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1. 发明授权

EP1976344B1 Extreme ultraviolet light source device and extreme ultraviolet radiation generating method 有权
标题翻译：极紫外光源装置和极紫外辐射生成方法
公开(公告)号：EP1976344B1
公开(公告)日：2011-04-20
申请号：EP08005656.7
申请日：2008-03-26
申请人： TOKYO INSTITUTE OF TECHNOLOGY , Ushio Denki Kabushiki Kaisha
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Mizokoshi, Hiroshi , Yokoyama, Takuma , Seki, Kyohei
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008

2. 发明公开

EP1976344A3 Extreme ultraviolet light source device and extreme ultraviolet radiation generating method 有权
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP1976344A3
公开(公告)日：2010-04-28
申请号：EP08005656.7
申请日：2008-03-26
申请人： TOKYO INSTITUTE OF TECHNOLOGY , Ushio Denki Kabushiki Kaisha
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Mizokoshi, Hiroshi , Yokoyama, Takuma , Seki, Kyohei
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.

3. 发明公开

EP1976344A2 Extreme ultraviolet light source device and extreme ultraviolet radiation generating method 有权
标题翻译：极端紫外光和方法的光源装置，用于产生极紫外辐射
公开(公告)号：EP1976344A2
公开(公告)日：2008-10-01
申请号：EP08005656.7
申请日：2008-03-26
申请人： TOKYO INSTITUTE OF TECHNOLOGY , Ushio Denki Kabushiki Kaisha
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Mizokoshi, Hiroshi , Yokoyama, Takuma , Seki, Kyohei
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.
摘要翻译：高温等离子原料（21）通过照射具有第一能量束（23）气化。当气化的原料到达排出区域，脉冲功率是电极（11，12）和第二能量束之间施加（24）照射。以这种方式，等离子体加热并激发并在EUV发射的发生。所发射的EUV发射被收集并通过EUV收集器光学器件萃取。因为由第一和第二能量束（23，24）的照射，高温等离子体原料密度的一个特殊的分布可以被设置为可设置排出通道的位置的一个指定的分发和划分。更过，有可能通过在放电路径供给哪原料气体的离子密度，以延长极紫外发射的脉冲的几乎相同的EUV辐射发射的条件下的离子密度。

4. 发明授权

EP2046100B1 A method for generating extreme ultraviolet radiation and an extreme ultraviolet light source device 有权
标题翻译：产生极紫外辐射的方法和设备作为用于极紫外光源
公开(公告)号：EP2046100B1
公开(公告)日：2010-08-18
申请号：EP08017220.8
申请日：2008-09-30
申请人： Tokyo Institute of Technology , USHIODENKI KABUSHIKI KAISHA
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Seki, Kyohei , Yokoyama, Takuma
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005

5. 发明公开

EP2051140A1 An extreme ultraviolet light source device and a method for generating extreme ultraviolet radiation 审中-公开
标题翻译： LichtquellevorrichtungfürExtrem-Ultraviolettlicht und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung
公开(公告)号：EP2051140A1
公开(公告)日：2009-04-22
申请号：EP08018235.5
申请日：2008-10-17
申请人： Tokyo Institute of Technology , USHIODENKI KABUSHIKI KAISHA
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Seki, Kyohei , Mizokoshi, Hiroshi
IPC分类号： G03F7/20 , H05G2/00 , G21K1/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003
摘要： High temperature plasma raw material (21) is added drop-wise, for example, and evaporated by irradiation with a laser beam (23). The laser beam (23) passes through a discharge area between a pair of electrodes (21) and irradiates the high temperature plasma raw material (11,12). Pulsed power is applied to the space between the electrodes (11,12) in such a way that discharge current reaches a specified threshold value (Ip) at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes (11,12), plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap (3), is collected by EUV radiation collector optics (2) and then extracted. The irradiation of the laser beam (23) allows selling of the space density of the high temperature plasma raw material (21) to a specified distribution and defining of the position of a discharge channel.
摘要翻译：例如，将高温等离子体原料（21）逐滴加入，用激光束（23）照射蒸发。激光束（23）通过一对电极（21）之间的放电区域并照射高温等离子体原料（11,12）。将脉冲功率施加到电极（11,12）之间的空间，使得当至少部分蒸发的材料到达放电通道时，放电电流达到规定的阈值（Ip）。结果，在电极（11,12）之间开始放电，等离子体被加热和激发，然后产生EUV辐射。由此产生的EUV辐射通过箔捕获器（3），由EUV辐射收集器光学器件（2）收集，然后提取。激光束（23）的照射允许将高温等离子体原料（21）的空间密度出售到规定的分布并限定排出通道的位置。

6. 发明公开

EP2046100A1 A method for generating extreme ultraviolet radiation and an extreme ultraviolet light source device 有权
标题翻译： Verfahren zum Erzeugen extremer Ultraviolettstrahlung und Vorrichtung als Quellefürextremes Ultraviolettlicht
公开(公告)号：EP2046100A1
公开(公告)日：2009-04-08
申请号：EP08017220.8
申请日：2008-09-30
申请人： Tokyo Institute of Technology , USHIODENKI KABUSHIKI KAISHA
发明人： Hosokai, Tomonao , Horioka, Kazuhiko , Seki, Kyohei , Yokoyama, Takuma
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： To achieve pulse-stretched EUV radiation without putting a large heat load on electrodes or requiring sophisticated control, a pulsed power is supplied between a first electrode and a second electrode provided inside a chamber to form a narrow discharge channel therebetween. A laser beam from a laser source irradiates high temperature plasma material to form low temperature plasma gas having an ion density of approximately 10 17 to 10 20 cm -3 which is supplied to a narrow discharge channel formed between the electrodes. Electric discharge acts on the low temperature plasma gas to raise the electron temperature, resulting in high temperature plasma. As a result, EUV radiation is produced. Since the low temperature plasma gas is continuously supplied to the discharge channel, the pinch effect or confining effect of its self-magnetic field is repeated, resulting in the continuation of EUV radiation.
摘要翻译：为了实现脉冲拉伸的EUV辐射而不对电极施加大的热负荷或需要复杂的控制，在设置在室内的第一电极和第二电极之间提供脉冲功率，以在它们之间形成窄的放电通道。来自激光源的激光束照射高温等离子体材料，形成离子密度为大约10 17至10 20 cm -3的低温等离子体气体，该等离子体气体供给到形成在电极之间的窄排出通道。放电对低温等离子体气体起作用，提高电子温度，导致高温等离子体。结果，产生了EUV辐射。由于低温等离子体气体被连续供给到排出通道，所以重复其自身磁场的夹紧效应或约束效应，导致EUV辐射的持续。

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