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    • 1. 发明公开
    • Apparatus and process for growing crystals of semiconductor materials
    • Vorrichtung und Verfahren zurZüchtungvon Kristallen aus Halbleitermaterialien。
    • EP0293865A1
    • 1988-12-07
    • EP88108790.2
    • 1988-06-01
    • MITSUBISHI MATERIALS CORPORATION
    • Kida, MichioArai, YoshiakiSahira, Kensho
    • C30B15/12
    • C30B15/12Y10S117/90Y10T117/1052Y10T117/1056Y10T117/1068
    • An apparatus for melting a semiconductor material and growing a semiconductor crystal from the melted material includes a suspector (12) having a peripheral rim, a quartz crucible assembly (14) for receiving the semiconductor material therein. The crucible assembly (14) includes an outer crucible (16) housed in and supported by the suspector (12) and an inner crucible (18) adapted to be so placed within the outer crucible (16) as to define a multi-wall structure. The apparatus also includes at least one fluid passage (18a) for permitting the melted material to flow between the inner (18) and outer crucibles (16) when the multi-wall structure is defined by the inner (18) and outer crucibles (16), a holder for holding the inner crucible (18), a heater (21) disposed so as to surround the suspector (12) for heating the material in the crucible (14) assembly, and a drive mechanism (30) operable to move at least one of the holder and the suspector (12) vertically between a coupled position where the holder is supported by the suspector (12) in such a manner that the inner crucible (18) is so placed within the outer crucible (16) as to define the multi-wall structure and a released position where the holder is disengaged from the suspector (12) in such a manner that the inner crucible is released from the outer crucible (16).
      There is also provided a process which may be conveniently carried out in the apparatus described above.
    • 用于熔化半导体材料并从熔融材料生长半导体晶体的装置包括具有外围边缘的悬臂(12),用于在其中容纳半导体材料的石英坩埚组件(14)。 所述坩埚组件(14)包括容纳在所述悬挂器(12)中并由所述悬挂器(12)支撑的外坩埚(16),以及内坩埚(18),其适于放置在所述外坩埚(16)内,以限定多壁结构 。 该装置还包括至少一个流体通道(18a),用于当多壁结构由内部(18)和外部坩埚(16)限定时允许熔化的材料在内部(18)和外部坩埚(16)之间流动 ),用于保持内坩埚(18)的保持器,设置成围绕用于加热坩埚(14)组件中的材料的悬架(12)的加热器(21),以及驱动机构(30),其可操作以移动 所述保持器和所述悬挂器(12)中的至少一个在所述保持器由所述悬架(12)支撑的联接位置之间垂直地以使得所述内坩埚(18)被放置在所述外坩埚(16)内的方式中至少一个为 以限定多壁结构和释放位置,其中保持器以使内坩埚从外坩埚(16)释放的方式与悬臂(12)脱离接合。 还提供了可以在上述装置中方便地进行的方法。
    • 3. 发明公开
    • Method for pulling single crystals
    • Verfahren zum Ziehen von Einkristallen。
    • EP0388503A1
    • 1990-09-26
    • EP89108388.3
    • 1989-05-10
    • MITSUBISHI MATERIALS CORPORATION
    • Ono, NaokiKida, MichioArai, YoshiakiSahira, Kensho
    • C30B15/04C30B29/06
    • C30B15/04C30B15/12Y10T117/1052
    • In a method for pulling a single crystal, employing a double crucible assembly (6), the dopent concentration of the molten raw material in an inner crucible (11) prior to the pulling, is raised to a value higher than the dopant concentration C of the molten raw material in the inner crucible (11) at the steady state. Furthermore, at the initial stage of the pulling, the raw material having a dopant content ration of no greater than kC is introduced into the outer crucible (10) at a rate greater than the rate of decrease of the molten raw material within the inner crucible (11) during the pulling, to achieve a concentration ratio of dopant between the inner and outer crucibles (11, 10) at a target value. Subsequently, the raw material having kC as the dopant content ratio is introduced into the outer crucible (10), at a rate equal to the rate of decrease of the motlen raw material during the pulling.
    • 在采用双坩埚组件(6)的拉制单晶的方法中,在拉动之前,在内坩埚(11)中的熔融原料的掺杂浓度升高到高于掺杂剂浓度C的值 处于稳定状态的内坩埚(11)中的熔融原料。 此外,在拉拔的初始阶段,将具有不大于kC的掺杂剂含量比例的原料以比内坩埚内的熔融原料的降低率更高的速率引入外坩埚(10) (11),以达到目标值的内外坩埚(11,10)之间的掺杂剂的浓度比。 随后,将具有作为掺杂剂含量比的kC的原料以与牵引期间的原始原料的减少速率相同的速率被引入外坩埚(10)。