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    • 1. 发明公开
    • COMPOSITION FOR ETCHING TREATMENT OF RESIN MOLDED ARTICLE
    • ZUSAMMENSETZUNG ZURÄTZBEHANDLUNGVONHARZFORMKÖRPER
    • EP2009142A1
    • 2008-12-31
    • EP07737680.4
    • 2007-03-02
    • Okuno Chemical Industries Co. Ltd
    • SATOU, KazuyaYOSHIKANE, Yusuke
    • C23C18/24
    • C23C18/24C23C18/2086C23C18/31
    • The present invention provides a composition for the etching treatment of a resin molded article. The composition is composed of an aqueous solution containing 20 to 1,200 g/l of an inorganic acid, 0.01 to 10 g/l of a manganese salt, and 1 to 200 g/l of at least one component selected from the group consisting of halogen oxoacids, halogen oxoacid salts, persulfate salts, and bismuthate salts.
      The etching composition of the invention is a novel etching solution capable of forming a plating film having a good adhesion to various resin molded articles made of ABS resins or the like, and can be used in place of chromic acid mixtures. The composition is highly safe so that the liquid waste is easily disposed of.
    • 本发明提供了一种用于树脂模塑制品的蚀刻处理的组合物。 该组合物由含有20〜1200g / l的无机酸,0.01〜10g / l的锰盐和1〜200g / l的选自卤素的组分的水溶液 含氧酸,卤素含氧酸盐,过硫酸盐和铋酸盐。 本发明的蚀刻组合物是能够形成对由ABS树脂等制成的各种树脂模塑制品具有良好粘附性的镀膜的新型蚀刻溶液,并且可以用于代替铬酸混合物。 该组合物是高度安全的,因此易于处理废液。