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1. 发明公开

EP3088858A1 TEMPERATURE MEASUREMENT METHOD FOR ULTRAVIOLET TRANSMITTANCE MEMBER, TEMPERATURE MEASUREMENT DEVICE FOR ULTRAVIOLET TRANSMITTANCE MEMBER, AND LIGHT SOURCE DEVICE 审中-公开
标题翻译： TEMPERATURMESSVERFAHRENFÜREINULTRAVIOLETTDURCHLÄSSIGESELEMENT，TEMPERATURMESSVORRICHTUNGFÜREINULTRAVIOLETTDURCHLÄSSIGESELEMENT UND LICHTQUELLENVORRICHTUNG
公开(公告)号：EP3088858A1
公开(公告)日：2016-11-02
申请号：EP14874513.6
申请日：2014-12-26
申请人： Nikon Corporation
发明人： MIZUGUCHI, Masafumi
IPC分类号： G01K11/12 , G01N21/33
CPC分类号： G01J5/0003 , G01J5/10 , G01J5/58 , G01K11/12
摘要： Provided is a temperature measurement method, a temperature measurement device, and the like which are capable of measuring the temperature of an ultraviolet light transmittance member by using a concise configuration. One aspect exemplifying the present invention is a temperature measurement device for measuring the temperature of an ultraviolet light transmittance member transmitting ultraviolet light. The temperature measurement device (2) includes a spectroscopic measurement unit (20) for detecting the intensity distribution of the ultraviolet light (UV1) transmitted through the ultraviolet light transmittance member; and a calculation processing unit (25) for obtaining the absorption edge wavelength of the ultraviolet light transmittance member from the intensity distribution of the ultraviolet light detected by the spectroscopic measurement unit (20), and deriving the temperature of the ultraviolet light transmittance member on the basis of the obtained absorption edge wavelength.
摘要翻译：提供了能够通过简洁的结构测量紫外线透射率部件的温度的温度测量方法，温度测量装置等。本发明的一个方面是用于测定透过紫外线的紫外线透射性部件的温度的温度测定装置。温度测量装置（2）包括用于检测通过紫外线透射构件透射的紫外线（UV1）的强度分布的光谱测量单元（20）以及计算处理单元（25），用于根据由所述分光测量单元（20）检测的紫外线的强度分布获得紫外线透射率构件的吸收边缘波长，并且导出紫外线透射率构件的温度获得的吸收边缘波长的基础。

2. 发明公开

EP1854769A1 SYNTHETIC QUARTZ GLASS MOLDED PRODUCT, MOLDING METHOD THEREFOR AND METHOD FOR INSPECTING SYNTHETIC QUARTZ GLASS MOLDED PRODUCT 有权
标题翻译： VERFAHREN ZUR FORMGEBUNG EINES FORMPRODUKTES AUS SYNTHETISCHEM QUARZGLAS
公开(公告)号：EP1854769A1
公开(公告)日：2007-11-14
申请号：EP06713315.7
申请日：2006-02-08
申请人： NIKON CORPORATION
发明人： MIZUGUCHI, Masafumi , ABE, Tetsuya
IPC分类号： C03B20/00 , C03C3/06 , G01N21/64
CPC分类号： G01N21/64 , C03B11/08 , C03B23/0013 , C03B40/02 , C03B2201/03 , C03C3/06 , C03C23/0075 , C03C2201/32 , C03C2201/40 , C03C2203/52 , G01N21/6402 , Y02P40/57
摘要： A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising:
a step of washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm 2 or less, and so that a concentration of aluminium thereon is 10 ng/cm 2 or less, before accommodating the synthetic silica glass block in the mold;
a step of heating high purity carbon powders in which a content of copper is 40 wt.ppb or less and a content of aluminium is 100 wt.ppb or less at a temperature condition of 1200°C to 1900°C;
a step of heating the mold at a temperature condition of 1700°C to 1900°C;
a step of applying the high purity carbon powders after the heating step on the inner surface of the mold after the heating step, before accommodating the synthetic silica glass block in the mold; and
a step of molding the synthetic silica glass block in a predetermined form by pressing the block by means of the pressing portion while heating so as to the temperature of the block can be within a hold temperature range of 1500°C to 1700°C, after accommodating the washed synthetic silica glass block in the mold.
摘要翻译：一种合成石英玻璃成形体的成型方法，其特征在于，在具有加压部的模具中容纳合成石英玻璃块，并且在加热的同时按压块，所述方法包括：洗涤合成石英玻璃块，使得存在于合成石英玻璃块的表面上的铜的浓度为2ng / cm 2以下，并且在将合成石英玻璃块容纳在其中之前，其上的铝浓度为10ng / cm 2以下模子; 在1200℃〜1900℃的温度条件下，对铜的含量为40重量ppm以下且铝的含量为100重量ppm以下的高纯度碳粉末进行加热的工序; 在1700℃至1900℃的温度条件下加热模具的步骤; 在将合成石英玻璃块容纳在模具中之后，在加热步骤之后将高纯度碳粉末加热到加热步骤后的模具的内表面上的步骤; 以及通过在加热的同时通过按压部分压块而使所述合成石英玻璃块成型为使得所述块的温度可以在1500℃至1700℃的保持温度范围内的步骤，在将洗涤的合成石英玻璃块容纳在模具中之后。

3. 发明公开

EP1596424A9 EXPOSURE APPARATUS AND OPTICAL MEMBER FOR EXPOSURE APPARATUS 有权
标题翻译：曝光装置及光学部件FOR曝光装置
公开(公告)号：EP1596424A9
公开(公告)日：2006-10-25
申请号：EP04711441.8
申请日：2004-02-16
申请人： NIKON CORPORATION
发明人： MIZUGUCHI, Masafumi , KOMINE, Norio
IPC分类号： H01L21/027 , G03F7/20 , G02B1/02
CPC分类号： G03F7/70958 , G03F7/70041 , G03F7/70591 , G03F7/70883 , G03F7/70941
摘要： In an exposure apparatus, an exposure object 15 is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12. At least one of the plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12 is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: τ I - 2 L - 1.7 ≥ 0.02 ( ns ⋅ m J - 2 ⋅ cm 2.3 ⋅ pulse 2 ) (L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm -2 ·pulse -1 ) per pulse, and τ is the pulse width (unit: ns)) .

4. 发明公开

EP1491513A1 SYNTHETIC QUARTZ GLASS MEMBER AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：合成胶原蛋白（HERSTELLUNGSVERFAHRENDAFÜR）
公开(公告)号：EP1491513A1
公开(公告)日：2004-12-29
申请号：EP03712920.2
申请日：2003-03-25
申请人： Nikon Corporation
发明人： MIZUGUCHI, Masafumi , FUJIWARA, Seishi , KOMINE, Norio
IPC分类号： C03C3/06 , C03B20/00
CPC分类号： C03C3/06 , C03B19/1469 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C23/0025 , C03C2201/12 , C03C2201/21 , C03C2201/23 , Y02P40/57
摘要： In a method for producing a quartz glass member, an F 2 laser is radiated onto a sample obtained from a quartz glass base material under a predetermined condition to judge whether or not a peak intensity of H 2 Raman scattering light is decreased by not less than 80 % as compared with a peak intensity of H 2 Raman scattering light obtained for a sample not irradiated with the F 2 laser. If the peak intensity of H 2 Raman scattering light is decreased by less than 80 %, then it is judged that the laser resistance of the quartz glass base material is sufficient, and the synthetic quartz glass member is processed from the base material. The compaction of the sample is also measured.
摘要翻译：相对于未暴露于石英玻璃基材的样品，暴露于氟激光的石英玻璃基材的样品的氢拉曼散射辐射的峰强度降低时，石英玻璃基材的激光电阻是令人满意的到氟激光的含量小于80％，由该材料制造合成石英玻璃成分。将石英玻璃基材的样品暴露于氟激光。测量暴露于氟激光的样品（S1）和不暴露于氟激光的样品（S）的氢拉曼散射辐射的峰值强度。当样品（S1）相对于样品（S）的峰强度的降低小于80％时，基材的激光电阻是令人满意的。还测量样品的压实，并从基材获得合成石英玻璃组分。

5. 发明公开

EP3358377A1 OPTICAL MEMBER, CHAMBER, AND LIGHT SOURCE DEVICE 审中-公开
公开(公告)号：EP3358377A1
公开(公告)日：2018-08-08
申请号：EP16851404.0
申请日：2016-09-26
申请人： Nikon Corporation
发明人： MIZUGUCHI, Masafumi
IPC分类号： G02B1/115 , G03F7/20 , H01S3/034
CPC分类号： G02B1/115 , C03C17/245 , C03C2217/213 , C03C2217/228 , C03C2217/734 , C03C2218/154 , G02B1/14 , G03F7/20 , H01S3/034 , H01S3/0388 , H01S3/2253
摘要： An optical member (100) is provided with a substrate (10) and a Cu-proof protective layer (23) formed on or above the substrate.

6. 发明公开

EP3438332A1 ALUMINUM OXIDE, METHOD FOR PRODUCING ALUMINUM OXIDE, AND OPTICAL MEMBER 有权
公开(公告)号：EP3438332A1
公开(公告)日：2019-02-06
申请号：EP16896862.6
申请日：2016-03-30
申请人： Nikon Corporation
发明人： MIZUGUCHI, Masafumi
IPC分类号： C30B29/20 , C30B33/02 , G02B5/30
摘要： Aluminum oxide provides, at a thickness of 5 mm, an internal transmittance of 90% or higher for light at a wavelength of 193 nm.

7. 发明授权

EP1652972B1 PRODUCTION METHOD FOR AN EXPOSURE SYSTEM 失效转让
标题翻译：方法曝光系统
公开(公告)号：EP1652972B1
公开(公告)日：2012-05-30
申请号：EP04747307.9
申请日：2004-07-09
申请人： NIKON CORPORATION
发明人： MIZUGUCHI, Masafumi , KOMINE, Norio , JINBO, Hiroki
IPC分类号： G03F7/20 , G02B5/04
CPC分类号： G03F7/70075 , G02B5/04 , G03F7/70958
摘要： An exposure apparatus includes an illumination optical system configured to illuminate a mask by using a laser beam having a wavelength shorter than 250 nm as a light source, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae therein satisfying either grade 1 or grade 2 as defined in Japan Optical Glass Industry Society Standard (JOGIS), an absorption coefficient ± for an infrared absorption band of a hydroxyl group located at 3585 cm -1 being equal to or below 0.035/cm, and the content of aluminum being equal to or below 1 ppm while the content of lithium being equal to or below 0.5 ppm.

8. 发明公开

EP3658598A1 PHOTOCURABLE COMPOSITION AND METHOD OF MANUFACTURING THREE-DIMENSIONAL OBJECT 有权
公开(公告)号：EP3658598A1
公开(公告)日：2020-06-03
申请号：EP17919478.2
申请日：2017-07-28
申请人： Nikon Corporation , Essilor International
发明人： MIYAKAWA, Akiko , MIZUGUCHI, Masafumi
IPC分类号： C08F220/10 , B29C64/124 , B33Y10/00 , B33Y70/00 , B33Y80/00

9. 发明授权

EP1596424B1 EXPOSURE APPARATUS AND METHOD OF EXPOSING A PATTERN 有权
标题翻译：曝光装置及方法图案曝光
公开(公告)号：EP1596424B1
公开(公告)日：2016-11-02
申请号：EP04711441.8
申请日：2004-02-16
申请人： Nikon Corporation
发明人： MIZUGUCHI, Masafumi , KOMINE, Norio
IPC分类号： G03F7/20 , G02B1/00 , C03B20/00
CPC分类号： G03F7/70958 , G03F7/70041 , G03F7/70591 , G03F7/70883 , G03F7/70941
摘要： In an exposure apparatus, an exposure object 15 is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12. At least one of the plurality of optical components 2, 4a, 4b, 6, 7, 9, and 12 is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: Ä I - 2 L - 1.7 ‰¥ 0.02 €ƒ ( ns ‹ m J - 2 ‹ cm 2.3 ‹ pulse 2 ) (L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm -2 ·pulse -1 ) per pulse, and Ä is the pulse width (unit: ns)) .

10. 发明授权

EP1854769B1 METHOD OF MOLDING A SYNTHETIC QUARTZ GLASS MOLDED BODY 有权
标题翻译：法形成的成型产品合成石英玻璃
公开(公告)号：EP1854769B1
公开(公告)日：2012-01-25
申请号：EP06713315.7
申请日：2006-02-08
申请人： NIKON CORPORATION
发明人： MIZUGUCHI, Masafumi , ABE, Tetsuya
IPC分类号： C03B20/00 , C03C3/06 , G01N21/64
CPC分类号： G01N21/64 , C03B11/08 , C03B23/0013 , C03B40/02 , C03B2201/03 , C03C3/06 , C03C23/0075 , C03C2201/32 , C03C2201/40 , C03C2203/52 , G01N21/6402 , Y02P40/57
摘要： A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising: a step of washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm 2 or less, and so that a concentration of aluminium thereon is 10 ng/cm 2 or less, before accommodating the synthetic silica glass block in the mold; a step of heating high purity carbon powders in which a content of copper is 40 wt.ppb or less and a content of aluminium is 100 wt.ppb or less at a temperature condition of 1200°C to 1900°C; a step of heating the mold at a temperature condition of 1700°C to 1900°C; a step of applying the high purity carbon powders after the heating step on the inner surface of the mold after the heating step, before accommodating the synthetic silica glass block in the mold; and a step of molding the synthetic silica glass block in a predetermined form by pressing the block by means of the pressing portion while heating so as to the temperature of the block can be within a hold temperature range of 1500°C to 1700°C, after accommodating the washed synthetic silica glass block in the mold.

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