专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP3113979A1 FAHRZEUGSCHEINWERFER MIT EINER VORRICHTUNG ZUM BESTIMMEN VON STRASSENVERHÄLTNISSEN UND SYSTEM ZUR ÜBERWACHUNG VON STRASSENVERHÄLTNISSEN 审中-公开
标题翻译：与设备汽车大灯对于确定道路条件和监测系统的路况
公开(公告)号：EP3113979A1
公开(公告)日：2017-01-11
申请号：EP14707755.6
申请日：2014-03-03
申请人： G. Lufft Mess- und Regeltechnik GmbH
发明人： SCHMITZ-HÜBSCH, Axel
IPC分类号： B60Q1/00 , G08G1/16 , B60W40/068 , G01B11/06 , G08B19/02 , G01N21/31 , G01N21/47 , G01N21/35 , B60W40/06
CPC分类号： B60Q1/0023 , B60Q1/04 , B60W40/068 , B60W2420/40 , B60W2422/00 , F21S41/28 , F21S41/30 , G01B11/0633 , G01N21/3151 , G01N21/3554 , G01N21/359 , G01N21/4738 , G01N2021/3181 , G01N2021/4709 , G01N2201/0216 , G01N2201/0627 , G01N2201/0696 , G08G1/0112 , G08G1/0133 , G08G1/0141 , G08G1/096716 , G08G1/096758 , G08G1/096775 , G08G1/096791
摘要： Vehicle headlight (3) comprising: a lighting unit, a reflector (5), and a headlight glass (9); a device (11) for determining road conditions, wherein the device is provided in the interior of the vehicle headlight (3) behind the headlight glass (9) and comprises: an infrared transmission unit (13) which is configured for emitting light at predetermined wavelengths through the headlight glass (9) onto a road surface; a detection unit (17) which is configured for detecting the light emitted by the infrared transmission unit (13) and reflected by the road surface through the headlight glass (9); a processing unit which is configured for determining surface parameters of the road surface on the basis of the light detected by the detection unit (17).
摘要翻译：一种车辆头灯，包括：发光单元，反射器和前灯玻璃; 确定性挖掘道路状况的装置，所述装置在所述头灯玻璃和包括后面的车辆用前照灯的内部设置：被配置用于在通过波长前照灯玻璃到路面上规定的射出光的红外发射器; 构造用于检测由红外线发射器发射和反射通过所述头灯玻璃路面的光的检测单元; 处理单元，配置用于通过所述检测单元检测的光的基础上，路面的确定性挖掘面的参数。

2. 发明公开

EP2486392A4 MEASURING INSTRUMENT AND METHOD FOR DETERMINATION OF THE PROPERTIES OF AN ITEM AND ITS SURFACE 有权转让
标题翻译：仪表和方法确定物件及其表面的特性
公开(公告)号：EP2486392A4
公开(公告)日：2017-01-04
申请号：EP10821623
申请日：2010-10-07
申请人： FOCALSPEC OY
发明人： NIEMELÄ KARRI , KERÄNEN HEIMO
IPC分类号： G01B11/06 , G01N21/41 , G01N21/57
CPC分类号： G01B11/0633 , G01B11/065 , G01B2210/50 , G01N21/41 , G01N21/57
摘要： A measurement device for the determination of the characteristics of the object's surface by means of the optical radiation, wherein a measurement device comprises an optical radiation source and a detector to receive the radiation reflected from the surface being measured. In addition, a measurement device comprises an emitted optical radiation processing unit, which is adjusted to split optical radiation emitted by an optical source into separate wavelengths and to direct said separate wavelengths to the object being measured in a direction, that differs from the normal of the surface being measured so, that at least the shortest and the longest wavelengths of said wavelengths are focused on different halves and different heights of the measured object's surface, in the direction of the normal of the surface being measured. In addition, a measurement device comprises a reflected optical radiation processing unit, which is adjusted to receive an optical radiation reflected from the measured object at least in the direction of a specular reflection, which differs from the normal of the surface being measured, and to direct received optical radiation to said detector. Still further, the measurement device is adjusted to analyze an electric signal produced by the detector and proportional to the intensity of the radiation focused thereto, and to further determine a surface gloss (gloss degree) and/or thickness characteristic property of the measured object, based on the intensity of its wavelength, the focus point of which was located on the measured surface, and which wavelength was the strongest reflected from that point to the detector in the specular geometry.
摘要翻译：对的对象的表面的特性的确定由所述光辐射的手段，worin光辐射源和检测器的测量装置包括用于接收辐射的测量装置从所述表面被测量反射。另外，被调整的测量装置发射的光辐射处理单元包括，全部以在光源分割由发射的光辐射成单独的波长，并引导所述分离波长的对象被测量的方向上，从正常的那样而异表面被测量所以没有至少所述的波长的最短和最长的波长集中在不同的半部与被测物体表面的不同高度，在正常的表面的方向测量的。此外，测量设备包括被调整以接收的光辐射从至少一个镜面反射，其从正常的表面的不同的方向上的测量对象物反射的被测量的反射光辐射处理单元，全部和向直接接收到的光辐射到所述检测器。更进一步地，所述测量装置被调整来分析由所述检测器和比例产生的聚焦到其上的辐射的强度的电信号，和つweiterer确定性矿的表面光泽度（光泽度），和/或测量对象物的厚度特征性质，基于其波长的强度，其中聚焦点位于被测表面上，并且其波长从做点在镜面几何形状检测器，其最强的反射。

3. 发明授权

EP2454137B1 LASERBASIERTES VERFAHREN ZUR REIBWERTKLASSIFIKATION IN KRAFTFAHRZEUGEN 有权转让
标题翻译：基于激光的机动车辆梯度分类方法
公开(公告)号：EP2454137B1
公开(公告)日：2015-09-09
申请号：EP10734123.2
申请日：2010-07-19
申请人： Continental Teves AG & Co. oHG , Continental Engineering Services GmbH
发明人： GROITZSCH, Stephan , SCHORN, Matthias , FISCHER, Daniel , STÖLZL, Stephan
IPC分类号： G01B11/06 , B60W40/06 , B60R16/02 , G01N21/21 , G08B19/02 , B60W40/068 , G01N21/47
CPC分类号： B60W40/068 , G01B11/0633 , G01N21/4738 , G01N2021/4709 , G01N2021/4711

4. 发明公开

EP2901102A1 METHOD AND MEASURING DEVICE FOR MEASURING THE DISTANCE OF A SURFACE, THICKNESS AND OPTICAL PROPERTIES OF AN OBJECT 有权转让
标题翻译：方法和测量器具，用于测量表面的距离，厚，光学性质的物体
公开(公告)号：EP2901102A1
公开(公告)日：2015-08-05
申请号：EP13837251.1
申请日：2013-09-17
申请人： Focalspec Oy
发明人： KERÄNEN, Heimo
IPC分类号： G01B11/06 , G01B9/02 , G01N21/57
CPC分类号： G01C3/08 , G01B9/02091 , G01B11/0633 , G01B11/0691 , G01B2210/50 , G01N21/47 , G01N21/49 , G01N21/57 , G01N21/8422
摘要： In the measuring device (1 ) and measuring method according to the invention, confocal measuring principle is utilized. A certain component of an optical measurement signal is, from the point of view of both illumination and imaging, in focus only at one point on the virtual measuring surface (3). In the measuring device, the surface (2a) to be measured always hits a common focus point of the illumination and imaging, whereby a reflection is generated. The reflected optical signal is direct to a detector (13) belonging to the imaging means, where one picture element of the detector corresponds a certain focus point, respectively. The optical efficiency received by each picture element is indicated. The light reflecting from the intersection of the virtual measuring surface (3) and the surface (2a) of the object (2) produces an intensity maximum for the detector. This maximum point is indicated and converted in the imaging unit (13) into the height of the surface (2a) of the object (2). By means of the intensity distribution measured in the vicinity of this maximum point further the optical reflection characteristics of the surface can be determined.

5. 发明公开

EP2693271A1 Apparatus and method for measuring the dimensions of 1-dimensional and 0-dimensional nanostructures in real-time during epitaxial growth 审中-公开
标题翻译： 1维器件和方法，用于在外延生长过程中测量的实时的尺寸和0维纳米结构
公开(公告)号：EP2693271A1
公开(公告)日：2014-02-05
申请号：EP12199125.1
申请日：2012-12-21
申请人： LayTec AG
发明人： Anttu, Nicklas , Heurlin, Magnus , Borgström, Magnus , Samuelson, Lars , Xu, Hongqi , Kaspari, Christian
IPC分类号： G03F7/20 , B82Y35/00 , G01B11/02 , G01B11/06
CPC分类号： C30B25/16 , B82Y35/00 , G01B11/02 , G01B11/0633 , G01B2210/56
摘要： The present invention relates to an apparatus and a method for measuring the dimensions of 1-dimensional and 0-dimensional nanostructures on semiconductor substrates in real-time during epitaxial growth.
The method includes either assigning a pre-calculated 3D-model from a data base to the sample, wherein pre-calculation of the 3D-model includes calculation of the interference effects of light reflected from the front and back interfaces of the nano-structure and calculation of the interference effects due to superposition of neighbouring wave-fronts reflected from the nano-structure area and wave-fronts reflected from the substrate area between the nano-structures; or calculating a 3D-model of the sample using the measured optical reflectances of the plurality of different measuring positions of the sample, wherein calculation of the 3D-model includes calculation of the interference effects of light reflected from the front and back interfaces of the nano-structure and calculation of the interference effects due to superposition of neighbouring wave-fronts reflected from the nano-structure area and wave-fronts reflected from the substrate area between the nano-structures.
摘要翻译：本发明涉及的装置和外延生长期间测量的一维和0维纳米结构的实时半导体基板上的尺寸的方法。该方法包括任一分配从数据的基础上预先计算的3D模型到样品中，worin 3D模型的预先计算包括从所述纳米结构的前部和后部界面反射的光的干涉效果的计算和的干涉效应由于相邻波前叠加计算从纳米结构区域的反射和波前从纳米结构之间的面积基板反射的光; 或计算样品的使用样本的不同测量位置的多个测量的光反射率的3D模型，worin 3D模型的计算包括从纳米的正面和背面界面反射的光的干涉效果计算 - 结构和的干涉效应计算由于相邻波前叠加从纳米结构区域的反射和波前从纳米结构之间的面积基板反射。

6. 发明公开

EP2454137A1 LASERBASIERTES VERFAHREN ZUR REIBWERTKLASSIFIKATION IN KRAFTFAHRZEUGEN 有权转让
标题翻译： LASERBASIERTES VERFAHREN ZUR REIBWERTKLASSIFIKATION in KRAFTFAHRZEUGEN
公开(公告)号：EP2454137A1
公开(公告)日：2012-05-23
申请号：EP10734123.2
申请日：2010-07-19
申请人： Continental Teves AG & Co. oHG , Continental Engineering Services GmbH
发明人： GROITZSCH, Stephan , SCHORN, Matthias , FISCHER, Daniel , STÖLZL, Stephan
IPC分类号： B60W40/06 , B60R16/02 , G01N21/21 , G08B19/02
CPC分类号： B60W40/068 , G01B11/0633 , G01N21/4738 , G01N2021/4709 , G01N2021/4711
摘要： The invention relates to a sensor array for detecting a friction coefficient of a roadway surface, wherein the sensor array is disposed on a motor vehicle and comprises at least one radiation emitter unit and at least one electronic evaluation circuit, wherein the radiation emitter unit emits electromagnetic radiation toward the roadway surface, and the radiation is at least partially reflected and/or scattered by the roadway surface, and the reflected and/or scattered radiation is at least partially detected in the radiation emitter unit and/or in one or more additional sensor units, wherein the electronic evaluation circuit is designed such that it determines friction coefficient information of the roadway surface from the intensity of the reflected and/or scattered radiation or a variable dependent thereon.
摘要翻译：本发明涉及一种用于检测道路表面的摩擦系数的传感器阵列，其中传感器阵列设置在机动车辆上并且包括至少一个辐射发射器单元和至少一个电子评估电路，其中辐射发射器单元发射电磁辐射朝向道路表面，并且辐射至少部分地被道路表面反射和/或散射，并且在辐射发射器单元中和/或在一个或多个附加传感器中至少部分地检测到反射和/或散射的辐射其中电子评估电路被设计为使得其根据反射和/或散射辐射的强度或依赖于其的变量来确定道路表面的摩擦系数信息。

7. 发明公开

EP2124015A1 WAVELENGTH SELECTING METHOD, FILM THICKNESS MEASURING METHOD, FILM THICKNESS MEASURING APPARATUS, AND THIN FILM SILICON DEVICE MANUFACTURING SYSTEM 审中-公开
标题翻译：波长选择处理，膜厚测量法，薄膜厚度测量装置和系统的薄膜硅元件的生产
公开(公告)号：EP2124015A1
公开(公告)日：2009-11-25
申请号：EP07830913.5
申请日：2007-10-31
申请人： Mitsubishi Heavy Industries, Ltd.
发明人： SAKAI, Satoshi , IIDA, Masami , KAWAZOE, Kohei
IPC分类号： G01B11/06
CPC分类号： G01B11/0633 , G01B11/0683 , G01B11/303
摘要： An object is to reduce film thickness measurement error. Illumination light having different wavelengths is radiated onto a plurality of samples in which thin films having different film qualities and film thicknesses are provided on substrates, evaluation values related to the amounts of transmitted light when the illumination light of each wavelength is radiated are measured, film thickness characteristics, showing the relationship between the evaluation values and the film thicknesses for each film quality, are formed at each wavelength based on the measurement results, and among the film thickness characteristics, a wavelength at which a measurement difference between the evaluation values caused by the film qualities is in a predetermined range is selected.
摘要翻译：一个目的是减少膜厚度测量误差。具有不同波长的照明光被照射到其中设置在所述基板上具有不同的电影的质量和膜厚度的薄膜样品的复数，与反式mitted光当每个波长的照明光被照射的量评价值被测量，膜厚度的特性，示出评价值，并为每个电影质量的膜厚度之间的关系，是在根据该测量结果中的每个波长形成，并且该膜厚度的特性，波长之中的哪一个由引发的评价值之间的测量差该膜质量处于预定范围内选择。

8. 发明公开

EP1889002A4 DIFFRACTION METHOD FOR MEASURING THICKNESS OF A WORKPART 审中-公开
标题翻译：衍射法测定工件部分的厚度
公开(公告)号：EP1889002A4
公开(公告)日：2008-11-26
申请号：EP06760273
申请日：2006-05-22
申请人： FEDERAL MOGUL CORP
发明人： FOES SCOTT
IPC分类号： G01B11/06
CPC分类号： G01B11/0633
摘要： The thickness of a workpart (10) is measured to a high degree of accuracy by passing a coherent light beam (20) through an aperture (16) in the workpart (10). The aperture (16') can alternatively be created between an edge of the workpart (10) and an external reference plate (30). The light is diffracted on the far side of the workpart (10) and its diffraction pattern captured by a CCD camera (22). The captured image is analyzed by a computer (24) which compares the captured diffraction pattern to a stored referenced value to determine whether the thickness of the workpart (10) is within an acceptable range. The method is capable of returning measurements with micron or submicron resolution, and is a robust process readily adaptable to high volume production quality control applications.

9. 发明公开

EP0792438A1 METHOD AND DEVICE FOR DETERMINING THE THICKNESS AND CONCENTRICITY OF A LAYER APPLIED TO A CYLINDRICAL BODY 失效
标题翻译：方法和设备，用来确定厚度和同心层上的圆柱体
公开(公告)号：EP0792438A1
公开(公告)日：1997-09-03
申请号：EP95937290.0
申请日：1995-11-15
申请人： TELEFONAKTIEBOLAGET LM ERICSSON
发明人： KRAHBICHLER, Erik , BORAK, Georges
IPC分类号： G01B11 , G02B6
CPC分类号： G01B11/0633
摘要： In the determination of deviation from a concentric position for a protective polyimide coating disposed on an optical fiber (1) the absorption of light in the coating is used. A light source such as a laser (9) provides a light ray which is split by a beamsplitter (11) in two light rays. By means of suitably placed mirrors (15, 17) the light rays are guided to hit two opposite sides of the fiber (1) at oblique and equal incidence angles to the longitudinal direction of the fiber (1). The light rays hit the fibers at positions which are a little displaced in the longitudinal direction of the fiber in order to prevent wrong light rays from hitting the detectors (13, 19) which receive the reflected light. The detectors provide signals representing the intensity of the reflected light to a subtraction circuit which forms the difference of the signals from the detectors (13, 19). The different signal is then a measure of the concentricity error of the coating. A simple method and device are obtained in this way which can also be used on-line in the determination of concentricity in the case where the coating is extruded in a drawing tower where the fiber is produced. Absolute determinations of the thickness of a coating can also be made by making a measurement on a fiber having a calibrated coating.

10. 发明公开

EP0701686A1 GLEICHZEITIGES BESTIMMEN VON SCHICHTDICKE UND SUBSTRATTEMPERATUR WÄHREND DES BESCHICHTENS 失效
标题翻译：涂层在同时厘定厚度和基质温度
公开(公告)号：EP0701686A1
公开(公告)日：1996-03-20
申请号：EP94906879.0
申请日：1994-02-16
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
发明人： BÖBEL, Friedrich , BAUER, Norbert
IPC分类号： G01B11 , G01J5
CPC分类号： G01J5/0003 , G01B11/0633 , G01J5/0007 , G01J5/0834 , G01J2001/4242 , G01J2005/0048 , G01J2005/0074
摘要： The invention describes a process and device for measuring temperature and layer thickness during coating by prior art methods in semiconductor manufacturing, plasma, ion and other dry-etching plants and in the production of optical coatings. The current results of layer thickness and temperature measurements may be used in process control. The interference phenomena in thermal substrate radiation on the growing layer continuously cause the emissivity ε to change during coating, thus preventing the use of pyrometric temperature measurement, which gives rise to particular problems in multi-layer systems in which the current emissivity depends on the thickness of all the layer, their optical constants, the temperature-dependence of the optical constant and the observation angle and wavelength. The present invention solves these fundamental problems by determining the reflectivity R of the wafer using a reflectometer. According to the law of the conservation of energy, for non-transparent substrates ε = 1 - R, and hence the current emissivity of the entire (multi-layer) system can be directly determined with the reflectometer. The temperature is measured by means of a given evaluation rule, while the thickness is found by comparing the reflectometer curve with the theoretical layer thickness dependence.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式