49894H01L39/2464H01L39/249H01L2924/0002H01L2924/00
    • A method of making a high density interconnect with supercon­ductive lines is provided. A layer of high T c superconductive material is deposited on an electrically insulative substrate layer (32) of closely matching crystal structure. The super­conductive layer (30) is then photolithographically patterned to define part of an electrical interconnect circuit, and either selectively etched away or ion bombarded to destroy its superconductivity in noncircuit areas. Another layer (34) of insulative material is deposited over the superconductive lines thus formed, and via holes (38) are formed therein. The steps are then repeated for additional layers of supercon­ductive material and insulative material until a complete interconnect is formed. The high T c material is superconduc­tive at 77 K and has orders of magnitude less attenuation than copper at the same temperature.
    • 提供了一种用超导线制造高密度互连的方法。 一层高Tc超导材料沉积在具有非常匹配的晶体结构的电绝缘衬底层(32)上。 然后将超导层(30)光刻图案化以限定电互连电路的一部分,并且选择性蚀刻掉或离子轰击以破坏其在非电路区域中的超导性。 绝缘材料的另一层(34)沉积在如此形成的超导线上,并且在其中形成通孔(38)。 然后对另外的超导材料层和绝缘材料重复这些步骤,直到形成完整的互连。 高Tc材料在77K处是超导的,并且在相同温度下具有比铜少几个数量级的衰减。