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1. 发明公开

EP2203033A3 Extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置
公开(公告)号：EP2203033A3
公开(公告)日：2010-09-08
申请号：EP09015807.2
申请日：2009-12-21
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Yokoyama, Takuma
IPC分类号： G21K1/00 , H05G2/00
CPC分类号： H05G2/001 , G21K1/00
摘要： The invention relates to an extreme ultraviolet light source device, comprising a pair of discharge electrodes (2a, 2b, 52a, 52b) arranged spaced apart from each other; a pulsed power supply means (3, 53) supplying pulsed power to said discharge electrodes (2a, 2b); a raw material supply means (7) adapted for supplying raw material (M) for generating extreme ultraviolet radiation onto said discharge electrodes (2a, 2b, 52a, 52b); an energy beam emitting means (10, 60) adapted for radiating an energy beam (LB2) to the raw material (M) on said discharge electrodes (2a, 2b, 52a, 52b) to gasify said raw material (M); a means (11, 61, 85, 95, 105) for forming a depression (MA) in the raw material (M) supplied onto said discharge electrodes (2a, 2b, 52a, 52b); and a controller (6, 56). Said controller (6, 56) is adapted to control the depression forming means (11, 61, 85, 95, 105) such that it forms a depression (MA) in the raw material (M) supplied onto the discharge electrodes (2a, 2b, 52a, 52b) before the voltage between the electrodes (2a, 2b, 52a, 52b) increases by means of the supply of pulsed power to the discharge electrodes (2a, 2b, 52a, 52b) by said pulsed power supply means (3, 53), and before the energy beam (LB2) is radiated to the raw material (M) on the electrodes (2a, 2b, 52a, 52b) by said energy beam emitting means (10, 60). The invention also relates to a process for generating EUV radiation.

2. 发明授权

EP1976344B1 Extreme ultraviolet light source device and extreme ultraviolet radiation generating method 有权
标题翻译：极紫外光源装置和极紫外辐射生成方法
公开(公告)号：EP1976344B1
公开(公告)日：2011-04-20
申请号：EP08005656.7
申请日：2008-03-26
申请人： TOKYO INSTITUTE OF TECHNOLOGY , Ushio Denki Kabushiki Kaisha
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Mizokoshi, Hiroshi , Yokoyama, Takuma , Seki, Kyohei
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008

3. 发明公开

EP2170020A1 Extreme ultraviolet light source device and method for generating extreme ultraviolet radiation 有权
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP2170020A1
公开(公告)日：2010-03-31
申请号：EP09012287.0
申请日：2009-09-28
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Teramoto, Yusuke , Mizokoshi, Hiroshi , Yokoyama, Takuma
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light source device comprising a pair of mutually opposed discharge electrodes, pulsed power supplying means adapted to supply pulsed power to said discharge electrodes, raw material supplying means for supplying liquid or solid raw material to said electrodes in order to cause extreme ultraviolet radiation to be emitted at said discharge electrodes, and energy beam irradiation means adapted to emit an energy beam for irradiating the raw material supplied to said discharge electrodes in order to initiate a discharge in the gap between said pair of discharge electrodes by said raw material being evaporated, wherein said energy beam irradiation means is comprised of a first energy beam irradiation means adapted to emit a first energy beam for irradiating said raw material supplied to said discharge electrodes and causing said raw material to evaporate, and a second energy beam irradiation means adapted to emit a second energy beam for irradiating the raw material in the region irradiated by said first energy beam for further evaporating the raw material after irradiation of said first energy beam and in the interval before the discharge is initiated in the gap between said pair of discharge electrodes.
摘要翻译：极紫外光源装置，包括一对相互对置的放电电极，脉冲功率供给装置angepasst提供脉冲功率，以所述放电电极，剃刀提供装置，用于在顺序供给的液体或固体原料所述电极中，以引起极紫外辐射在所述放电电极进行发射，并且能量束照射单元angepasst在能量束以发射用于照射以引发在由所述的原料，所述一对放电电极之间的间隙的放电提供给所述放电电极上的原料中蒸发，worin所述能量束辐照装置包括一个第一能量束辐照装置angepasst以发射第一能量束照射，所述剃须刀提供给所述放电电极和使所述原料蒸发，和第二能量束照射手段angepasst到发射第二能量束用于照射原料我 N乘所述第一能量束对所述第一能量束照射后进一步蒸发原料和在放电前的时间间隔照射的区域在所述一对放电电极之间的间隙被启动。

4. 发明授权

EP2170020B1 Extreme ultraviolet light source device and method for generating extreme ultraviolet radiation 有权
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP2170020B1
公开(公告)日：2011-06-08
申请号：EP09012287.0
申请日：2009-09-28
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Teramoto, Yusuke , Mizokoshi, Hiroshi , Yokoyama, Takuma
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/005

5. 发明授权

EP2203033B1 Extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置
公开(公告)号：EP2203033B1
公开(公告)日：2014-09-10
申请号：EP09015807.2
申请日：2009-12-21
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Yokoyama, Takuma
IPC分类号： G21K1/00 , H05G2/00
CPC分类号： H05G2/001 , G21K1/00

6. 发明公开

EP2203033A2 Extreme ultraviolet light source device 有权
标题翻译：极端的紫外线光源装置
公开(公告)号：EP2203033A2
公开(公告)日：2010-06-30
申请号：EP09015807.2
申请日：2009-12-21
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Yokoyama, Takuma
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G21K1/00
摘要： The invention relates to an extreme ultraviolet light source device, comprising a pair of discharge electrodes (2a, 2b, 52a, 52b) arranged spaced apart from each other; a pulsed power supply means (3, 53) supplying pulsed power to said discharge electrodes (2a, 2b); a raw material supply means (7) adapted for supplying raw material (M) for generating extreme ultraviolet radiation onto said discharge electrodes (2a, 2b, 52a, 52b); an energy beam emitting means (10, 60) adapted for radiating an energy beam (LB2) to the raw material (M) on said discharge electrodes (2a, 2b, 52a, 52b) to gasify said raw material (M); a means (11, 61, 85, 95, 105) for forming a depression (MA) in the raw material (M) supplied onto said discharge electrodes (2a, 2b, 52a, 52b); and a controller (6, 56). Said controller (6, 56) is adapted to control the depression forming means (11, 61, 85, 95, 105) such that it forms a depression (MA) in the raw material (M) supplied onto the discharge electrodes (2a, 2b, 52a, 52b) before the voltage between the electrodes (2a, 2b, 52a, 52b) increases by means of the supply of pulsed power to the discharge electrodes (2a, 2b, 52a, 52b) by said pulsed power supply means (3, 53), and before the energy beam (LB2) is radiated to the raw material (M) on the electrodes (2a, 2b, 52a, 52b) by said energy beam emitting means (10, 60). The invention also relates to a process for generating EUV radiation.
摘要翻译：本发明涉及一种远紫外光源装置，其包括彼此间隔开布置的一对放电电极（2a，2b，52a，52b）向所述放电电极（2a，2b）提供脉冲功率的脉冲电源装置（3,53）; 原料供应装置（7），用于向所述放电电极（2a，2b，52a，52b）供应用于产生极紫外辐射的原料（M）; 能量束发射装置（10,60），适于向所述放电电极（2a，2b，52a，52b）上的原料（M）辐射能量束（LB2）以使所述原料（M）气化; 用于在供给到所述放电电极（2a，2b，52a，52b）上的原料（M）中形成凹陷（MA）的装置（11,61,85,95,105）; 和控制器（6,56）。所述控制器（6,56）适于控制凹陷形成装置（11,61,85,95,105），使得其形成供应到放电电极（2a，2b）上的原材料（M）中的凹陷（MA）（2a，2b，52a，52b）之间的电压通过由所述脉冲电源装置向所述放电电极（2a，2b，52a，52b）提供脉冲功率而增加之前，并且在能量束（LB2）通过所述能量束发射装置（10,60）照射到电极（2a，2b，52a，52b）上的原材料（M）之前。本发明还涉及用于生成EUV辐射的过程。

7. 发明公开

EP1976344A3 Extreme ultraviolet light source device and extreme ultraviolet radiation generating method 有权
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP1976344A3
公开(公告)日：2010-04-28
申请号：EP08005656.7
申请日：2008-03-26
申请人： TOKYO INSTITUTE OF TECHNOLOGY , Ushio Denki Kabushiki Kaisha
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Mizokoshi, Hiroshi , Yokoyama, Takuma , Seki, Kyohei
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.

8. 发明公开

EP1976344A2 Extreme ultraviolet light source device and extreme ultraviolet radiation generating method 有权
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP1976344A2
公开(公告)日：2008-10-01
申请号：EP08005656.7
申请日：2008-03-26
申请人： TOKYO INSTITUTE OF TECHNOLOGY , Ushio Denki Kabushiki Kaisha
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Mizokoshi, Hiroshi , Yokoyama, Takuma , Seki, Kyohei
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.
摘要翻译：高温等离子原料（21）通过照射具有第一能量束（23）气化。当气化的原料到达排出区域，脉冲功率是电极（11，12）和第二能量束之间施加（24）照射。以这种方式，等离子体加热并激发并在EUV发射的发生。所发射的EUV发射被收集并通过EUV收集器光学器件萃取。因为由第一和第二能量束（23，24）的照射，高温等离子体原料密度的一个特殊的分布可以被设置为可设置排出通道的位置的一个指定的分发和划分。更过，有可能通过在放电路径供给哪原料气体的离子密度，以延长极紫外发射的脉冲的几乎相同的EUV辐射发射的条件下的离子密度。

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