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1. 发明公开

EP2984674A1 SPUTTERTARGET MIT ERHÖHTER LEISTUNGSVERTRÄGLICHKEIT 有权转让
标题翻译： SPUTTERTARGET MITERHÖHTERLEISTUNGSVERTRÄGLICHKEIT
公开(公告)号：EP2984674A1
公开(公告)日：2016-02-17
申请号：EP14718509.4
申请日：2014-04-07
申请人： Oerlikon Surface Solutions AG, Trübbach
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg , KERSCHBAUMER, Joerg
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/3438 , H01J37/3467 , H01J37/3497
摘要： The invention relates to a plate centering system, comprising a plate having a holder, wherein the plate is centered in the holder both at room temperatures and at higher temperatures, independently of the heat expansion of the plate and the holder, and wherein the plate can freely expand in the holder at higher temperatures. The invention relates in particular to a target having a target comprising a frame-shaped target mount, which is very well suited in a coating source for high power impulse magnetron sputtering of the target.
摘要翻译：板对中系统，其具有带有保持器的板，其中板在室温和较高温度下在保持器中居中，独立于板和保持器的热膨胀，并且板可以自由地膨胀持有人在较高的温度。本发明具体涉及一种具有框架型目标安装座的目标，其非常适合用于目标的大功率脉冲磁控溅射的涂层源。

2. 发明公开

EP2932523A1 PLASMAQUELLE 有权转让
公开(公告)号：EP2932523A1
公开(公告)日：2015-10-21
申请号：EP13802538.2
申请日：2013-12-09
申请人： Oerlikon Surface Solutions AG, Trübbach
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg
IPC分类号： H01J37/32
CPC分类号： H01J37/3233 , C23C16/50 , H01J37/3244 , H01J37/32596 , H01J2237/3321 , H05H1/50
摘要： The present invention relates to a plasma generating device comprising a plasma source having a plasma source hollow body (1) and an electron emission unit (5) which makes it possible to emit free electrons into the plasma source hollow body, wherein the plasma source hollow body (1) has a first gas inlet (7a) and a plasma source opening (10) which forms an opening to a vacuum chamber, and further comprising an anode having an anode hollow body (2), wherein the anode hollow body (2) has a second gas inlet (7b) and an anode opening (11) which forms an opening to the vacuum chamber, and a voltage source (8) the negative pole of which is connected to the electron emission unit (5) and the positive pole of which is connected to the anode hollow body (2), wherein the positive pole of the voltage source (8) is additionally electrically connected by means of a first shunt (6a) to the plasma source hollow body.
摘要翻译：本发明涉及一种等离子体发生装置，其包括具有等离子体源空心体（1）和电子发射单元（5）的等离子体源，该电子发射单元使得有可能将自由电子发射到等离子体源空心体中，其中等离子体源空心（1）具有形成真空室开口的第一气体入口（7a）和等离子体源开口（10），并且还包括具有阳极中空体（2）的阳极，其中阳极中空体（2））具有形成真空室开口的第二气体入口（7b）和阳极开口（11），以及负极连接到电子发射单元（5）的电压源（8），并且正极其极与阳极中空体（2）连接，其中电压源（8）的正极通过第一分流器（6a）附加地电连接到等离子体源中空体。

3. 发明公开

EP3019640A1 TARGET ZUR REAKTIVEN SPUTTER-ABSCHEIDUNG ELEKTRISCH-ISOLIERENDER SCHICHTEN 有权转让
标题翻译：目标反应溅射沉积电绝缘LAYERS
公开(公告)号：EP3019640A1
公开(公告)日：2016-05-18
申请号：EP14739679.0
申请日：2014-07-09
申请人： Oerlikon Surface Solutions AG, Trübbach
发明人： HAGMANN, Juerg , KRASSNITZER, Siegfried
IPC分类号： C23C14/08 , C23C14/34 , C23C14/00 , C23C14/35 , H01J37/34
摘要： The invention relates to a target, the target surface thereof being designed in such a way that due to the use of the implied target for reactive sputter-deposition of electrically insulating layers in a coating chamber, a spark discharge from the target surface to an anode which is also prevented in the coating chamber, is formed.

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