专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP4299245A1 SUBSTRATE AND METHOD FOR PRODUCING THE SAME 审中-实审
公开(公告)号：EP4299245A1
公开(公告)日：2024-01-03
申请号：EP23178724.3
申请日：2023-06-12
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： YARITA, Naoki , HARADA, Daijitsu , MATSUI, Harunobu , TAKEUCHI, Masaki
IPC分类号： B24B7/04 , B24B7/24
摘要： Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm.
The present invention provides a method for producing a substrate in which final polishing is performed by a polishing apparatus having an upper polishing plate equipped with a polishing pad, the method comprising the steps of placing a substrate stock in the polishing apparatus so that the main surface of the substrate stock face toward the upper polishing plate; rotating the upper polishing plate and polishing the substrate stock concomitantly with a polishing slurry on the main surface of the substrate stock; and raising the upper polishing plate which is kept being rotated to separate it from the main surface of the polished substrate stock.

2. 发明公开

EP4002499A1 BONDING AND SEALING MATERIAL, AND LID FOR OPTICAL DEVICE PACKAGE 审中-公开
公开(公告)号：EP4002499A1
公开(公告)日：2022-05-25
申请号：EP21206352.3
申请日：2021-11-04
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： MATSUI, Harunobu , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： H01L33/56
摘要： A bonding and sealing material includes, as the essential ingredients, a solder powder, silver nanoparticles coated with a coating material and a solvent, and additionally includes at least one ingredient selected from the group consisting of selenium metal, oxide film inhibitors and oxide film removers. This bonding and sealing material can easily form under mild conditions a metallic adhesive layer having good hermetic sealability and UV resistance of the sort desired when sealing a short-wavelength light-emitting device such as a UV-LED, and can be stably used over a long period of time.

3. 发明公开

EP3923071A1 MASK BLANK GLASS SUBSTRATE 审中-公开
公开(公告)号：EP3923071A1
公开(公告)日：2021-12-15
申请号：EP21176735.5
申请日：2021-05-28
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： YARITA, Naoki , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： G03F1/24 , C03C3/06 , C03C17/36 , C03C23/00 , G02B5/08 , G03F1/52 , G03F1/60 , G03F1/84 , G21K1/06
摘要： A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm 4 or less at a spatial frequency of 0.1 µm -1 or more and 20 µm -1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 µm × 10 µm with an atomic force microscope.

4. 发明授权

EP3093105B1 METHOD FOR PRODUCING SUBSTRATES 有权
公开(公告)号：EP3093105B1
公开(公告)日：2020-06-24
申请号：EP16169066.4
申请日：2016-05-10
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： MATSUI, Harunobu , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： B24B37/10 , B24B37/04 , B24B37/08 , B24B7/22 , B24B7/24

5. 发明公开

EP3354633A1 SYNTHETIC QUARTZ GLASS LID PRECURSOR, SYNTHETIC QUARTZ GLASS LID, AND PREPARATION METHODS THEREOF 有权
公开(公告)号：EP3354633A1
公开(公告)日：2018-08-01
申请号：EP18153630.1
申请日：2018-01-26
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： MATSUI, Harunobu , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： C04B37/04 , C03C17/10 , C03C17/40 , C03C27/00
摘要： A synthetic quartz glass lid for use in optical device packages is prepared by furnishing a synthetic quartz glass lid precursor comprising a synthetic quartz glass substrate (1) and a metal or metal compound film (2), and forming a metal base adhesive layer (3) on the metal or metal compound film (2). The metal or metal compound film contains Ag, Bi, and at least one element selected from P, Sb, Sn and In.

6. 发明公开

EP3216576A1 METHOD FOR PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE 有权
标题翻译：制备合成石英玻璃基板的方法
公开(公告)号：EP3216576A1
公开(公告)日：2017-09-13
申请号：EP17159011.0
申请日：2017-03-02
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： ISHITSUKA, Yoko , WATABE, Atsushi , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： B28D5/00 , B28D5/04 , G01N21/23
CPC分类号： C03B33/02 , B28D5/00 , C03C3/06 , C03C15/00 , C03C17/28 , C03C2201/02 , C03C2203/50 , C03C2218/114 , C03C2218/32 , G01B11/06 , G01N21/23
摘要： Synthetic quartz glass substrates are prepared by furnishing synthetic quartz glass blocks, coating two opposed surfaces of each glass block with a liquid having a transmittance of at least 99.0 %/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.
摘要翻译：通过提供合成石英玻璃块来制备合成石英玻璃基板，在双折射测量波长处用透射率至少为99.0％/ mm的液体涂覆每个玻璃块的两个相对表面，通过指示光来测量玻璃块的双折射率然后，基于双折射测量和衬底的尺寸确定切片厚度，并且以确定的切片厚度切片玻璃块。

7. 发明公开

EP4403532A1 WINDOW MATERIAL FOR OPTICAL ELEMENT, LID FOR OPTICAL ELEMENT PACKAGE, AND OPTICAL ELEMENT PACKAGE 审中-公开
公开(公告)号：EP4403532A1
公开(公告)日：2024-07-24
申请号：EP24151454.6
申请日：2024-01-11
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： MATSUI, Harunobu , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： C03C17/34 , C03C15/00 , G02B1/115 , G02B5/02 , H01L33/00 , C04B37/00
CPC分类号： C03C17/3417 , C03C17/3452 , C03C2204/0820130101 , C03C2217/73420130101 , C03C15/00 , G02B1/115 , G02B5/021 , H01L33/58
摘要： A window material for an optical element, including: a synthetic quartz glass substrate having a flat plate shape and having main surfaces through which light is transmitted, at least one of the main surfaces being a rough surface; and an antireflection film formed on the at least one main surface of the synthetic quartz glass substrate, the main surface being the rough surface. The window material for an optical element of the present invention is easy in shape processing, undergoes little temporal change in a wide wavelength region and is stable over a long period of time, and has high total light transmittance of distributed light.

8. 发明公开

EP4095210A1 POLISHING COMPOSITION 审中-实审
公开(公告)号：EP4095210A1
公开(公告)日：2022-11-30
申请号：EP22170941.3
申请日：2022-04-29
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： YARITA, Naoki , HARADA, Daijitsu , MATSUI, Harunobu , TAKEUCHI, Masaki
IPC分类号： C09G1/02
摘要： A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiO 2 as a main component, particularly, as a substrate for mask blanks used in EUVL.

9. 发明公开

EP3909921A1 SUBSTRATE FOR TRANSFERRING MICROSTRUCTURES AND METHOD FOR MANUFACTURING THE SAME 有权
公开(公告)号：EP3909921A1
公开(公告)日：2021-11-17
申请号：EP21172346.5
申请日：2021-05-05
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： UEDA, Shuhei , TAKEUCHI, Masaki , YAMAZAKI, Hiroyuki , TSUKADA, Kento
IPC分类号： C03C3/06 , C03C17/30 , C03C23/00
摘要： Provided is a substrate for transferring microstructures such as a micro LED including an engraved mark. The substrate for transferring microstructures is less likely to cause a recognizing error of the engraved mark to occur in a reading device, and makes it possible to stably and continuously read the engraved mark.
A substrate for transferring microstructures includes a synthetic quartz glass substrate and a silicone pressure-sensitive adhesive agent layer provided on a front surface of the synthetic quartz glass substrate. The substrate includes an engraved mark provided in the front surface.

10. 发明公开

EP2607445A2 Method for recovery of cerium oxide 有权
标题翻译： Verfahren zur Wiedergewinnung eines Ceroxids
公开(公告)号：EP2607445A2
公开(公告)日：2013-06-26
申请号：EP12197351.5
申请日：2012-12-14
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： MATSUI, Harunobu , HARADA, Daijitsu , TAKEUCHI, Masaki
IPC分类号： C09K3/14
CPC分类号： C09K3/1409 , C01F17/0043 , C09G1/02
摘要： A method for recovery of cerium oxide from the abrasive waste composed mainly of cerium oxide arising from the polishing of glass substrates, said method including the steps of (i) adding to the abrasive waste an aqueous solution of a basic substance; (ii) adding to the resulting solution a precipitant, thereby forming precipitates composed mainly of cerium oxide, and removing the supernatant liquid; (iii) adding to the resulting precipitates a solution of an acid substance, thereby making said precipitate slightly acid to neutral; (iv) washing the precipitates with an organic solvent; and (v) drying and crushing the precipitates.
The method makes it possible to recycle abrasive waste into a pure abrasive composed mainly of cerium oxide which can be reused to polish synthetic quartz glass substrates for state-of-the-art semiconductor technology relating to photomasks and reticles.
摘要翻译：一种从由玻璃基板抛光产生的主要由氧化铈组成的磨料废料回收氧化铈的方法，所述方法包括以下步骤：（i）向研磨废料中加入碱性物质的水溶液; （ii）向所得溶液中加入沉淀剂，从而形成主要由氧化铈组成的析出物，除去上清液; （iii）向所得沉淀中加入酸性物质的溶液，从而使所述沉淀物略微酸中性; （iv）用有机溶剂洗涤沉淀物; 和（v）干燥并粉碎沉淀物。该方法可以将磨料废料回收成主要由氧化铈组成的纯磨料，这可以重复使用以抛光合成石英玻璃基底，用于与光掩模和掩模版有关的最先进的半导体技术。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式