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1. 发明授权

EP1853972B1 NORBORNENE-TYPE POLYMERS AND THEIR MANUFACTURE PROCESS 有权
标题翻译：降冰片烯和生产过程
公开(公告)号：EP1853972B1
公开(公告)日：2011-07-20
申请号：EP06735544.6
申请日：2006-02-21
申请人： Promerus LLC , TOKYO OHKA KOGYO CO., LTD.
发明人： RHODES, Larry, F. , CHANG, Chun , KANDANARACHCHI, Pramod , SEGER, Lawrence, D. , ISHIDUKA, Keita, Tokyo Ohka Kogyo Co., Ltd. , ENDO, Kotaro, Tokyo Ohka Kogyo Co., Ltd. , ANDO, Tomoyuki, Tokyo Ohka Kogyo Co., Ltd.
IPC分类号： G03F7/004
CPC分类号： G03F7/11 , C08F232/08 , C08G61/06 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.

2. 发明公开

EP1853972A2 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS 有权
标题翻译：降冰片烯和生产过程
公开(公告)号：EP1853972A2
公开(公告)日：2007-11-14
申请号：EP06735544.6
申请日：2006-02-21
申请人： Promerus LLC , TOKYO OHKA KOGYO CO., LTD.
发明人： RHODES, Larry, F. , CHANG, Chun , KANDANARACHCHI, Pramod , SEGER, Lawrence, D. , ISHIDUKA, Keita, Tokyo Ohka Kogyo Co., Ltd. , ENDO, Kotaro, Tokyo Ohka Kogyo Co., Ltd. , ANDO, Tomoyuki, Tokyo Ohka Kogyo Co., Ltd.
IPC分类号： G03F7/038
CPC分类号： G03F7/11 , C08F232/08 , C08G61/06 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.

3. 发明公开

EP2643371A1 A SELF-IMAGEABLE FILM FORMING POLYMER, COMPOSITIONS THEREOF AND DEVICES AND STRUCTURES MADE THEREFROM 有权
标题翻译：自可映射成膜聚合物组合物中和设备和其结构
公开(公告)号：EP2643371A1
公开(公告)日：2013-10-02
申请号：EP11797070.7
申请日：2011-11-23
申请人： Promerus, LLC , Sumitomo Bakelite Co., Ltd.
发明人： ONISHI, Osamu , IKEDA, Haruo , RHODES, Larry, F. , KANDANARACHCHI, Pramod
IPC分类号： C08F222/06 , C08F220/52 , C08F210/14 , G03F7/038
CPC分类号： G03F7/0382 , C08F222/06 , C08F232/08 , G03F7/0233 , G03F7/0395
摘要： Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic anhydride-type repeating unit, which can be formulated to be either positive, tone imaging or negative tone imaging. The films formed thereby are useful-as self-imageable layers in the manufacture of microelectronic, such as semiconductor, and optoelectronic devices.

4. 发明授权

EP1791888B1 POLYCYCLOOLEFIN POLYMERIC COMPOSITIONS FOR SEMICONDUCTOR APPLICATIONS 有权
标题翻译：用于半导体应用的聚环烯烃聚合物组合物
公开(公告)号：EP1791888B1
公开(公告)日：2009-03-25
申请号：EP05786286.4
申请日：2005-08-17
申请人： Promerus, LLC
发明人： RAVIKIRAN, Ramakrisha , NG, Hendra , PUTHENKOVILAKOM, Rajesh, Raja , ZHANG, Linda , AMOROSO, Dino , KNAPP, Brian , BELL, Andrew , RHODES, Larry, F.
IPC分类号： C08G61/08
CPC分类号： C08K5/0091 , C08G61/06 , C08K3/36 , C08K5/5425 , C08L65/00 , C08L45/00
摘要： Polymeric compositions for semiconductor applications comprising 10 to 99 wt.% of norbornene-type cycloolefin monomers represented by one or more of Formulae I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt.% of an addition polymerization procatalyst, and optionally: up to 0.5 wt.% of a cocatalyst, up to 59 wt.% of a crosslinking monomer, up to 50 wt.% of a viscosifier, up to 20 wt.% of a thixotropic additive(s), up to 80 wt.% of a filler, up to 10 wt.% of an antioxidant, and up to 0.6 wt.% of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.
摘要翻译：用于半导体应用的聚合物组合物包含10至99重量％由式I（a），I（b）和任选的I（c）和/或I（d）中的一种或多种表示的降冰片烯型环烯烃单体，0.0005 至0.5重量％的加成聚合前催化剂，和任选地：至多0.5重量％的助催化剂，至多59重量％的交联单体，至多50重量％的增粘剂，至多20重量％％的触变添加剂，至多80重量％的填充剂，至多10重量％的抗氧化剂和至多0.6重量％的抗氧化剂增效剂，所述制剂的组分总量加入高达100％。这样的配方被大量聚合或固化以形成具有多种特定电子，微电子，光电子和微光电子应用所需性能的聚合物组合物，例如管芯粘合剂，底部填充材料，预浸料粘合剂，密封剂，保护层和其他相关应用。

5. 发明公开

EP1711542A2 DIRECTLY PHOTODEFINABLE POLYMER COMPOSITIONS AND METHODS THEREOF 有权
标题翻译： DIRECT光限定聚合物组合物和方法
公开(公告)号：EP1711542A2
公开(公告)日：2006-10-18
申请号：EP05712781.3
申请日：2005-01-28
申请人： Promerus, LLC , Ravikiran, Ramakrishna
发明人： ELCE, Edmund , RHODES, Larry, F. , SHICK, Robert , JAYARAMAN, Saikumar
IPC分类号： C08F32/00 , G02B6/122 , G02B6/132 , G03F7/038
CPC分类号： G03F7/0388 , C08F220/40 , C08F230/08 , C08F232/08 , G03F7/0758
摘要： The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate containing radical.

6. 发明公开

EP1597627A2 DISSOLUTION RATE MODIFIERS FOR PHOTORESIST COMPOSITIONS 审中-公开
标题翻译：对于照片AUFLÖSUNGSGESCHWINDIGKEITSMODIFIKATOREN抗蚀剂组合物
公开(公告)号：EP1597627A2
公开(公告)日：2005-11-23
申请号：EP04713359.0
申请日：2004-02-20
申请人： Promerus LLC
发明人： RHODES, Larry, F. , SEGER, Larry , GOODALL, Brian, L. , MCINTOSH, Lester, H., III , DUFF, Robert, J.
IPC分类号： G03F1/00
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要： Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.

7. 发明公开

EP1597287A2 VINYL ADDITION POLYCYCLIC OLEFIN POLYMERS PREPARED WITH NON-OLEFINIC CHAIN TRANSFER AGENTS AND USES THEREOF 有权
标题翻译：与非烯烃链转移资金生产的乙烯基加成聚合物的多环烯烃及其应用
公开(公告)号：EP1597287A2
公开(公告)日：2005-11-23
申请号：EP04713355.8
申请日：2004-02-20
申请人： Promerus LLC
发明人： RHODES, Larry, F. , BARNES, Dennis, A. , BELL, Andrew , BENNETT, Brian, K. , CHANG, Chung , LIPIAN, John-Henry , WU, Xiaoming
IPC分类号： C08F4/80 , C08F30/08 , C08F36/00 , G03F7/004 , G03F7/039
CPC分类号： C08F2/38 , C08F232/00 , C08F232/08 , Y10S526/905
摘要： A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

8. 发明授权

EP2651996B1 TRANSPARENT LAYER FORMING POLYMER 有权
公开(公告)号：EP2651996B1
公开(公告)日：2018-06-06
申请号：EP11808429.2
申请日：2011-12-13
申请人： Promerus, LLC , Sumitomo Bakelite Co., Ltd.
发明人： ONISHI, Osamu , RHODES, Larry, F. , TAGASHIRA, Nobuo
IPC分类号： C08F232/08 , G03F7/038
CPC分类号： C08F232/08 , G03F7/038
摘要： Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.

9. 发明授权

EP2814855B1 PLANARIZATION LAYER FOR ORGANIC ELECTRONIC DEVICES 有权转让
标题翻译：用于有机电子器件的平面化层
公开(公告)号：EP2814855B1
公开(公告)日：2017-07-26
申请号：EP13703525.9
申请日：2013-01-29
申请人： Merck Patent GmbH , Promerus, LLC
发明人： WIERZCHOWIEC, Piotr , MISKIEWICZ, Pawel , BACKLUND, Tomas , TAN, Li Wei , BROOKES, Paul, Craig , AFONINA, Irina , RHODES, Larry, F. , BELL, Andrew
IPC分类号： C08F232/08 , H01L51/05
CPC分类号： H01L51/107 , C08F232/08 , C08G2261/418 , H01L51/0001 , H01L51/0012 , H01L51/0034 , H01L51/0035 , H01L51/0094 , H01L51/0096 , H01L51/0508 , H01L51/0541 , H01L51/0545 , Y02E10/549 , Y02P70/521

10. 发明公开

EP2898551A1 ORGANIC SEMICONDUCTOR FORMULATIONS 有权转让
标题翻译：有机半导体配方
公开(公告)号：EP2898551A1
公开(公告)日：2015-07-29
申请号：EP13759669.8
申请日：2013-09-05
申请人： Merck Patent GmbH , Promerus LLC
发明人： WIERZCHOWIEC, Piotr , MISKIEWICZ, Pawel , TAN, Li Wei , BHINTADE, Rashmi , BROOKES, Paul, Craig , RHODES, Larry, F. , BURGOON, Hugh, A.
IPC分类号： H01L51/00 , C07C13/42 , C07C13/43 , C08G61/08
CPC分类号： H01L51/0094 , C08G2261/3424 , C08G2261/92 , C08K5/548 , C08L2203/20 , C09D145/00 , H01L51/0003 , H01L51/0032 , H01L51/0052 , H01L51/0058 , H01L51/0074 , H01L51/052 , H01L51/0541 , H01L51/0545 , H01L51/0558 , H01L51/107 , Y02E10/549
摘要： Embodiments in accordance with the present invention relate generally to formulations for use in organic semiconductor layers of organic electronic devices, and more specifically in organic field effect transistors, to organic semiconductor layers prepared from such formulations, and to organic electronic devices and organic field effect transistors encompassing such organic semiconductor layers.
摘要翻译：根据本发明的实施例一般涉及用于有机电子器件的有机半导体层中的配方，更具体地涉及有机场效应晶体管，涉及由这种配方制备的有机半导体层，并且涉及有机电子器件和有机场效应晶体管包含这种有机半导体层。

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