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    • 5. 发明公开
    • CLEANING DEVICE AND ANALYSIS DEVICE
    • REINIGUNGSVORRICHTUNG UND ANALYSEVORRICHTUNG
    • EP2180325A1
    • 2010-04-28
    • EP08791556.7
    • 2008-07-24
    • Beckman Coulter, Inc.
    • TSURUTA, HiroshiOZAKI, MotoakiNISHIMURA, IsaoTAKEYA, Mariko
    • G01N35/02G01N1/00
    • B01L99/00B01L3/5082G01N2035/0437
    • A cleaning device and an analyzer capable of reducing an amount of cleaning liquid required for cleaning a cuvette are provided. In the analyzer according to the present invention, wall cross-sectional areas (S12) and (S22) are made larger than respective inner-diameter cross-sectional areas (S11) and (S21) of the supply nozzle (191) and the suction nozzle (192) that form a cleaning nozzle, so that a wall of each of the supply nozzle (191) and the suction nozzle (192) is thickened to increase the volume occupied by the nozzle in the cuvette 21. Thus, a percentage of the cleaning liquid (Ls) in the cuvette (21) can be reduced, resulting in reducing the amount of the cleaning liquid required for cleaning the cuvette (21).
    • 提供了能够减少清洗比色皿所需的清洗液量的清洗装置和分析装置。 在本发明的分析装置中,壁部横截面积(S12)和(S22)比供给喷嘴191的内径截面积(S11)和(S21)大, 形成清洁喷嘴的喷嘴(192),使得供给喷嘴(191)和吸嘴(192)中的每一个的壁变厚,以增加在试管21中由喷嘴占据的体积。因此, 可以减小反应杯(21)中的清洗液(Ls),从而减少清洗比色皿(21)所需的清洗液量。
    • 6. 发明公开
    • CLEANING DEVICE AND AUTOMATIC ANALYZER
    • REINIGUNGSVORRICHTUNG UND ANALYSEAUTOMAT
    • EP2124065A1
    • 2009-11-25
    • EP08721685.9
    • 2008-03-10
    • Olympus Corporation
    • TSURUTA, Hiroshi
    • G01N35/02B08B3/02G01N1/00
    • B01L99/00B01L3/5082G01N2035/0437
    • A cleaning device (20) includes a nozzle unit (21) that has a supply nozzle (211), a suction nozzle (213), and an overflow nozzle (215). An end of the suction nozzle (213) is located at a position slightly lower than an end of the supply nozzle (211) in a vertical direction. An end of the overflow nozzle (215) is located at a position higher than the end of the supply nozzle (211) in the vertical direction. The supply nozzle (211) has an inner diameter area larger than an area of a section where reaction liquid and cleaning water are held. The supply nozzle (211) is arranged such that there is provided a space between the outer wall surface of the supply nozzle (211) and the entire inner wall surface of a reaction vessel (C) to flow the cleaning water supplied from the supply nozzle 211 through the space. The cleaning water supplied from the supply nozzle (211) flows through the space between the outer wall surface of the supply nozzle (211) and the inner wall surface of the reaction vessel (C) and is sucked by the overflow nozzle (215).
    • 清洁装置(20)包括具有供给喷嘴(211),吸嘴(213)和溢流喷嘴(215)的喷嘴单元(21)。 吸嘴213的一端在垂直方向上位于比供给喷嘴211的端部略低的位置。 溢流喷嘴215的一端位于高于供给喷嘴211的垂直方向端部的位置。 供应喷嘴(211)的内径面积大于保持反应液体和清洁水的部分的面积。 供给喷嘴211被配置为在供给喷嘴211的外壁面与反应容器C的内壁面整体之间设置有空间,使从供给喷嘴供给的清洗水 211通过空间。 从供给喷嘴211供给的清洗水通过供给喷嘴211的外壁面与反应容器C的内壁面之间的空间流过溢流喷嘴215。