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1. 发明公开

EP3300876A1 THREE DIMENSIONAL PRINTING APPARATUS AND THREE DIMENSIONAL PRINTING METHOD THEREOF 审中-公开
标题翻译：三维印刷设备及其三维印刷方法
公开(公告)号：EP3300876A1
公开(公告)日：2018-04-04
申请号：EP16198374.7
申请日：2016-11-11
申请人： XYZprinting, Inc. , Kinpo Electronics, Inc.
发明人： Pang, Bo
IPC分类号： B29C67/00 , G03F7/00 , G03F7/20
CPC分类号： B33Y10/00 , B29C64/124 , B29C64/135 , B29C64/20 , B29C64/241 , B29C64/386 , B33Y30/00 , B33Y50/02 , G03F7/0037 , G03F7/70416
摘要： A three dimensional printing apparatus including a tank containing a liquid forming material, a platform movably disposed in the tank to be immersed in or moved out of the liquid forming material, a curing device disposed next to the tank or the platform, and a controlling device electrically connected to the curing device and at least one of the tank and the platform is provided. An inner bottom of the tank has a first portion and a second portion in step manner, the first portion is higher than the second portion. The controlling device drives the tank and the platform to move relative to each other. A solidified layer is formed by curing the liquid forming material between the platform and the first portion and peeled off by rotating the tank relative to the platform. A three dimensional printing method is also disclosed.
摘要翻译：一种三维打印设备，包括：容纳液体形成材料的罐，可移动地设置在罐中以浸入或移出液体形成材料的平台，设置在罐或平台旁边的固化装置，以及控制装置电连接到固化装置，并且提供罐和平台中的至少一个。罐的内底部以阶梯方式具有第一部分和第二部分，第一部分高于第二部分。控制装置驱动罐和平台相对于彼此移动。通过在平台和第一部分之间固化液体形成材料形成固化层，并通过相对于平台旋转罐将其剥离。还公开了三维印刷方法。

2. 发明公开

EP3287263A1 VORRICHTUNG UND VERFAHREN ZUR LASERGESTÜTZTEN BEARBEITUNG VON KÖRPERN ODER OBERFLÄCHEN 审中-公开
标题翻译：用于激光加工机体或表面的装置和方法
公开(公告)号：EP3287263A1
公开(公告)日：2018-02-28
申请号：EP16185823.8
申请日：2016-08-26
申请人： MULTIPHOTON OPTICS GMBH
发明人： HOUBERTZ, Ruth , KRUPP, Alexander , STENDER, Benedikt
IPC分类号： B29C67/00 , B41C1/10 , G03F7/00 , G03F7/20
CPC分类号： B29C64/135 , B29C64/40 , B33Y10/00 , B33Y30/00 , G03F7/0037 , G03F7/2053 , G03F7/70416
摘要： Die Erfindung betrifft eine Vorrichtung zum lasergestützten Bearbeiten eines an einem Substrat anhaftenden Materials oder eines substratassoziierten oder substratfreien Körpers oder von dessen Oberfläche, insbesondere durch TPA/MPA und/oder durch Behandlung mit einem Ultrakurzpulslaser,
aufweisend
- ein Positioniersystem (9, 10, 11), das eine Probenaufnahme aufweist, wobei die Probenaufnahme so ausgebildet ist, dass sie das Substrat (7), an dem das zu bearbeitende Material haftet oder mit dem der zu bearbeitende Körper assoziiert ist, oder
- in Abwesenheit eines Substrats - den zu bearbeitenden Körper (7) halten kann,
- eine Laserquelle (1), die Laserpulse bzw. Laserpulsfolgen aussenden kann,
und
- eine Fokussieroptik (6), die die Laserpulse bzw. Laserpulsfolgen so formen kann, dass diese in einem Brennpunkt oder einem fokalen Volumen im Bereich des zu bearbeitenden Materials bzw. Körpers derart auftreffen, dass dort eine 2- oder Mehrphotonenpolymerisation stattfinden kann, oder dass diese in einem Brennpunkt oder in einem fokalen Volumen im Bereich des Körpers derart auftreffen, dass in diesem Brennpunkt oder fokalen Volumen befindliches Material den gewünschten chemischen und/oder physikalischen Veränderungen unterworfen wird .
Eine Vielzahl von Bearbeitungsverfahren ist unter Einsatz dieser Vorrichtung möglich.
摘要翻译：本发明涉及对被粘物的激光辅助的处理的装置，以在衬底材料或相关联的衬底或主体或者其表面的不含基底的，特别是通过TPA / MPA和/或通过用超短脉冲激光治疗，包括： - 定位系统（9，10，11）具有样品容器，其中所述样品接收器被配置为使得所述基板（7），其附着在要加工的材料或由所述加工体相关联，或 - 在不存在衬底的 - 主体要被处理（可容纳7）， - 一个激光源（1）能够发射激光脉冲或激光脉冲序列，以及 - 一个聚焦透镜（6），它可以塑造激光脉冲或激光脉冲串，以便它们中的一个焦点处或在范围内的聚焦体积被加工的材料或身体冲击，使得可发生2-或Mehhothotonenpolymerisation，或它们在一个焦点或在所述主体的所述区域中的聚焦体积撞击，使得该焦点或焦散装材料befindliches进行所需的化学和/或物理变化。使用此设备可能有多种处理方法。

3. 发明授权

EP2321702B1 EXPOSURE APPARATUS AND METHODS 有权
标题翻译：曝光装置及方法
公开(公告)号：EP2321702B1
公开(公告)日：2013-07-17
申请号：EP09785419.4
申请日：2009-07-30
申请人： UNIVERSITY OF DURHAM , University of Sheffield
发明人： IVEY, Peter, Anthony , McWILLIAM, Richard, Peter , PURVIS, Alan , WILLIAMS, Gavin, Lewis , SEED, Dr Nicholas, Luke , CURRY, Richard, Ian , TORIZ-GARCIA, Jose, Juan, De Jesus
IPC分类号： G03F7/20
CPC分类号： G03H1/08 , G03F7/70158 , G03F7/70291 , G03F7/703 , G03F7/70408 , G03F7/70416 , G03H1/0005 , G03H1/0443 , G03H1/22 , G03H1/2294 , G03H2001/0038 , G03H2001/005 , G03H2001/0088 , G03H2001/0094 , G03H2001/2215 , G03H2001/2221 , G03H2001/264 , G03H2225/32
摘要： An iterative algorithm for hologram design with multiple output image planes arranged in close proximity to create continuous patterns within an imaging volume is disclosed. These may then be used for photolithography on 3D surfaces, or for generation of holograms for use in consumer devices.

4. 发明公开

EP2321702A2 EXPOSURE APPARATUS AND METHODS 有权
标题翻译：曝光装置及方法
公开(公告)号：EP2321702A2
公开(公告)日：2011-05-18
申请号：EP09785419.4
申请日：2009-07-30
申请人： UNIVERSITY OF DURHAM , The University Of Sheffield
发明人： IVEY, Peter, Anthony , McWILLIAM, Richard, Peter , PURVIS, Alan , WILLIAMS, Gavin, Lewis , SEED, Dr Nicholas, Luke , CURRY, Richard, Ian , TORIZ-GARCIA, Jose, Juan, De Jesus
IPC分类号： G03F7/20
CPC分类号： G03H1/08 , G03F7/70158 , G03F7/70291 , G03F7/703 , G03F7/70408 , G03F7/70416 , G03H1/0005 , G03H1/0443 , G03H1/22 , G03H1/2294 , G03H2001/0038 , G03H2001/005 , G03H2001/0088 , G03H2001/0094 , G03H2001/2215 , G03H2001/2221 , G03H2001/264 , G03H2225/32
摘要： A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a projection lens assembly (14). The SLM (8) is programmed or CGH configured with a modulation pattern that is determined by the substrate (12) topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (18), which provides geometrical or topographical input to the CGH calculation routines (16). An arrangement for vertical or sloping surface patterning has a grating (22) superimposed onto the CGH pattern (24) to generate +1 and -1 orders. The SLM or CGH may be configured: using Fresnel patterns to provide an extended depth of field of the projected wave front; by encoding line segments of the desired pattern as cylindrical lines; by calculating inverse propagation between non-planar topography of the substrate and the SLM or CGH (using a Rayleigh-Sommerfield diffraction formula); and/or using iteration to determine a restricted encoding in the configuration of the SLM or CGH.

5. 发明公开

EP2235746A1 MICRODEVICE FABRICATION 审中-公开
标题翻译： HERSTELLUNG EINER MIKROVORRICHTUNG
公开(公告)号：EP2235746A1
公开(公告)日：2010-10-06
申请号：EP09700305.7
申请日：2009-01-02
申请人： Board of Regents, The University of Texas System
发明人： KAEHR, Bryan , NIELSON, Rex , SHEAR, Jason, B.
IPC分类号： H01L21/44
CPC分类号： G03F7/70416 , B29C64/129 , G03F7/70291 , G03F7/703 , G03F7/70375
摘要： According to certain embodiments, systems comprising an energy source; at least one conjugate mask; a magnification device; and a fabrication material; wherein the at least one conjugate mask is disposed between the energy source and the magnification device; and wherein the fabrication material is disposed operable to the magnification device. According to other embodiments, methods and composition employing such systems.
摘要翻译：根据某些实施例，包括能量源的系统; 至少一个共轭掩模; 放大装置; 和制造材料; 其中所述至少一个共轭掩模设置在所述能量源和所述放大装置之间; 并且其中所述制造材料设置为对所述放大装置可操作。根据其它实施例，采用这种系统的方法和组合。

6. 发明公开

EP1950613A2 Laser drawing method and apparatus 审中-公开
标题翻译：激光绘图方法和设备
公开(公告)号：EP1950613A2
公开(公告)日：2008-07-30
申请号：EP08001213.1
申请日：2008-01-23
申请人： Sony Corporation
发明人： Imanishi, Shingo
IPC分类号： G03F7/20 , B23K26/00 , G02B26/00 , H01L21/20
CPC分类号： G03F7/70416 , B23K26/0066 , B23K26/03 , B23K26/032 , B23K26/064 , B23K2201/36 , C21D1/09 , G03F7/70383
摘要： A method of laser drawing includes steps of causing laser light from a light source (2) to be incident to an acousto-optical diffraction element (4), and deflecting the light incident to the element (4) by changing a frequency of a high frequency signal to be inputted to the element (4) to diffract the light, thereby changing a diffraction angle of the diffracted light, and condensing the diffracted light emerging from the element (4) on an object (15) to be processed as an optical spot, thereby scanning the object (15) with the optical spot. A diffracted light intensity control table (11) for controlling a light intensity of the diffracted light so as to be constant independent of the diffraction angle of the diffracted light is prepared in advance, and in the deflecting step, the light intensity of the diffracted light is controlled based on the diffracted light intensity control table (11).

7. 发明授权

EP1217438B1 Stereolithography using different types of vector scanning 失效
标题翻译：使用不同类型的矢量扫描的立体光刻
公开(公告)号：EP1217438B1
公开(公告)日：2005-12-14
申请号：EP02075796.9
申请日：1989-04-17
申请人： 3D SYSTEMS, INC.
发明人： Hull, Charles William , Spence, Stuart Thomas , Albert, David J. , Smalley, Dennis Rollette , Harlow, Richard A. , Steinburgh, Philip , Tarnoff, Harry L. , Nguyen, Hop D. , Lewis, Charles William , Vorgitch, Tom J. , Remba, David Z.
IPC分类号： G03C9/08 , B29C67/00
CPC分类号： G06T17/20 , B29C64/135 , B29C64/40 , B29K2995/0073 , B33Y30/00 , B33Y50/02 , G01J1/4257 , G03F7/0037 , G03F7/70416 , G05B2219/49013 , G06T17/00 , G06T17/10

8. 发明公开

EP1486830A2 Device manufacturing method 审中-公开
标题翻译：伊斯法罕zur Herstellung eines Artikels
公开(公告)号：EP1486830A2
公开(公告)日：2004-12-15
申请号：EP04253499.0
申请日：2004-06-11
申请人： CANON KABUSHIKI KAISHA
发明人： Oguso, Makoto c/o Canon KK
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F1/50 , G03F7/0005 , G03F7/703 , G03F7/70416 , G03F7/70433
摘要： In an attempt to manufacture a diffraction optical element having a sharp shape, like a perpendicular sidewall, using an exposure apparatus, lowering of the resolving power by defocusing, etc. would deteriorate the perpendicular sidewall shape into a taper shape, and result in a large taper shape. Accordingly, the exposure apparatus arranges an imaging position of a projection optical system near the resist surface, and makes a pitch of dot patterns on a mask constant.
摘要翻译：为了制造具有尖锐形状的衍射光学元件，如垂直侧壁，使用曝光装置，通过散焦等降低分辨率将使垂直侧壁形状变差为锥形，并导致大的锥形。因此，曝光装置将投影光学系统的成像位置配置在抗蚀剂表面附近，并使掩模上的点图案的间距恒定。

9. 发明授权

EP0565664B1 STEREOGRAFIE-VORRICHTUNG UND -VERFAHREN 失效
标题翻译：立法会 - VORRICHTUNG外展
公开(公告)号：EP0565664B1
公开(公告)日：1998-08-05
申请号：EP92921487.2
申请日：1992-10-14
申请人： EOS GmbH ELECTRO OPTICAL SYSTEMS
发明人： LANGER, Hans, J. , OBERHOFER, Johann
IPC分类号： B29C67/00 , G03C9/08 , B29C35/08
CPC分类号： G03F7/70416 , B29C41/12 , B29C64/135 , B29K2995/0073 , B33Y40/00 , G03F7/0037
摘要： Prior art equipment for fabricating a three-dimensional object using stereography suffers from the problems that the thickness of the film formed by the originally liquid material cannot be adjusted rapidly and precisely before each hardening stage. To solve this problem, the invention proposes a wiper (15) which is moved across the surface (2) of the bath and whose lower edge, i.e. that closest to the surface of the bath, is designed so that, at least in places, it is flexible and can bend out to one side in the direction opposite to that (17) in which it is moving.
摘要翻译：公开了一种使用立体成型制造物体的装置。该装置在容器中具有液体材料浴，该浴具有自由表面。容器中的支撑件相对于表面支撑并定位物体。用于施加电磁辐射的装置固化具有该材料的固化部分的层。擦拭器沿着第一方向延伸穿过表面。擦拭器至少部分地由柔性材料形成并且具有基本上水平的下边缘，并且其在工作位置被定位在浴的自由表面的下方。位移装置在大致横向于第一方向的第二方向上使刮水器在工作位置移位，以移动液体材料在浴中的一部分。擦拭器的下边缘是柔性地产生的，以便当在第二方向上移动刮水器时，在凝固层的表面上和液体材料之间施加液体材料薄膜。

10. 发明授权

EP0535720B1 Method and apparatus for production of three-dimensional objects by stereolithography 失效
标题翻译：立体声摄影师Vorrichtung und Verfahren zur Herstellung von dreidimensionalenGegenständen
公开(公告)号：EP0535720B1
公开(公告)日：1998-04-22
申请号：EP92120977.1
申请日：1985-08-06
申请人： 3D SYSTEMS, INC. (a California corporation)
发明人： Hull, Charles W.
IPC分类号： B29C67/00
CPC分类号： G09B25/02 , B29C35/0866 , B29C64/124 , B29C64/135 , B29C2035/0827 , B29C2035/0833 , B29C2035/0844 , B29C2035/0877 , B33Y30/00 , G03F7/0037 , G03F7/70416 , G05B2219/49013 , G05B2219/49017 , G09B25/00

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