会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明公开
    • METHOD FOR PRODUCING PURIFIED ACTIVE SILICIC ACID SOLUTION AND SILICA SOL
    • 生产纯化活性硅酸溶液和硅溶胶的方法
    • EP3168191A1
    • 2017-05-17
    • EP16204020.8
    • 2012-09-14
    • Nissan Chemical Industries, Ltd.
    • Ema, KiyomiTakakuma, NoriyukiNishimura, TohruKawashita, NaokiYamaguchi, Kouji
    • C01B33/141C01B33/143C01B33/148C09K3/14C09K13/04
    • C09K3/1463C01B33/1412C01B33/1435C01B33/1485C09K13/04
    • There is provided a method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. A method for producing an active silicic acid solution fulfilling the following condition: (1) the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 µm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method characterized by including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 µm is 50% or more, and whose filtering rate is 13 L/min to 400 L/min per 1 m 2 of the filtration area of the used filter.
    • 本发明提供一种活性硅酸溶液的制造方法,该活性硅酸溶液中减少了作为板状微粒的异物的存在量,并且提供了减少这种异物的二氧化硅溶胶的制造方法。 满足以下条件的活性硅酸溶液的制造方法:(1)将一边的长度为0.2〜4.0μm,厚度为1〜100nm的板状微粒的存在量设为0 所述方法的特征在于包括以下步骤:通过将具有二氧化硅浓度为0.5质量%至10.0质量%的碱金属硅酸盐水溶液进行阳离子聚合来制备活性硅酸溶液, 交换去除碱性成分; 并且通过过滤器对活性硅酸溶液进行过滤,所述过滤器的一次粒径为1.0μm的颗粒的去除率为50%以上,过滤速度为13L / min〜400L / min / 的过滤器。
    • 9. 发明公开
    • SILICA PARTICLE MANUFACTURING PROCESS
    • 用于生产硅颗粒
    • EP2556021A4
    • 2015-12-09
    • EP11766615
    • 2011-04-06
    • NALCO CO
    • KEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARDSHOWALTER BRETT M
    • C01B33/18C01B33/141
    • C01B33/18C01B33/1415C01P2006/12C01P2006/14C01P2006/16
    • Methods of forming a silica-based products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (c) adjusting the pH of the solution to greater than 7; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 1c; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (d) adjusting the pH of the solution to greater than 7; (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 2d; (f) optionally filtering and drying the SCP; and (g) optionally reacting the dried product from step f with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.