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    • 4. 发明公开
    • Apparatus for Producing Laminated Body
    • Vorrichtung und Verfahren zur Herstellung eines laminiertenKörpers
    • EP2503024A1
    • 2012-09-26
    • EP12160451.6
    • 2012-03-20
    • Kojima Press Industry Co., Ltd.
    • Hayakawa, MunetakaIto, KaoruTakahashi, Yasuhiko
    • C23C16/54C23C16/04
    • C23C16/545B05D1/60B05D7/04B05D7/50B05D2252/02C23C14/562C23C16/042
    • An apparatus is provided that can stably produce a laminated body including a vapor-deposited polymer film having a predetermined composition and thickness on a film substrate. The apparatus includes: a film substrate supply means 46 that supplies a film substrate 15 on an outer peripheral surface of a rotary drum 35 in a vacuum chamber 24; a plurality of blowoff members 64 positioned around the rotary drum 35, each of the plurality of blowoff members including a vapor outlet 66 opening inside the vacuum chamber 24 to the outer peripheral surface of the rotary drum 35 and an inner space constituting a deposition chamber; and at least one monomer vapor supply means 84 arranged to supply plural kinds of monomer vapor into the deposition chamber and blowoff the plural kinds of monomer vapor from the vapor outlet of each of the plurality of blowoff members.
    • 提供一种能够稳定地制造包括在膜基材上具有预定组成和厚度的气相沉积聚合物膜的层压体的装置。 该装置包括:薄膜基板供给装置46,其在真空室24中的旋转滚筒35的外周面上供给薄膜基板15; 多个排气构件64位于旋转鼓35周围,多个排气构件中的每一个包括在真空室24内部向旋转滚筒35的外周表面开口的蒸汽出口66和构成沉积室的内部空间; 以及至少一个单体蒸气供给装置84,其被配置为将多种单体蒸气供应到沉积室中,并从多个吹排构件中的每一个的蒸汽出口吹出多种单体蒸气。
    • 6. 发明公开
    • Substrate supporting device and sputtering apparatus including the same
    • Substratstützvorrichtungund Sputtervorrichtung damit
    • EP2060657A1
    • 2009-05-20
    • EP08253163.3
    • 2008-09-29
    • Kojima Press Industry Co., Ltd.
    • Ito, KaoruMatsui, Hirotoshi
    • C23C14/34C23C14/50
    • C23C14/505
    • A substrate supporting device (36) for forming a coating film having a maximally even and necessary thickness with a sufficiently strong adhesiveness and a good film quality on a substrate (23), and a sputtering apparatus including such a substrate supporting device (36). The substrate supporting device (36) for supporting a substrate (23) on which a coating film is formed by sputtering is disposed in a vacuum chamber so as to be opposed to a sputtering target (22). The substrate supporting device (36) is rotatable around a first rotation axis (38) by a first driving mechanism (42, 44, 46) and is rotatable around a second rotation axis (50) by a second driving mechanism (68,70,72).
    • 一种基板支撑装置(36),用于在基板(23)上形成具有最大均匀且必要厚度的涂膜,具有足够强的粘合性和良好的薄膜质量,以及包括这种基板支撑装置(36)的溅射装置。 用于支撑通过溅射形成涂膜的基板(23)的基板支撑装置(36)设置在与溅射靶(22)相对的真空室中。 基板支撑装置(36)可通过第一驱动机构(42,44,46)围绕第一旋转轴线(38)旋转,并且可通过第二驱动机构(68,70)绕第二旋转轴线(50)旋转, 72)。