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    • 4. 发明公开
    • Method of synthesizing and polishing a flat diamond film
    • Verfahren zur Herstellung und Polierung eines flank Diamantfilmes。
    • EP0666338A1
    • 1995-08-09
    • EP95300431.4
    • 1995-01-25
    • SUMITOMO ELECTRIC INDUSTRIES, LIMITED
    • Ikegaya, Akihiko, c/o Itami Works of SumitomoTanabe, Keiichiro, c/o Itami Works of SumitomoFujimori, Naoji, c/o Itami Works of Sumitomo
    • C23C16/26B24B9/16
    • C23C16/279B24B9/16C23C16/27C23C16/271
    • A flat free-standing diamond film is produced by growing alternately more than one pair of a potential-concave diamond layer and a potential-convex diamond layer on a non-diamond substrate and eliminating the substrate. The potential-concave films are made by a CVD method under a condition (b) of a substrate temperature of 880°C to 950°C and a hydrocarbon ratio of 2.5 vol% to 3.5vol%. The potential-convex films are made by a CVD method under the condition (a) of a substrate temperature of 800°C to 850°C and a hydrocarbon ratio of 0.5 vol% to 1.5 vol%. The condition (a) can make a potential-convex film of a good crystal quality in spite of the slow deposition speed. It is preferable to employ an assembly of thinner potential-convex films and thicker potential-concave films to curtail the total time of synthesis. A multilayered diamond film with an arbitrary curvature can be produced by selecting the production conditions (a) and (b), and the thicknesses of the potential-convex layers and the potential-concave layers.
      The diamond films still fixed on the substrate can be polished by an ordinary polishing apparatus, since the film is flat. A polished flat diamond film can be obtained by eliminating the substrate.
    • 通过在非金刚石基底上交替生长多于一对的潜在 - 凹金刚石层和潜在 - 凸出的金刚石层并消除基底来制造平坦独立的金刚石膜。 在基板温度为880℃〜950℃,烃比为2.5体积%〜3.5体积%的条件(b)下,通过CVD法制作电位凹形膜。 在基板温度为800〜850℃,烃比为0.5体积%〜1.5体积%的条件(a)下,通过CVD法制造电位凸形薄膜。 尽管沉积速度慢,但条件(a)可以制成具有良好晶体质量的潜在凸形膜。 优选使用较薄的电势凸膜和较厚的电势凹膜的组合来缩短总合成时间。 可以通过选择生产条件(a)和(b)以及电位 - 凹陷层和电位 - 凹陷层的厚度来制造具有任意曲率的多层金刚石薄膜。 仍然固定在基板上的金刚石膜可以由普通的抛光装置抛光,因为该膜是平的。 抛光的平面金刚石膜可以通过消除基底而获得。
    • 5. 发明公开
    • Bonding tool having diamond head and method of manufacturing the same
    • Verbindungswerkzeug mit Diamantkopf und dessen Herstellungsverfahren。
    • EP0567124A2
    • 1993-10-27
    • EP93106560.1
    • 1993-04-22
    • SUMITOMO ELECTRIC INDUSTRIES, LIMITED
    • Tanabe, Keiichiro, c/o Itami Works of SumitomoTakahashi, Toshiya, c/o Itami Works of SumitomoIkegaya, Akihiko, c/o Itami Works of SumitomoFujimori, Naoji, c/o Itami Works of Sumitomo
    • H01L21/603H01L21/00C04B41/50B23K20/02C23C16/26
    • C04B41/009B23K20/025C04B41/5002C04B41/85H01L24/79H05K13/003C04B41/4531C04B41/51C04B41/526C04B41/5053C04B35/565C04B35/584C04B35/581
    • A bonding tool (40) has a head portion (45) which consists essentially of vapor-deposited diamond, wherein a principal diamond crystal plane forming a head face (47) is a (111) plane. Such a head face has high hardness, and is hard to wear. In order to improve toughness of a bonding head which is mainly made of vapor-deposited diamond, a portion forming a head face consists essentially of high-purity diamond, and another portion supporting the head face consists essentially of low-purity diamond. The head face has high rigidity, while the portion supporting the head face has high toughness. In order to provide a bonding head portion which is mainly made of vapor-deposited diamond with electrical conductivity, a portion forming a head face consists essentially of polycrystalline diamond containing a relatively small amount of dopant, and another portion supporting this portion contains a large amount of dopant. The head portion having electrical conductivity can be heated by energization. In a tool employing a coating containing vapor-deposited diamond as a bonding head portion, the coating is formed by a complex of a metal or ceramics and vapor-deposited diamond, in order to improve strength of the coating and adhesion to a tool substrate. The metal or ceramics is closer in thermal expansion coefficient to the tool substrate than the diamond.
    • 接合工具(40)具有主要由气相沉积金刚石组成的头部(45),其中形成头部面(47)的主要金刚石晶体面是(111)面。 这样的头部表面硬度高,难以磨损。 为了提高主要由气相沉积金刚石制成的接合头的韧性,形成头部的部分基本上由高纯度的金刚石组成,而支撑头部面的另一部分主要由低纯度的金刚石组成。 头部表面具有高刚性,而支撑头部的部分具有高韧性。 为了提供主要由具有导电性的气相沉积金刚石制成的接合头部分,形成头部面的部分基本上由包含相对少量掺杂剂的多晶金刚石组成,并且支撑该部分的另一部分含有大量 的掺杂剂。 可以通过通电来加热具有导电性的头部。 在使用含有气相沉积金刚石作为粘合头部分的涂层的工具中,通过金属或陶瓷和气相沉积金刚石的复合物形成涂层,以提高涂层的强度和对工具基底的粘附。 与金刚石相比,金属或陶瓷的热膨胀系数比工具基板更热。