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1. 发明公开

EP3167261A1 HUMAN-MACHINE INTERFACE WITH GRAPHENE-PYROELECTRIC MATERIALS 有权
标题翻译：麻醉剂 - 麻醉剂 - 麻醉剂麻醉剂 - 青蒿素
公开(公告)号：EP3167261A1
公开(公告)日：2017-05-17
申请号：EP15819299.7
申请日：2015-07-07
申请人： National University of Singapore
发明人： ÖZYILMAZ, Barbaros , KULKARNI, Eeshan Sandeep , HEUSSLER, Sascha Pierre , CASTRO NETO, Antonio Helio , ANDERSEN, Henrik
IPC分类号： G01J5/02 , G01J5/10 , G06F3/01
CPC分类号： G06F3/041 , G01J5/0025 , G01J5/046 , G01J5/20 , G01J5/34 , G01J2005/345 , G06F3/01 , G06F3/03 , G06F3/0412 , G06F2203/04102 , G06F2203/04108 , H01L37/02 , H01L37/025
摘要： A version of the invention comprises a device for controlling or interfacing with a computer or other form of communicable machine based on the pyroelectric effect, and includes at least one optically- and infrared- (IR-) transparent graphene electrode.
摘要翻译：本发明的一个版本包括用于基于热电效应来控制或与计算机或其他形式的可通信机器接口的装置，并且包括至少一个光学和红外（IR））透明石墨烯电极。

2. 发明公开

EP2633368A1 LITHOGRAPHY METHOD AND APPARATUS 审中-公开
标题翻译：平版印刷方法和装置
公开(公告)号：EP2633368A1
公开(公告)日：2013-09-04
申请号：EP11836742.4
申请日：2011-10-25
申请人： National University of Singapore
发明人： HEUSSLER, Sascha Pierre , MOSER, Herbert O.
IPC分类号： G03F7/20
CPC分类号： G02B5/18 , G01J3/00 , G03F7/0002 , G03F7/0005 , G03F7/0017 , G03F7/0037 , G03F7/2014 , G03F7/203 , G03F7/213 , G03F7/70058 , G03F7/70416 , G03F7/70466
摘要： A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask 316 having an exposure pattern 332,334 for forming a three dimensional structure; (ii) exposing the first mask 316 to radiation to form the exposure pattern 332,334 on a radiation-sensitive resist 314; the exposure pattern 332,334 defined by irradiated areas 336 and non-irradiated areas 337 of the resist 314; (ii) providing a second mask 328; and (iii) during exposure, changing relative positions (arrows B and C) between the first mask 316 and the second mask 328 to shield selected portions of the irradiated areas 336 from radiation to enable varying depth profiles to be created in the three dimensional structure.

3. 发明公开

EP3117191A1 AN OPTICAL INTERFERENCE DEVICE 审中-公开
标题翻译： OPTISCHE INTERFERENZVORRICHTUNG
公开(公告)号：EP3117191A1
公开(公告)日：2017-01-18
申请号：EP15761993.3
申请日：2015-03-12
申请人： National University of Singapore
发明人： HEUSSLER, Sascha Pierre , MOSER, Herbert Oskar , PATHAK, Alok
IPC分类号： G01J3/45
CPC分类号： G01J3/4531 , G01J3/0205 , G01J3/0208 , G01J3/0229 , G01J3/0272
摘要： An optical interference device 100 is disclosed herein. In a described embodiment, the optical interference device 100 comprises a phase shifter array 108 for receiving a collimated beam of light. The phase shifter array 108 includes an array of cells 128 for producing optical light channels from respective rays of the collimated beam of light, with at least some of the optical light channels having varying phase shifts. The optical interference device 100 further includes a focusing lens 110 having a focal distance and arranged to simultaneously produce, from the optical light channels, a focused beam of light in its focal plane and an image downstream the phase shifter array 108 for detection by an optical detector 116. The optical interference device 100 also includes an optical spatial filter 112 arranged at the focal distance of the focusing lens 110 and arranged to filter the focused beam of light to produce a spatially distributed interference light pattern in zeroth order for detection by the optical detector 116. A method for producing a spatially distributed interference light pattern is also disclosed.
摘要翻译：本文公开了光学干涉装置100。在所描述的实施例中，光学干涉装置100包括用于接收准直光束的移相器阵列108。移相器阵列108包括用于从准直光束的相应光线产生光学光通道的单元阵列128，其中至少一些光学光通道具有不同的相移。光学干涉装置100还包括聚焦透镜110，该聚焦透镜110具有焦距并被布置成从光学光通道同时产生其焦平面上的聚焦光束，以及移相器阵列108下游的图像，用于通过光学光学干涉装置100还包括布置在聚焦透镜110的焦距处的光学空间滤光器112，并布置成滤光聚焦光束，以产生空间分布的干涉光图案，用于由光学器件检测还公开了一种用于产生空间分布的干涉光图案的方法。

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