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1. 发明授权

EP1236972B1 Method and apparatus for calibrating measuring machines 有权
标题翻译：用于校准测量机器的方法和设备
公开(公告)号：EP1236972B1
公开(公告)日：2017-05-10
申请号：EP02251467.3
申请日：2002-03-01
申请人： Mitutoyo Corporation
发明人： Abbe, Makoto
IPC分类号： G01B21/04
CPC分类号： B25J9/1692 , G01B21/042

2. 发明公开

EP1857772A1 Method for estimating absolute distance of tracking laser interferometer and tracking laser interferometer 有权
标题翻译：一种用于从selbstnachführendem激光干涉仪和激光干涉仪selbstnachführendes估计的绝对距离的方法
公开(公告)号：EP1857772A1
公开(公告)日：2007-11-21
申请号：EP07009632.6
申请日：2007-05-14
申请人： MITUTOYO CORPORATION
发明人： Hara, Shinichi , Taketomi, Naoyuki , Abbe, Makoto
IPC分类号： G01B9/02
CPC分类号： G01S17/74 , G01S17/42 , G01S17/66
摘要： To provide a method for estimating an absolute distance L between a tracking laser interferometer and a retroreflector 70, the tracking laser interferometer including; the retroreflector 70 for reflecting and returning incident measurement light A in an incident direction; and a two-axis rotating mechanism 40 for rotationally moving in an exit direction of the measurement light A so that optical axes of the measurement light A and return light B are collimated, which outputs a measurement value according to an increase or decrease in the distance between the interferometer and the retroreflector 70, wherein the absolute distance L between the interferometer and the retroreflector 70 is estimated by performing arithmetic operation based on an angular position variation θ 2 of the two-axis rotating mechanism 40 when a deviation amount d of the return light B from the retroreflector 70 relative to a predetermined position is given as a predetermined value d 2 . This enables an appropriate increase or decrease of the control amount of a tracking control according to a distance between the interferometer and the retroreflector without forcing an operator to perform a troublesome origin return operation and adding an expensive absolute distance sensor.
摘要翻译：一种用于跟踪激光干涉仪和后向反射器70，跟踪激光干涉仪包括估计之间的绝对距离L提供的方法; 用于反射和在入射方向在返回入射测量光甲后向反射器70; 和两轴旋转机构40旋转移动到离开测量光A的方向上所做的测量光A的光轴和返回光B被准直，这在距离输出测量值雅丁到增加或减少干涉仪和后向反射器70，worin干涉仪和所述后向反射器70之间的绝对距离L之间通过在角位置变化基于执行算术运算估计¸2的两轴旋转机构40的当返回的偏差量d 从后向反射器70相对于预定位置B的光被给定为一定值D第二这使得能够增加或减小的跟踪控制gemäß到干涉仪和后向反射器之间的距离的量的适当的控制，而不强迫操作者进行繁琐的原点返回操作和添加试验绝对距离传感器。

3. 发明公开

EP1995554A2 Two-dimensional lattice calibrating device, two-dimensional lattice calibrating method, two-dimensional lattice calibrating program and recording medium 审中-公开
标题翻译：的装置，方法和程序用于二维网格橡树和记录装置
公开(公告)号：EP1995554A2
公开(公告)日：2008-11-26
申请号：EP08156718.2
申请日：2008-05-22
申请人： Mitutoyo Corporation
发明人： Nara, Masayuki , Abbe, Makoto
IPC分类号： G01B21/04
CPC分类号： G01B21/042
摘要： A two-dimensional lattice calibrating device includes: a measuring unit (2) that measures respective positions of marks (1a) for each of a plurality of measurement dispositions (n); a simultaneous-equations generating unit (5) that generates simultaneous equations for acquiring deviations (Di) of the plurality of marks (1a) using a coordinate relational equation and a least-squares conditional equation that sets least-squares lines that minimize the deviation (Di) of actual position (Li) of the marks (1a) based on measurement values (mni) as coordinate axes of artifact coordinates; and a simultaneous-equations calculating unit that solves the derived simultaneous equations.
摘要翻译：二维晶格校准装置包括：测量单元（2）措施并为每个测量倾向性的多个（n个）的标记（1a）的位置respectivement; 同时，方程产生单元（5）那样生成率的联立方程对使用坐标关系式获取的偏差（DI）的标记的多元性（1a）的和最小二乘条件式那样集的最小二乘线做最小化的偏差（根据测量值（MNI）实际位置的二）的标记的（Li）的（1A）作为坐标工件坐标的轴; 和同时-方程计算单元确实解决了导出的联立方程。

4. 发明授权

EP1515115B1 Form measuring device, form measuring method, form analysis device, form analysis program, and recording medium storing the program 有权
标题翻译：装置和方法用于测量和分析对象物的形状，以及对应的节目
公开(公告)号：EP1515115B1
公开(公告)日：2007-03-21
申请号：EP04255445.1
申请日：2004-09-08
申请人： MITUTOYO CORPORATION
发明人： Nara, Masayuki , Abbe, Makoto
IPC分类号： G01B21/20 , G01B21/22
CPC分类号： G01B21/08 , G06T7/564

5. 发明公开

EP1959226A3 Optical axis polarization type laser interferometer 审中-公开
标题翻译：激光干涉仪与光轴偏振
公开(公告)号：EP1959226A3
公开(公告)日：2012-12-05
申请号：EP08002673.5
申请日：2008-02-13
申请人： Mitutoyo Corporation
发明人： Taketomi, Naoyuki , Abbe, Makoto
IPC分类号： G01S7/481 , G01S17/66
CPC分类号： G01S7/4811 , G01S17/42 , G01S17/66 , G01S17/74
摘要： An optical axis polarization type laser interferometer including a reference sphere (34) which forms a reference of measurement, a retro-reflecting means (12) disposed at a measurement object, a laser interference measuring apparatus for outputting a measurement value corresponding to an increase or a decrease in the distance to and from the retro-reflecting means; and a two-axis turning mechanism (30) for turning an emission beam of the corresponding laser interference measuring apparatus centering around the reference sphere, which measures, with the center coordinates of the reference sphere used as the reference, the distance to and from the retro-reflecting means where the optical axes of the emission beam from the laser interference measuring apparatus mounted on the two-axis turning mechanism and a return beam become parallel to each other, wherein the fixing portion of the first axis turning mechanism installed at the base part of the apparatus is disposed at the inner circumference thereof, the reference sphere is placed at the fixing portion thereof (40), and at the same time, the moving portion of the first axis turning mechanism is placed at the outer circumference of the fixing portion, and the second axis turning mechanism is mounted on the moving portion thereof. Therefore, complexities in mechanism design can be simplified to a large extent with respect to the first axis turning mechanism that composes the two-axis turning mechanism.

6. 发明公开

EP1260789A3 Method of calibrating measuring machines 有权
标题翻译：用于测量机器的校准方法
公开(公告)号：EP1260789A3
公开(公告)日：2003-01-15
申请号：EP02018148.3
申请日：2002-03-01
申请人： Mitutoyo Corporation
发明人： Abbe, Makoto
IPC分类号： G01B21/04
CPC分类号： B25J9/1692 , G01B21/042
摘要： A reference device having a sphere positioned within a measurement space by an object three-dimensional measuring machine having a spherical probe contacting the spherical probe with six or more measurement points uniformly distributed on the spherical surface of the sphere to measure central coordinates of the sphere of the reference device by the object three-dimensional measuring machine and calibrating the object three-dimensional measuring machine based on the central coordinates obtained.

7. 发明公开

EP1236972A2 Method and apparatus for calibrating measuring machines 有权
标题翻译： Verfahren und Vorrichtung zur Eichung von Messmaschinen
公开(公告)号：EP1236972A2
公开(公告)日：2002-09-04
申请号：EP02251467.3
申请日：2002-03-01
申请人： Mitutoyo Corporation
发明人： Abbe, Makoto
IPC分类号： G01B21/04
CPC分类号： B25J9/1692 , G01B21/042
摘要： A reference measuring machine (10) previously calibrated and an object measuring machine (20) to be calibrated are positioned in such a manner that a measurement space by the reference measuring machine is superimposed on a measurement space by the object measuring machine. First measurement values by the reference measuring machine and second measurement values by the object measuring machine are acquired each on plural points in the measurement spaces respectively by the reference measuring machine and the object measuring machine. The object measuring machine can be calibrated based on the first and second measurement values. The object measuring machine (20) includes a first guide mechanism consisting of a first guide (23) and a first slider (25) located on the basis of a first base plate for mounting a work thereon. The reference measuring machine (10) includes a second guide mechanism consisting of a second guide (13) and a second slider (15) located on the basis of a second base plate for mounting the object measuring machine thereon. A reference device is located on one of the first and second sliders. On detection of the reference device by the sensor located on the other of the first and second sliders, the computing means takes the first and second measurement values to calibrate the object measuring machine based on the first and second measurement values.
摘要翻译：预先校准的参考测量机（10）和要校准的物体测量机（20）以这样的方式定位，使得由对象测量机将测量空间的测量空间叠加在测量空间上。通过基准测量机和物体测量机分别在测量空间中的多个点上获取由对象测量机的参考测量机的第一测量值和第二测量值。物体测量机可以根据第一和第二测量值进行校准。物体测量机（20）包括第一引导机构，该第一引导机构由第一引导件（23）和第一滑块（25）构成，该第一滑块位于用于在其上安装工件的第一基板。参考测量机（10）包括第二引导机构，该第二引导机构由位于第二基板上的第二引导件（13）和第二滑块（15）组成，用于在其上安装对象测量机。参考装置位于第一和第二滑块中的一个上。在通过位于第一和第二滑块中另一个上的传感器检测参考装置的情况下，计算装置根据第一测量值和第二测量值取第一测量值和第二测量值校准物体测量机。

8. 发明授权

EP1857772B1 Method for estimating absolute distance of tracking laser interferometer and tracking laser interferometer 有权
标题翻译：一种用于从selbstnachführendem激光干涉仪和激光干涉仪selbstnachführendes估计的绝对距离的方法
公开(公告)号：EP1857772B1
公开(公告)日：2013-10-09
申请号：EP07009632.6
申请日：2007-05-14
申请人： Mitutoyo Corporation
发明人： Hara, Shinichi , Taketomi, Naoyuki , Abbe, Makoto
IPC分类号： G01B9/02 , G01S17/42 , G01S17/66 , G01S17/74
CPC分类号： G01S17/74 , G01S17/42 , G01S17/66

9. 发明公开

EP1995554A3 Two-dimensional lattice calibrating device, two-dimensional lattice calibrating method, two-dimensional lattice calibrating program and recording medium 审中-公开
标题翻译：的装置，方法和程序用于二维网格橡树和记录装置
公开(公告)号：EP1995554A3
公开(公告)日：2009-11-18
申请号：EP08156718.2
申请日：2008-05-22
申请人： Mitutoyo Corporation
发明人： Nara, Masayuki , Abbe, Makoto
IPC分类号： G01B21/04
CPC分类号： G01B21/042
摘要： A two-dimensional lattice calibrating device includes: a measuring unit (2) that measures respective positions of marks (1a) for each of a plurality of measurement dispositions (n); a simultaneous-equations generating unit (5) that generates simultaneous equations for acquiring deviations (Di) of the plurality of marks (1a) using a coordinate relational equation and a least-squares conditional equation that sets least-squares lines that minimize the deviation (Di) of actual position (Li) of the marks (1a) based on measurement values (mni) as coordinate axes of artifact coordinates; and a simultaneous-equations calculating unit that solves the derived simultaneous equations.

10. 发明公开

EP1959226A2 Optical axis polarization type laser interferometer 审中-公开
标题翻译：激光干涉仪电感激光器Achsenpolarisierung
公开(公告)号：EP1959226A2
公开(公告)日：2008-08-20
申请号：EP08002673.5
申请日：2008-02-13
申请人： Mitutoyo Corporation
发明人： Taketomi, Naoyuki , Abbe, Makoto
IPC分类号： G01B9/02
CPC分类号： G01S7/4811 , G01S17/42 , G01S17/66 , G01S17/74
摘要： An optical axis polarization type laser interferometer including a reference sphere (34) which forms a reference of measurement, a retro-reflecting means (12) disposed at a measurement object, a laser interference measuring apparatus for outputting a measurement value corresponding to an increase or a decrease in the distance to and from the retro-reflecting means; and a two-axis turning mechanism (30) for turning an emission beam of the corresponding laser interference measuring apparatus centering around the reference sphere, which measures, with the center coordinates of the reference sphere used as the reference, the distance to and from the retro-reflecting means where the optical axes of the emission beam from the laser interference measuring apparatus mounted on the two-axis turning mechanism and a return beam become parallel to each other, wherein the fixing portion of the first axis turning mechanism installed at the base part of the apparatus is disposed at the inner circumference thereof, the reference sphere is placed at the fixing portion thereof (40), and at the same time, the moving portion of the first axis turning mechanism is placed at the outer circumference of the fixing portion, and the second axis turning mechanism is mounted on the moving portion thereof. Therefore, complexities in mechanism design can be simplified to a large extent with respect to the first axis turning mechanism that composes the two-axis turning mechanism.
摘要翻译：一种光轴偏振型激光干涉仪，包括形成测量基准的参考球（34），设置在测量对象处的回射装置（12），激光干涉测量装置，用于输出与增加相对应的测量值，与回射装置的距离减小; 以及用于以相对于作为基准的基准球的中心坐标为基准的以参考球为中心的相应的激光干涉测量装置的发射光束进行转动的两轴转动机构（30）反射装置，其中安装在双轴转动机构上的激光干涉测量装置的发射光束的光轴和返回光束彼此平行，其中第一轴转动机构的固定部分安装在基座设备的一部分设置在其内周，参考球放置在其固定部分（40）处，同时第一轴转动机构的移动部分位于固定的外周第二轴转动机构安装在其移动部分上。因此，相对于构成双轴转动机构的第一轴转动机构，能够在很大程度上简化机构设计的复杂性。

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