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1. 发明公开

EP1885166A3 Extreme ultraviolet light source device and method of generating extreme ultraviolet radiation 审中-公开
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP1885166A3
公开(公告)日：2010-02-24
申请号：EP07015099.0
申请日：2007-08-01
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： Extreme ultraviolet light source device in which an EUV radiation fuel is introduced into a chamber, and high-voltage pulsed voltage from a high-voltage generator is applied between first and second main discharge electrodes, thereby producing a high-temperature plasma from discharge gas between the main discharge electrodes; EVU radiation with a wavelength of 13.5 nm is emitted. Of the EVU radiation emitted, the EUV radiation on the optical axis of the EUV collector mirror passes through a through-hole in the foil trap and through a through hole in the central support of the collector mirror, is reflected away from the optical axis by a reflector, and enters an EUV monitor. On the basis of EUV intensity signals input to the EUV monitor, a controller adjusts the power supplied from the high-voltage generator so that the EUV intensity is steady.

2. 发明公开

EP1972999A3 Foil trap and extreme ultraviolet light source device using the foil trap 有权
标题翻译：翼片阱和超紫外线辐射源使用该箔陷阱
公开(公告)号：EP1972999A3
公开(公告)日：2009-07-15
申请号：EP08003664.3
申请日：2008-02-28
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro , Inoue, Takahiro
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source device and foil trap (15), the device including a vessel; an EUV radiating species supply means that feeds an extreme ultraviolet radiating species into the vessel; a discharge part with discharge electrodes (4,5) that heat and excite the EUV radiating species and generate a high-temperature plasma (8); a collector mirror (13) collecting EUV radiation emitted from the plasma; the foil trap installed between the discharge part and the mirror; an extractor part extracting the collected radiation; and an evacuation means exhausting and regulating pressure within the vessel. The foil trap includes foils extending radially from a main axis thereof to capture debris from the light source, while allowing the emitted radiation to pass through a region thereof to the mirror. A length of at least part of the foils in directions parallel to the main axis is shorter in positions close to the main axis than distant therefrom.

3. 发明公开

EP1885166A2 Extreme ultraviolet light source device and method of generating extreme ultraviolet radiation 审中-公开
标题翻译： LichtquellenvorrichtungfürExtrem-Ultraviolettlicht und Verfahren zur Erzeugung von Extrem- Ultraviolettstrahlung
公开(公告)号：EP1885166A2
公开(公告)日：2008-02-06
申请号：EP07015099.0
申请日：2007-08-01
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： Extreme ultraviolet light source device in which an EUV radiation fuel is introduced into a chamber, and high-voltage pulsed voltage from a high-voltage generator is applied between first and second main discharge electrodes, thereby producing a high-temperature plasma from discharge gas between the main discharge electrodes; EVU radiation with a wavelength of 13.5 nm is emitted. Of the EVU radiation emitted, the EUV radiation on the optical axis of the EUV collector mirror passes through a through-hole in the foil trap and through a through hole in the central support of the collector mirror, is reflected away from the optical axis by a reflector, and enters an EUV monitor. On the basis of EUV intensity signals input to the EUV monitor, a controller adjusts the power supplied from the high-voltage generator so that the EUV intensity is steady.
摘要翻译：将EUV辐射燃料引入室内的极紫外光源装置和来自高压发生器的高压脉冲电压施加在第一和第二主放电电极之间，从而在放电气体之间产生高温等离子体主放电电极; 发出波长13.5nm的EVU辐射。在发射的EVU辐射中，EUV采集镜的光轴上的EUV辐射通过箔捕获器中的通孔并且通过集光镜的中心支撑件中的通孔被从光轴反射离开光轴反射器，并进入EUV监视器。根据输入到EUV监视器的EUV强度信号，控制器调节从高压发生器提供的电力，使得EUV强度稳定。

4. 发明授权

EP1883280B1 EUV light source device with raw material gasified by energy beam before plasma gets excited 有权
标题翻译：其活性物质是由之前等离子体点火EUV光源的能量束蒸发，
公开(公告)号：EP1883280B1
公开(公告)日：2010-06-09
申请号：EP07014791.3
申请日：2007-07-27
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro , Sato, Hiroto , Bessho, Kazunori , Teramoto, Yusuke
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005

5. 发明授权

EP1972999B1 Foil trap and extreme ultraviolet light source device using the foil trap 有权
标题翻译：翼片阱和超紫外线辐射源使用该箔陷阱
公开(公告)号：EP1972999B1
公开(公告)日：2016-03-16
申请号：EP08003664.3
申请日：2008-02-28
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro , Inoue, Takahiro
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033

6. 发明公开

EP1972999A2 Foil trap and extreme ultraviolet light source device using the foil trap 有权
标题翻译： Folien-Falle und extrem-ultraviolet Strahlungsquelle diese Folien-Falle verwendend
公开(公告)号：EP1972999A2
公开(公告)日：2008-09-24
申请号：EP08003664.3
申请日：2008-02-28
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro , Inoue, Takahiro
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source device and foil trap (15), the device including a vessel; an EUV radiating species supply means that feeds an extreme ultraviolet radiating species into the vessel; a discharge part with discharge electrodes (4,5) that heat and excite the EUV radiating species and generate a high-temperature plasma (8); a collector mirror (13) collecting EUV radiation emitted from the plasma; the foil trap installed between the discharge part and the mirror; an extractor part extracting the collected radiation; and an evacuation means exhausting and regulating pressure within the vessel. The foil trap includes foils extending radially from a main axis thereof to capture debris from the light source, while allowing the emitted radiation to pass through a region thereof to the mirror. A length of at least part of the foils in directions parallel to the main axis is shorter in positions close to the main axis than distant therefrom.
摘要翻译：一种极紫外（EUV）光源装置和箔阱（15），该装置包括一个容器; EUV辐射物种供应是指将极端的紫外线辐射物质进料到容器中; 具有放电电极（4,5）的放电部分，其加热并激发EUV辐射物质并产生高温等离子体（8）; 收集从所述等离子体发射的EUV辐射的收集器反射镜（13）安装在排放部分和反射镜之间的箔夹; 提取收集的辐射的提取部分; 排气装置排出并调节容器内的压力。箔片捕获器包括从其主轴线径向延伸的箔片，以捕获来自光源的碎屑，同时允许发射的辐射通过其一个区域到反射镜。与主轴平行的方向的至少一部分箔的长度比远离主轴的位置更短。

7. 发明公开

EP1883280A1 EUV light source device with raw material gasified by energy beam before plasma gets excited 有权
标题翻译： EUV-Lichtquelle，deren aktives材料vor derPlasmazündungdurch einen Energiestrahl verdampft wird
公开(公告)号：EP1883280A1
公开(公告)日：2008-01-30
申请号：EP07014791.3
申请日：2007-07-27
申请人： USHIODENKI KABUSHIKI KAISHA
发明人： Shirai, Takahiro , Sato, Hiroto , Bessho, Kazunori , Teramoto, Yusuke
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes. A raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.
摘要翻译：在EUV光源装置中控制电极消融，通过用能量束照射使原料气化，并使用电极产生高温等离子体。用于等离子体的原料在除了放电区域之外的空间内滴落，并且气化原料可以从其中到达放电电极之间的放电区域，并且激光束照射高温等离子体原料。由激光束气化的气化高温等离子体原料在放电区域的方向上扩散。此时，对一对放电电极施加电力，气化的高温等离子体原料被加热激发成为高温等离子体，并且发射EUV辐射。该EUV辐射由EUV收集器镜收集并发送到光刻设备。

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