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1. 发明公开

EP0903707A3 In-bed state detection system 有权
标题翻译：在床状态检测系统
公开(公告)号：EP0903707A3
公开(公告)日：1999-08-25
申请号：EP98117439.4
申请日：1998-09-15
申请人： Matsushita Electric Industrial Co., Ltd.
发明人： Yoshiike, Nobuyuki , Inoue, Shigeyuki , Hashimoto, Kazuhiko
IPC分类号： G08B21/00
CPC分类号： G08B21/22
摘要： An in-bed state detection system includes: a load detection section for detecting a load applied to a bed and providing a corresponding load signal; a determination section for determining an in-bed state based on the load signal; and a transmission section for transmitting a result of the determination.
摘要翻译：床内状态检测系统包括：负载检测部分，用于检测施加于床的负载并提供相应的负载信号; 确定部分，用于基于负载信号确定床内状态; 以及发送部分，用于发送确定的结果。

2. 发明授权

EP0348961B1 Fine pattern forming material and pattern forming method 失效
标题翻译：生产微细结构的方法和设备。
公开(公告)号：EP0348961B1
公开(公告)日：1994-01-26
申请号：EP89111823.4
申请日：1989-06-29
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Hashimoto, Kazuhiko , Koizumi, Taichi , Kawakita, Kenji , Nomura, Noboru
IPC分类号： G03F7/038 , G03F7/039
CPC分类号： B82Y30/00 , B82Y10/00 , C08G61/126 , C08G2261/1412 , C08G2261/3223 , C08L65/00 , G03F7/038 , G03F7/039

3. 发明公开

EP0348961A3 Fine pattern forming material and pattern forming method 失效
标题翻译：精细图案形成材料和图案形成方法
公开(公告)号：EP0348961A3
公开(公告)日：1991-07-17
申请号：EP89111823.4
申请日：1989-06-29
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Hashimoto, Kazuhiko , Koizumi, Taichi , Kawakita, Kenji , Nomura, Noboru
IPC分类号： G03F7/038 , G03F7/039
CPC分类号： B82Y30/00 , B82Y10/00 , C08G61/126 , C08G2261/1412 , C08G2261/3223 , C08L65/00 , G03F7/038 , G03F7/039
摘要： Herein is provided a fine pattern forming method which is prevented from the charging-up phenomenon at the time of electric charged beam writing owing to the use of a polyalkylthiophene type conductive polymeric substance or a quaternary ammonium ion type polymeric substance in a monolayer or multilayer resist.

4. 发明公开

EP0392236A1 Process for forming a fine pattern 失效
标题翻译： Verfahren zur Herstellung einer feinen Struktur。
公开(公告)号：EP0392236A1
公开(公告)日：1990-10-17
申请号：EP90105610.1
申请日：1990-03-24
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Hashimoto, Kazuhiko , Kawakita, Kenji , Nomura, Noboru
IPC分类号： G03F7/075
CPC分类号： G03F7/0754 , Y10S430/168
摘要： A process for forming a fine pattern comprising the steps of forming an organic polymer film on a semiconductor substrate followed by heat treatment, applying a resist film consisting of a cyclocarbosilane represented by the general formula (I):
where R₁, R₂, R₃ and R₄ are each hydrogen or an alkyl group,
a polymer resin, and a photo acid generator, on the organic polymer film followed by heat treatment, exposing to an electric charged beam, forming a resist pattern by developing, and etching the organic polymer film while using the resist pattern as a mask. According to the present invention, a dry etching resistant precise fine resist pattern can be formed with high sensitivity.
摘要翻译：一种用于形成精细图案的方法，包括以下步骤：在半导体衬底上形成有机聚合物膜，然后进行热处理，施加由通式（I）表示的环硅烷硅烷组成的抗蚀剂膜：其中R1，R2， R3和R4各自为氢或烷基，聚合物树脂和光酸产生剂，在有机聚合物膜上进行热处理，暴露于带电束，通过显影形成抗蚀剂图案，并蚀刻有机聚合物同时使用抗蚀剂图案作为掩模。根据本发明，可以高灵敏度地形成耐干蚀刻精确的精细抗蚀剂图案。

5. 发明授权

EP1026521B1 Method and apparatus for detecting an object 失效
标题翻译：用于检测物体的方法和装置
公开(公告)号：EP1026521B1
公开(公告)日：2004-09-29
申请号：EP99125247.9
申请日：1996-04-11
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Morinaka, Katsuya , Yoshiike, Nobuyuki , Hashimoto, Kazuhiko , Kawai, Tetsuya
IPC分类号： G01S17/02 , G01S17/10 , G01S7/48 , H04N5/33 , H04H9/00 , G01S17/87 , H04N3/09
CPC分类号： G01S7/497 , G01S7/4813 , G01S7/483 , G01S15/42 , G01S15/88 , G01S17/023 , G01S17/10 , G01S17/88 , G06K9/00362 , G08B13/19 , G08B13/191 , G08B29/26 , H04N5/33

6. 发明公开

EP1199027A3 System, apparatus, and method for acquiring state information, and attachable terminal apparatus 审中-公开
标题翻译：系统，装置和用于获取状态信息的方法，并且被紧固到主体终端设备
公开(公告)号：EP1199027A3
公开(公告)日：2002-05-15
申请号：EP01124780.6
申请日：2001-10-17
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Hashimoto, Kazuhiko , Tanaka, Shinji , Inoue, Shigeyuki , Yoshiike, Nobuyuki
IPC分类号： A61B5/00
CPC分类号： A61B5/1113 , A61B5/0022 , A61B5/11 , A61B5/1116 , A61B5/1128 , A61B5/117 , A61B5/6823 , A61B5/6889 , G06F19/00 , G16H40/67 , Y10S128/903
摘要： A state information acquisition system has a terminal (6) which has physiological state detecting means (19) of detecting the physiological state of a person or animal, posture/action detecting means (2) of detecting the posture and/or action state of the person or animal, and detection signal transmitting means (20) of transmitting detection signals based on the detection of firstly the physiological state and secondly the posture and/or action state, and is attachable to the person or animal; and signal receiving (21) and processing means (5) which receives and processes a signal transmitted from the terminal (6) and is located in a predetermined region; and thereby obtaining state information indicating the state of the person or animal on the basis of the detection signal.

7. 发明公开

EP1026521A2 Method and apparatus for detecting an object 失效
标题翻译：用于检测物体的方法和设备
公开(公告)号：EP1026521A2
公开(公告)日：2000-08-09
申请号：EP99125247.9
申请日：1996-04-11
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Morinaka, Katsuya , Yoshiike, Nobuyuki , Hashimoto, Kazuhiko , Kawai, Tetsuya
IPC分类号： G01S17/02 , G01S17/10 , G01S17/87 , G01S7/48
CPC分类号： G01S7/497 , G01S7/4813 , G01S7/483 , G01S15/42 , G01S15/88 , G01S17/023 , G01S17/10 , G01S17/88 , G06K9/00362 , G08B13/19 , G08B13/191 , G08B29/26 , H04N5/33
摘要： A thermal object detecting method for ; obtaining a thermal image of a measuring space by two-dimensional thermal image detecting method for detecting two-dimensional thermal image information, obtaining position information of an object in the measuring space by object position detecting device, obtaining distance data between said two-dimensional thermal image detecting device and said object from the position information, and correcting the temperature level of the object in the thermal image in the measuring space or correcting the size of the object in the thermal image in said measuring space, using the distance data from the object as correction factor.
摘要翻译：一种热物体检测方法，通过用于检测二维热图像信息的二维热图像检测方法获得测量空间的热图像，通过物体位置检测装置获得测量空间中的物体的位置信息，获得所述二维热量图像检测装置和所述物体的位置信息，并且利用来自物体的距离数据来校正测量空间中的热图像中的物体的温度水平或者校正所述测量空间中的热图像中的物体的尺寸作为修正因子。

8. 发明公开

EP0828233A3 Apparatus for detecting the number of passers 失效
标题翻译： Gerätzum Feststellen der Zahl der Passanten
公开(公告)号：EP0828233A3
公开(公告)日：1999-12-29
申请号：EP97115169.1
申请日：1997-09-02
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Hashimoto, Kazuhiko , Yoshiike, Nobuyuki , Morinaka, Katsuya
IPC分类号： G07C9/00
CPC分类号： G06K9/00778 , G06K9/2018 , G07C9/00
摘要： A plurality of rows (13A, 13B)of sensors in each of which a plurality of distance variation measuring sensors (12) comprising a light emitter (15) and a light receiver (16) are arranged in the orthogonal direction to the direction in which human bodies (8) pass are provided on a ceiling (5). The number of passers is detected on the basis of the number of the sensors for measuring variation in distance which have detected a human body. The traveling direction of human bodies is detected on the basis of the change in the distance to the human bodies measured by the sensors for measuring variation in distance.
摘要翻译：传感器的多列（13A，13B）中的每一个包括发光体（15）和光接收器（16）的多个距离变化测量传感器（12）被布置在与在天花板（5）上设置人体（8）通行证。基于用于测量检测到人体的距离变化的传感器的数量来检测路人的数量。根据用于测量距离变化的传感器测量的与人体距离的变化来检测人体行进方向。

9. 发明授权

EP0682330B1 Detecting apparatus and measuring method of warm object 失效
标题翻译：用于测量的热物体检测装置和方法
公开(公告)号：EP0682330B1
公开(公告)日：1999-11-03
申请号：EP95106915.2
申请日：1995-05-08
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Yoshiike, Nobuyuki , Hashimoto, Kazuhiko , Morinaka, Katsuya
IPC分类号： G08B13/16
CPC分类号： G01S15/04 , G01S15/025 , G08B13/1645 , Y10S250/01

10. 发明公开

EP0390038A3 Fine Pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：EP0390038A3
公开(公告)日：1991-11-06
申请号：EP90105722.4
申请日：1990-03-26
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Hashimoto, Kazuhiko , Koizumi, Taichi , Kawakita, Kenji , Nomura, Noboru
IPC分类号： G03F7/039 , G03F7/26 , H01L21/312 , H05K3/02 , C08G75/14 , C08G75/23
CPC分类号： G03F7/039 , G03F7/094
摘要： The present invention provides a method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one substance selected from the group consisting of a polyphenylene sulfide, a derivative thereof, and a polymer represented by the formula (I):
, where n is a positive integer, for forming at least one of the organic polymer film and the electron beam resist film. According to the present invention, it is possible to prevent charging by incident electrons, thereby keeping free of field butting and reduction of overlay accuracy, and to form an accurate and vertical fine resist pattern.

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