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    • 2. 发明公开
    • Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer
    • 支撑,硬化层和含有感光卤化银的感光层
    • EP0831374A1
    • 1998-03-25
    • EP97116463.7
    • 1997-09-22
    • FUJI PHOTO FILM CO., LTD.
    • Hoshi, Satoshi, c/o Fuji Photo Film Co., Ltd.
    • G03F7/028
    • G03F7/0285
    • A silver halide light-sensitive material comprises a support, a hardening layer and a light-sensitive layer. The hardening layer contains an ethylenically unsaturated polymerizable compound and a hydrophobic polymer having an acidic group. The light-sensitive layer contains silver halide and a hydrophilic polymer. The hardening layer or the light-sensitive layer contains a reducing agent. An adhesive layer or a light-sensitive layer contains a water-soluble synthetic polymer. The adhesive layer is provided between the hardening layer and the light-sensitive layer. The water-soluble synthetic polymer comprises a repeating unit represented by the formula (I) in an amount of at least 10 mol %:
      in which each of R 1 and R 2 independently is hydrogen, an aliphatic group or an aromatic group.
    • 的卤化银感光材料包括一个支持体,硬化层和光敏层。 硬化层含有烯属不饱和可聚合化合物和具有酸性基团的疏水性聚合物。 感光层含有卤化银和亲水性聚合物。 该硬化层或光敏层含有还原剂。 粘合剂层或光敏层含有水溶性合成聚合物。 在硬化层和光敏层之间设置粘合层。 水溶性合成聚合物中的至少10摩尔%的量包含由式(I)表示的重复单元:其中各R <1>和R氢<2>unabhängig是脂族基团 或芳族基团。
    • 5. 发明公开
    • Photosensitive composition, photosensitive material and image forming method
    • 一种光敏组合物,光敏材料和成像方法。
    • EP0653680A3
    • 1995-09-27
    • EP95200232.7
    • 1989-01-27
    • CANON KABUSHIKI KAISHAORIENTAL PHOTO INDUSTRIAL CO., LTD.
    • Fukui, TetsuroKatayama, MasatoArahara, KozoFukumoto, HiroshiTakasu, YoshioKagami, KenjiMouri, AkihiroKazuo, IsakaMiura, Kyo
    • G03F7/028
    • G03F7/0285
    • 57 A photosensitive material comprises a photosensitive composition comprising a photosensitive and heat-developable element and a photopolymerizable element. An imagewise unexposed area on the material is polymerized by imagewise exposure, heating and whole areal exposure. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent. The photopolymerizable element comprises at least a polymerizable polymer precursor and a photopolymerization initiator. An image forming method comprises the steps; subjecting a photosensitive material in the same layer to imagewise exposure and heating to form an image; and subjecting the resultant photosensitive material to whole areal exposure to polymerize and imagewise unexposed or exposed area thereof. The reducing agent in the photosensitive and heat developable element is represented by formula (I), (II) or (III) below
      wherein R 1 , R 2 , R 3 , R 5 and R 6 each represent a hydrogen atom, a halogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, an alkoxy group, or a substituted or unsubstituted cycloalkyl group; R 4 represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted cycloalkyl group, a carboxyl group, or a carboxylic acid ester group; A represents an oxygen atom, or a sulfur atom; R represents a hydrogen atom, an unsubstituted alkyl group, or a substituted or unsubstituted aralkyl group; n represents 0 or 1; and Z is a divalent linking group and represents an alkylidene group, an aralkylidene group, or a sulfur atom.