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    • 6. 发明公开
    • Shape measuring method and shape measuring apparatus using white light interferometry
    • Verfahren und Vorrichtung zur Formmessung mittels Weisslichtinterferometrie
    • EP2420796A1
    • 2012-02-22
    • EP11177655.5
    • 2011-08-16
    • Mitutoyo Corporation
    • Goto, TomonoriMiyakura, JyotaAsano, HidemitsuSaeki, Takeshi
    • G01B9/02G01B11/24
    • G01B11/2441G01B9/02083G01B9/0209
    • A shape measuring method includes guiding light emitted from a broadband light source to an object to be measured and a reference surface, combining light reflected from the object to be measured with light reflected from the reference surface, and taking a distribution image of an interference light intensity corresponding to each measurement position of the object to be measured, while changing an optical path length difference between a first optical path length and a second optical path length over a whole scanning zone, sequentially storing distribution images of the interference light intensity in the whole scanning zone, and obtaining an interference light intensity string at each measurement position based on the stored distribution images of the interference light intensity, and obtaining a position in an optical axis direction at each measurement position of the object to be measured from a peak position of the interference light intensity string.
    • 一种形状测量方法,包括将从宽带光源发射的光引导到被测量物体和参考表面,将从被测量物体反射的光与从参考表面反射的光组合,并获取干涉光的分布图像 同时在整个扫描区域上改变第一光程长度与第二光程长度之间的光程长度差,并将整个干涉光强度的分布图像依次存储 扫描区域,并且基于所存储的干涉光强度的分布图像在每个测量位置处获得干涉光强度串,并且从待测对象的每个测量位置的光轴方向的位置 干涉光强度串。
    • 7. 发明公开
    • Shape measuring apparatus
    • 形状测量仪器
    • EP2416112A1
    • 2012-02-08
    • EP11176393.4
    • 2011-08-03
    • Mitutoyo Corporation
    • Toto, TomonoriMiyakura, Jyota
    • G01B9/02G01B11/24
    • G01B9/02083G01B9/0207G01B9/0209G01B11/2441
    • A shape measuring apparatus includes: an optical system configured to guide a light from a light source having a wideband spectrum to an object to be measured and a reference face; an imaging unit configured to image the interfering light intensity distribution image output from the optical system; an optical path length difference changing unit configured to change the optical path length difference; and an arithmetic processing unit configured to obtain the peak value of an interfering light intensity sequence indicating the change in the interfering light intensity due to the change in the optical path length difference at each measurement position of the interfering light intensity distribution images stored in the image storing unit, and configured to obtain the peak value as the position in the direction of the optical axis at each measurement position of the object to be measured.
    • 一种形状测量设备包括:光学系统,被配置为将来自具有宽带光谱的光源的光引导至待测量对象和参考面; 成像单元,被配置为对从光学系统输出的干涉光强度分布图像进行成像; 光程长度差改变单元,被配置为改变光程长度差; 以及算术处理单元,其被配置为获得干涉光强度序列的峰值,该干涉光强度序列指示由于在存储在图像中的干涉光强度分布图像的每个测量位置处的光程长度差的变化而导致的干涉光强度的变化 存储单元,并且被配置为获得峰值作为在待测量对象的每个测量位置处的光轴方向上的位置。
    • 8. 发明公开
    • White light interferometric microscope
    • Weisslicht Interferenzmikroskop
    • EP2369293A1
    • 2011-09-28
    • EP11157547.8
    • 2011-03-09
    • Mitutoyo Corporation
    • Nagahama, TatsuyaKubo, KojiAsano, HidemitsuMiyakura, Jyota
    • G01B9/02G01B11/24G02B21/00
    • G01B9/02068G01B9/02057G01B9/0209
    • A light-interference measuring apparatus including: a light source of a broad band light; an objective lens section to branch an optical path of the broad band light into a reference optical path including a reference mirror and a measuring optical path including a measuring object and to output a superposed wave of two branched lights; and an optical path length changing section to change an optical path length of either the reference optical path or the measuring optical path; wherein the objective lens section includes a phase difference control member to control a phase difference between the reference light and the object light to generate destructive interference fringes at a position of zero-path difference between the reference optical path and the measuring optical path, and a minimum luminance position detecting section to detect minimum luminance position of the destructive interference fringes.
    • 1.一种光干涉测量装置,包括:宽带光的光源; 物镜部分,用于将宽带光的光路分支成包括参考反射镜的参考光路和包括测量对象的测量光路,并输出两个分支光的叠加波; 以及光路长度变更部,其改变基准光路或测量光路的光路长度; 其中所述物镜部分包括相位差控制部件,用于控制所述参考光与所述物体光之间的相位差,以在所述参考光路和所述测量光路之间的零路径差的位置处产生相消干涉条纹,以及 最小亮度位置检测部分,用于检测破坏性干涉条纹的最小亮度位置。
    • 9. 发明公开
    • Method and apparatus for hardness tester
    • Verfahren und VorrichtungfürHärteprüfer
    • EP2784475A1
    • 2014-10-01
    • EP14157157.0
    • 2014-02-28
    • Mitutoyo Corporation
    • Miyakura, Jyota
    • G01N3/42G01N3/06G06K9/62
    • G06T7/001G01N3/068G01N3/42G01N2203/0019G01N2203/008G01N2203/0647G06K9/3208G06K9/6203
    • A hardness tester has an indentation former forming an indentation by pressing an indenter against a surface of a sample; an image capture controller controlling a CCD camera to capture an image of the surface of the sample and obtain image data; an indentation area extractor extracting an indentation area based on the obtained image data; and a hardness calculator calculating hardness of the sample based on the extracted indentation area. The indentation area extractor has a reduced image generator reducing the image obtained from the image data of the surface of the sample at a scale ratio selected from a plurality of predetermined scale ratios and generating a reduced image; and a pattern matcher performing pattern matching with respect to the generated reduced image and extracting the indentation area.
    • 硬度计具有通过将压头压靠在样品表面上而形成压痕的压痕形成体; 控制CCD摄像机的图像捕获控制器,以捕获样品表面的图像并获得图像数据; 基于所获得的图像数据提取压痕区域的压痕区域提取器; 以及硬度计算器,基于提取的压痕区域计算样品的硬度。 压痕区域提取器具有缩小图像生成器,以从多个预定比例比选择的比例缩小从所述样本表面的图像数据获得的图像并生成缩小图像; 以及对所生成的缩小图像执行图案匹配并提取所述缩进区域的图案匹配器。