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    • 9. 发明公开
    • SILICON NITRIDE CIRCUIT SUBSTRATE AND ELECTRONIC COMPONENT MODULE USING SAME
    • 硅氮化物电路衬底和使用该衬底的电子元件模块
    • EP3255666A1
    • 2017-12-13
    • EP16746466.8
    • 2016-01-26
    • Kabushiki Kaisha ToshibaToshiba Materials Co., Ltd.
    • KATO, HiromasaKITAMORI, NoboruNABA, TakayukiUMEHARA, Masashi
    • H01L23/36H01L23/13H05K1/03
    • H01L23/3735H01L21/4807H01L23/13H01L23/36H05K1/03
    • The present invention provides a silicon nitride circuit board in which metal plates are attached on front and rear sides of a silicon nitride substrate having a three-point flexural strength of 500 MPa or higher, wherein assuming that a thickness of the metal plate on the front side is denoted by t1, and a thickness of the metal plate on the rear side is denoted by t2, a numerical relation: |t1 - t2| ≥ 0.30 mm is satisfied, and a warp is formed in the silicon nitride substrate so that the silicon nitride substrate is convex toward the metal plate on one of the front side or the rear side; and warp amounts of the silicon nitride substrate in a long-side direction and a short-side direction both fall within a range from 0.01 to 1.0 mm. It is preferable that a longitudinal width (L1) of the silicon nitride substrate falls within a range from 10 to 200 mm, and a transverse width (L2) of the silicon nitride substrate falls within a range from 10 to 200 mm. Due to above structure, even if the silicon nitride circuit board has a large difference in thickness between the metal plates attached on front and rear sides of the silicon nitride substrate, TCT properties can be greatly improved.
    • 本发明提供一种氮化硅电路板,其中金属板被附着在三点弯曲强度为500MPa或更高的氮化硅衬底的前侧和后侧上,其中假设前侧上的金属板的厚度 用t1表示后侧的金属板的厚度,用t2表示数值关系:| t1-t2 | ≥0.30mm,并且在氮化硅衬底中形成翘曲,使得氮化硅衬底在前侧或后侧中的一侧上朝向金属板凸起; 氮化硅基板的长边方向和短边方向的翘曲量均在0.01〜1.0mm的范围内。 氮化硅基板的纵向宽度(L1)优选为10〜200mm的范围,氮化硅基板的横向宽度(L2)优选为10〜200mm的范围。 由于上述结构,即使氮化硅电路板在氮化硅衬底的前侧和后侧上附着的金属板之间具有大的厚度差异,TCT性能也可以大大提高。