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1. 发明公开

EP2754640A4 METHOD FOR PRODUCING PURIFIED SILICIC ACID ALKALI AQUEOUS SOLUTION AND SILICA SOL 有权转让
标题翻译：用于生产水溶液纯化的二氧化硅和硅溶胶
公开(公告)号：EP2754640A4
公开(公告)日：2015-06-03
申请号：EP12829887
申请日：2012-09-05
申请人： NISSAN CHEMICAL IND LTD
发明人： EMA KIYOMI , TAKAKUMA NORIYUKI , NISHIMURA TOHRU , KAWASHITA NAOKI , YAMAGUCHI KOUJI
IPC分类号： C01B33/32 , B82Y30/00 , C01B33/143 , C01B33/148
CPC分类号： C01B33/1485 , B82Y30/00 , C01B33/1435 , C01P2004/64 , C09K3/1463
摘要： There is provided a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition (1): (1) the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 µm and a thickness of 1 to 100 nm is determined to be 0 to 30% in accordance with a measurement method A, the method for producing an alkali silicate aqueous solution characterized by comprising the steps of: adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass; and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 µm of 50% or more.
摘要翻译：提供了一种用于在碱性硅酸盐溶液生产含wässrige板状微粒的异物的量减少和用于生产的硅溶胶含板状微粒的异物的量减少的方法的方法。一种用于在碱性硅酸盐wässrige溶液制备满足下述条件：方法（1）：（1）具有0.2至4.0微米的一个边的长度，厚度为1〜100nm的板状微粒的存在量是确定性矿洞为0至30％在雅舞蹈与测量方法A，用于在碱性硅酸盐溶液wässrige通过包括以下步骤为特征的制造方法：以质量调节碱金属硅酸盐溶液wässrige〜0.5的二氧化硅浓度为10.0％; 并且通过具有颗粒具有50％或更多的1.0微米的初级颗粒尺寸a去除率的过滤器过滤的碱金属硅酸盐溶液wässrige。

2. 发明公开

EP2757070A4 METHODS FOR PRODUCING PURIFIED ACTIVE SILICIC ACID SOLUTION AND SILICA SOL 有权转让
标题翻译：制造方法纯化了的活性二氧化硅溶液和硅溶胶
公开(公告)号：EP2757070A4
公开(公告)日：2015-06-03
申请号：EP12831701
申请日：2012-09-14
申请人： NISSAN CHEMICAL IND LTD
发明人： EMA KIYOMI , TAKAKUMA NORIYUKI , NISHIMURA TOHRU , KAWASHITA NAOKI , YAMAGUCHI KOUJI
IPC分类号： C01B33/141 , C01B33/143 , C01B33/148 , C09K3/14 , C09K13/04
CPC分类号： C09K3/1463 , C01B33/1412 , C01B33/1435 , C01B33/1485 , C09K13/04
摘要： There is provided a method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. A method for producing an active silicic acid solution fulfilling the following condition: (1) the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 µm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method characterized by including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 µm is 50% or more.

3. 发明公开

EP1287088A4 POLISHING COMPOSITION 有权
标题翻译：蜡组合
公开(公告)号：EP1287088A4
公开(公告)日：2008-04-16
申请号：EP01926131
申请日：2001-05-07
申请人： NISSAN CHEMICAL IND LTD
发明人： OTA ISAO , NISHIMURA TOHRU , YAMADA GEN
IPC分类号： B24B37/00 , B82Y10/00 , B82Y99/00 , C09G1/02 , C09K3/14 , G11B5/84 , H01L21/304 , B24B57/02
CPC分类号： G11B5/8404 , B24B37/044 , C09G1/02 , C09K3/1409 , G11B5/84
摘要： ABSTRACT For aluminum disks and glass-made hard disks, those disks having a mean waviness of less than 3 Å are being desired in order to increase the density of memory capacity. The present invention provides polishing compositions that can give smoothly polished surfaces for the disks. The polishing compositions are polishing compositions for aluminum disks or substrates having silica on the surface thereof, which contain colloidal silica particle groups having different particle size distributions and have a SiO2 concentration of 0.5 to 50% by weight.

4. 发明公开

EP1201725A4 ABRASIVE COMPOUND FOR GLASS HARD DISK PLATTER 审中-公开
标题翻译：研磨剂硬质玻璃PLATTER
公开(公告)号：EP1201725A4
公开(公告)日：2007-09-12
申请号：EP00939161
申请日：2000-06-26
申请人： NISSAN CHEMICAL IND LTD
发明人： OTA ISAO , NISHIMURA TOHRU , TANIMOTO KENJI
IPC分类号： C09K3/14 , C01F17/00 , C03C19/00 , C09G1/02
CPC分类号： C09G1/02 , C01F17/0043 , C01P2002/72 , C01P2004/61 , C01P2006/12 , C03C19/00 , C09K3/1463
摘要： An abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 mu m and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, cerium accounts for 95 % or more in terms of oxides of the total amount of rare earth elements in the abrasive. The abrasive compound is suitable for polishing the surface of a glass substrate for an optical disk platter and a magnetic disk platter.

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