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1. 发明公开

EP1734360A1 PLASMA GENERATING EQUIPMENT 有权
标题翻译：等离子切割机Verfahren undGerät
公开(公告)号：EP1734360A1
公开(公告)日：2006-12-20
申请号：EP05721448.8
申请日：2005-03-25
申请人： Japan Advanced Institute of Science and Technology
发明人： TAKAMURA, Yuzuru , IIDUKA, Akiko , TAMIYA, Eiichi
IPC分类号： G01N21/71
CPC分类号： G01N21/68 , G01N21/67 , G01N21/69
摘要： A method for generating plasma and a method for elemental analysis, each comprising the steps of providing a narrow portion in a flow channel made of an insulation material, the narrow portion having a cross-sectional area markedly smaller than a cross-sectional area of the flow channel; filling the flow channel and the narrow portion with a conductive liquid, and thereafter applying an electric field to the narrow portion, to conduct the electric field through the narrow portion, thereby generating plasma at the narrow portion. An apparatus for generating plasma, the apparatus for generating plasma comprising a narrow portion in a flow channel made of an insulation material, the narrow portion having a cross-sectional area markedly smaller than a cross-sectional area of the flow channel; and a means of applying an electric field to the narrow portion to conduct the electric field through the narrow portion; and an apparatus for emission spectroscopic analysis comprising the apparatus for generating plasma as defined above.
摘要翻译：一种用于产生等离子体的方法和元素分析方法，每个方法包括以下步骤：在由绝缘材料制成的流动通道中提供窄部分，所述窄部分的横截面积明显小于所述绝缘材料的横截面面积流通道用导电液体填充流动通道和狭窄部分，然后向窄部分施加电场，以使电场通过狭窄部分，从而在狭窄部分产生等离子体。一种用于产生等离子体的装置，用于产生等离子体的装置包括由绝缘材料制成的流动通道中的窄部分，所述窄部分具有明显小于所述流动通道的横截面积的横截面面积; 以及向狭窄部分施加电场以通过所述狭窄部分传导电场的装置; 以及包括如上所述产生等离子体的装置的发射光谱分析装置。

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