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1. 发明公开

EP2264200A1 MAGNESIUM ALLOY AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译： MAGNESIUMLEGIERUNG UND HERSTELLUNGSVERFAHRENDAFÜR
公开(公告)号：EP2264200A1
公开(公告)日：2010-12-22
申请号：EP09728964.9
申请日：2009-03-30
申请人： Kabushiki Kaisha Kobe Seiko Sho
发明人： TAKAGI, Toshiaki , NAGAO, Mamoru
IPC分类号： C22C23/06 , C22F1/06 , C22F1/00
CPC分类号： C22F1/06 , C22C23/06
摘要： A magnesium alloy having excellent strength and elongation at high temperatures and further having excellent creep characteristics at high temperatures. Also provided is a process for producing the alloy. In producing the magnesium alloy, a magnesium alloy containing yttrium and samarium in respective specific amounts is cast and the resultant cast is subjected to a solution heat treatment, subsequently hot working, and then an aging treatment, thereby reducing the average crystal grain diameter of the structure. In addition, the amounts of the yttrium and samarium in solution in the magnesium matrix are balanced with the number of precipitate particles of a specific size in the crystal grains. The magnesium alloy thus obtained has excellent strength and elongation at high temperatures and further having excellent creep characteristics at high temperatures.
摘要翻译：镁合金在高温下具有优异的强度和伸长率，并且在高温下还具有优异的蠕变特性。还提供了一种生产该合金的方法。在制造镁合金时，将含有钇和钐的镁合金分别进行铸造，然后对所得铸件进行固溶热处理，随后进行热加工，然后进行时效处理，从而使平均晶粒直径减小结构体。此外，镁基质中溶液中的钇和钐的量与晶粒中特定尺寸的沉淀颗粒的数量相平衡。由此获得的镁合金在高温下具有优异的强度和伸长率，并且在高温下还具有优异的蠕变特性。

2. 发明公开

EP2626443A1 AL-BASED ALLOY SPUTTERING TARGET AND PRODUCTION METHOD OF SAME 审中-公开
标题翻译： AL-LEGIERUNGS-SPUTTERTARGET UND HERSTELLUNGSVERFAHRENDAFÜR
公开(公告)号：EP2626443A1
公开(公告)日：2013-08-14
申请号：EP11830700.8
申请日：2011-10-05
申请人： Kabushiki Kaisha Kobe Seiko Sho , Kobelco Research Institute , Inc.
发明人： MATSUMOTO, Katsushi , TAKAGI, Katsutoshi , TAKETOMI, Yuichi , NAKAI, Junichi , MAKINO, Hidetada , TAKAGI, Toshiaki
IPC分类号： C23C14/34 , B22F3/115 , B22F3/15 , B22F3/24 , C22C1/02 , C22C1/04 , C22C21/00 , C22F1/00
CPC分类号： C23C14/3414 , B22F3/115 , B22F3/15 , B22F3/24 , C22C1/0416 , C22C21/00 , C22F1/04 , C23C16/45504 , C23C16/4585 , C23C16/4586
摘要： There is provided an Al-based alloy sputtering target, which can provide an enhanced deposition rate (or sputtering rate) when the sputtering target is used, and which can preferably prevent the occurrence of splashes. The Al-based alloy sputtering target of the present invention includes Ta and may preferably include an Al-Ta-based intermetallic compound containing Al and Ta, which compound has a mean particle diameter of from 0.005 µm to 1.0 µm and a mean interparticle distance of from 0.01 µm to 10.0 µm.
摘要翻译：提供了一种Al基合金溅射靶，其可以在使用溅射靶时提供增强的沉积速率（或溅射速率），并且其可以优选地防止飞溅的发生。本发明的Al系合金溅射靶包括Ta，并且优选包括Al和Ta的Al-Ta系金属间化合物，该化合物的平均粒径为0.005〜1.0μm，平均粒子间距离为从0.01μm到10.0μm。

3. 发明授权

EP2264200B1 MAGNESIUM ALLOY AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译：镁合金及其制造方法
公开(公告)号：EP2264200B1
公开(公告)日：2012-06-27
申请号：EP09728964.9
申请日：2009-03-30
申请人： Kabushiki Kaisha Kobe Seiko Sho
发明人： TAKAGI, Toshiaki , NAGAO, Mamoru
IPC分类号： C22C23/06 , C22F1/06 , C22F1/00
CPC分类号： C22F1/06 , C22C23/06
摘要： A magnesium alloy having excellent strength and elongation at high temperatures and further having excellent creep characteristics at high temperatures. Also provided is a process for producing the alloy. In producing the magnesium alloy, a magnesium alloy containing yttrium and samarium in respective specific amounts is cast and the resultant cast is subjected to a solution heat treatment, subsequently hot working, and then an aging treatment, thereby reducing the average crystal grain diameter of the structure. In addition, the amounts of the yttrium and samarium in solution in the magnesium matrix are balanced with the number of precipitate particles of a specific size in the crystal grains. The magnesium alloy thus obtained has excellent strength and elongation at high temperatures and further having excellent creep characteristics at high temperatures.

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