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1. 发明公开

EP3387476A1 SLIDE, SET OF SLIDE AND COVER GLASS, AND MICROSCOPE SYSTEM 审中-公开
公开(公告)号：EP3387476A1
公开(公告)日：2018-10-17
申请号：EP16815976.2
申请日：2016-12-07
申请人： Canon Kabushiki Kaisha
发明人： SAKAMOTO, Michiie , HASHIGUCHI, Akinori , MASUDA, Shinobu , SAKATA, Tsuguhide , SHIMADA, Tsutomu , SAKAI, Akihiro , KATO, Kazuhiko
IPC分类号： G02B21/24 , G02B21/26 , G02B21/34 , G02B27/40
CPC分类号： G02B21/34 , G02B21/241 , G02B21/26 , G02B27/40
摘要： A slide used for observation by a microscope includes a label area configured to arrange a label, a cover glass area configured to arrange an observation object and a cover glass, a position reference mark arranged in a vacant area between the label area and the cover glass area and configured to specify a reference position of the slide and an X-axis direction and a Y-axis direction that are orthogonal to each other, and focus reference marks in which a predetermined pattern is repetitively arranged along two opposing sides of four sides of a periphery of the cover glass area, the focus reference marks being configured to specify a Z-axis direction orthogonal to the X-axis direction and the Y-axis direction.

2. 发明授权

EP3182191B1 ANORDNUNG OPTISCHER ELEMENTE ZUR FOKUSSIERUNG KOLLIMIERTER STRAHLEN 有权
公开(公告)号：EP3182191B1
公开(公告)日：2018-07-18
申请号：EP17151779.0
申请日：2016-01-25
申请人： asphericon GmbH
发明人： KIONTKE, Sven , FUCHS, Ulrike, Dr.
IPC分类号： G02B27/09 , B23K26/00 , G02B27/58 , G02B5/00
CPC分类号： G02B5/001 , B23K26/00 , B23K26/064 , B23K26/0648 , G02B3/04 , G02B27/005 , G02B27/0927 , G02B27/0972 , G02B27/40 , G02B27/58

3. 发明授权

EP2682796B1 Focusing device 有权
标题翻译：聚焦装置
公开(公告)号：EP2682796B1
公开(公告)日：2015-01-14
申请号：EP12174557.4
申请日：2012-07-02
申请人： Axis AB
发明人： Hjelmström, Jonas
IPC分类号： G02B7/02 , G02B7/04 , G02B7/08 , G02B27/40
CPC分类号： G02B7/022 , G02B7/023 , G02B7/08 , G02B27/40

4. 发明公开

EP2682796A1 Focusing device 有权
标题翻译：聚焦装置
公开(公告)号：EP2682796A1
公开(公告)日：2014-01-08
申请号：EP12174557.4
申请日：2012-07-02
申请人： Axis AB
发明人： Hjelmström, Jonas
IPC分类号： G02B7/02 , G02B7/04 , G02B7/08 , G02B27/40
CPC分类号： G02B7/022 , G02B7/023 , G02B7/08 , G02B27/40
摘要： The present invention relates to a focusing device having an operation mode, the focusing device comprising: three guiding members, a belt, and a lens arrangement comprising a threaded portion:
the three guiding members surrounding the lens arrangement,
at least one of the guiding members comprising a threaded portion,
the threaded portions of the at least one guiding member and the lens arrangement being arranged to engage with each other, wherein, when in operation mode, the belt is arranged around the three guiding members such that the three guiding members are urged towards the lens arrangement, and the at least one of the guiding members comprising a threaded portion is arranged to be rotated thus rotating the lens arrangement.
摘要翻译：具有操作模式的聚焦装置技术领域本发明涉及一种具有操作模式的聚焦装置，该聚焦装置包括：三个引导构件，带和包括螺纹部分的透镜装置：三个引导构件围绕透镜装置，至少一个引导构件包括螺纹部分，所述至少一个引导构件的所述螺纹部分和所述透镜装置被布置成彼此接合，其中，在操作模式中，所述带围绕所述三个引导构件布置，使得所述三个引导构件是被推向透镜装置，并且包括螺纹部分的至少一个引导构件被布置成旋转，从而旋转透镜装置。

5. 发明公开

EP1723463A4 AN OPTICAL SYSTEM FOR PRODUCING DIFFERENTLY FOCUSED IMAGES 审中-公开
标题翻译：光学系统，用于生成图像具有不同的侧重点
公开(公告)号：EP1723463A4
公开(公告)日：2010-07-28
申请号：EP05706244
申请日：2005-02-17
申请人： IATIA IMAGING PTY LTD
发明人： ALLMAN BRENDAN EDWARD , NUGENT KEITH , PORTER COLIN
IPC分类号： G02B27/10 , G02B5/04 , G02B27/52 , H01J37/22
CPC分类号： G02B27/145 , G02B5/04 , G02B27/1013 , G02B27/40 , H04N5/23212

6. 发明授权

EP1702325B1 METHOD FOR DETERMINING SPHERICAL ABERRATION 有权
标题翻译：法确定球面像差
公开(公告)号：EP1702325B1
公开(公告)日：2008-01-23
申请号：EP04797691.5
申请日：2004-11-06
申请人： Thomson Licensing
发明人： KNITTEL, Joachim
IPC分类号： G11B7/135 , G02B7/00
CPC分类号： G02B27/40 , G02B27/0025 , G11B7/131 , G11B7/1353 , G11B7/1392 , G11B7/1395
摘要： The present invention relates to a method and a device for determining spherical aberration occurring during reading from and/or writing to optical recording media. According to the invention, a method for determining spherical aberration includes the steps of: splitting the light beam (2) into at least two partial light beams (20, 21, 22, 23, 24, 25); focusing the partial light beams (20, 21, 22, 23, 24, 25) onto respective detectors (11, 12, 13, 16, 17, 18), whereby at least one signal (A, B, C, D) generated by the detectors (12, 13, 16, 17, 18) depends on the positions of the respective partial light beam (21, 22, 23, 24, 25); and determining the spherical aberration using the signals (A, B, C, D) generated by the detectors (12, 13, 16, 17, 18).

7. 发明公开

EP1553574A1 Method for determining spherical aberration 审中-公开
标题翻译：埃尔弗哈伦·呃Ermittlung dersphärischenAberration
公开(公告)号：EP1553574A1
公开(公告)日：2005-07-13
申请号：EP04000258.6
申请日：2004-01-08
申请人： DEUTSCHE THOMSON-BRANDT GMBH
发明人： Knittel, Joachim
IPC分类号： G11B7/135 , G02B7/00
CPC分类号： G02B27/40 , G02B27/0025 , G11B7/131 , G11B7/1353 , G11B7/1392 , G11B7/1395
摘要： The present invention relates to a method and a device for determining spherical aberration occurring during reading from and/or writing to optical recording media.
According to the invention, a method for determining spherical aberration includes the steps of:

splitting the light beam 2 into at least two partial light beams 20, 21, 22, 23, 24, 25;
focusing the partial light beams 20, 21, 22, 23, 24, 25 onto respective detectors 11, 12, 13, 16, 17, 18, whereby at least one signal A, B, C, D generated by the detectors 12, 13, 16, 17, 18 depends on the positions of the respective partial light beam 21, 22, 23, 24, 25; and
determining the spherical aberration using the signals A, B, C, D generated by the detectors 12, 13, 16, 17, 18.
摘要翻译：本发明涉及一种用于确定从光记录介质读取和/或写入光学记录介质时出现的球面像差的方法和装置。根据本发明，一种用于确定球面像差的方法包括以下步骤：将光束2分成至少两个部分光束20,21,22,23,24,25; 将部分光束20,21,22,23,24,25聚焦到相应的检测器11,12,13,16,17,18上，由此由检测器12,13产生的至少一个信号A，B，C，D ，16,17,18取决于各个部分光束21,22,23,24,25的位置; 以及使用由检测器12,13,16,17,18产生的信号A，B，C，D来确定球面像差。

8. 发明公开

EP1285305A1 AUTOFOKUSSIEREINRICHTUNG FÜR OPTISCHE GERÄTE 有权
标题翻译： AUTOFOKUSSIEREINRICHTUNGFÜROPTISCHEGERÄTE
公开(公告)号：EP1285305A1
公开(公告)日：2003-02-26
申请号：EP01943345.7
申请日：2001-05-11
申请人： CARL ZEISS JENA GmbH
发明人： CZARNETZKI, Norbert , MACK, Stefan , SCHERÜBL, Thomas
IPC分类号： G02B27/40 , G02B7/28 , G02B21/24
CPC分类号： G02B27/40 , G02B7/28 , G02B21/245
摘要： The invention relates to an autofocussing device preferably for microscopes for wafer inspection. A point-shaped illumination diaphragm (1) lit by a ray of laser light is imaged into an observation object (5); an image of the lit point on the observation object (5) is formed in a measuring diaphragm device which is conjugated with respect to the illumination diaphragm (1); the position of the maximum intensity of this image is determined by a position-sensitive detector (11) and compared with a position which corresponds to the focus position. An autofocussing position signal is obtained from the deviation between the two positions. The measuring diaphragm device of such an autofocussing device comprises several optically active components arranged in succession along the axis. Said components have complementary structures which are partially transparent and partially opaque, and are placed together in the beam path within one of the distances corresponding to the depth of field, in front of and behind the position which is conjugated with respect to the illumination diaphragm (1). The cross-section of the light beam from the observation object (5) is more or less blocked by the aforementioned structures according to the position of the observation object (5).
摘要翻译：本发明涉及一种优选用于晶片检查的显微镜的自动聚焦装置。由激光射线点亮的点状照明光圈（1）成像到观察对象（5）中; 观察对象（5）上的点亮点的图像形成在与照明光阑（1）共轭的测量光阑装置中; 该图像的最大强度的位置由位置敏感检测器（11）确定并与对应于焦点位置的位置比较。自动聚焦位置信号从两个位置之间的偏差中获得。这种自动聚焦装置的测量光阑装置包括沿轴线连续排列的多个光学活性部件。所述部件具有部分透明且部分不透明的互补结构，并且在相对于照明光阑共轭的位置的前方和后方，一起放置在与景深对应的一个距离内的光束路径中（ 1）。根据观察对象（5）的位置，来自观察对象（5）的光束的横截面或多或少被上述结构阻挡。

9. 发明公开

EP1237034A3 Optical system with electronic spot size control and focus control optics 有权
标题翻译： Optisches系统电脑软件Punktgrössensteuerungund Fokussierungskontrol
公开(公告)号：EP1237034A3
公开(公告)日：2002-10-16
申请号：EP01309337.2
申请日：2001-11-02
申请人： 3D SYSTEMS, INC.
发明人： Partanen, Jouni P. , Tang, Nansheng , Wu, Xingkun
IPC分类号： G02B27/09 , G02B27/40 , B23K26/067 , B23K26/073 , B29C67/00 , G11B7/125 , G11B7/135
CPC分类号： G02B27/40 , B23K26/04 , B23K26/0617 , B23K26/066 , B23K26/067 , B23K26/073 , B23K26/082 , B23K26/382 , B29C64/00 , B29C64/135 , B33Y40/00 , G02B7/102 , G02B19/0014 , G02B19/0052 , G02B19/0095 , G02B26/128 , G02B27/09 , G02B27/0955
摘要： An illumination system includes optics capable of adjusting the size of a beam of light and adjusting the focus of the beam of light. Spot size control optics adjusts the overall size of the beam of light and separately adjusts the ellipticity of the beam, primarily in one dimension. Light from the spot size control optics passes to focus control optics that control the overall focus of the beam of light and adjust the astigmatism of the beam by altering the focus position of the beam of light in one dimension. The laser system, the spot size control optics and the focus control optics are within an enclosure. Actuators under remote control from outside of the enclosure adjust both of the spot size control optics and focus control optics in the thermal environment of the illumination system.
摘要翻译：照明系统包括能够调节光束尺寸并调节光束焦点的光学器件。光斑尺寸控制光学器件调整光束的横向范围。来自光斑尺寸控制光学器件的光通过控制光束焦点的聚焦控制光学器件。由聚焦控制光学器件聚焦的光束具有用于光束的第一横向分量的第一聚焦位置和用于光束的第二横向分量的第二聚焦位置，第一和第二侧向分量是垂直的。聚焦控制光学器件将第一对焦位置调整到比第二对焦位置更大的轴向范围。执行器调节对焦控制光学元件。

10. 发明公开

EP1237034A2 Optical system with electronic spot size control and focus control optics 有权
标题翻译：光学系统与电子点的尺寸控制和聚焦控制
公开(公告)号：EP1237034A2
公开(公告)日：2002-09-04
申请号：EP01309337.2
申请日：2001-11-02
申请人： 3D SYSTEMS, INC.
发明人： Partanen, Jouni P. , Tang, Nansheng , Wu, Xingkun
IPC分类号： G02B27/09 , G02B27/40 , B23K26/067 , B23K26/073 , B29C67/00 , G11B7/125 , G11B7/135
CPC分类号： G02B27/40 , B23K26/04 , B23K26/0617 , B23K26/066 , B23K26/067 , B23K26/073 , B23K26/082 , B23K26/382 , B29C64/00 , B29C64/135 , B33Y40/00 , G02B7/102 , G02B19/0014 , G02B19/0052 , G02B19/0095 , G02B26/128 , G02B27/09 , G02B27/0955
摘要： An illumination system includes optics capable of adjusting the size of a beam of light and adjusting the focus of the beam of light. Spot size control optics adjusts the overall size of the beam of light and separately adjusts the ellipticity of the beam, primarily in one dimension. Light from the spot size control optics passes to focus control optics that control the overall focus of the beam of light and adjust the astigmatism of the beam by altering the focus position of the beam of light in one dimension. The laser system, the spot size control optics and the focus control optics are within an enclosure. Actuators under remote control from outside of the enclosure adjust both of the spot size control optics and focus control optics in the thermal environment of the illumination system.

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