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1. 发明授权

EP1961739B1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION 有权
标题翻译：新的化合物，聚合物和树脂组分
公开(公告)号：EP1961739B1
公开(公告)日：2012-10-17
申请号：EP06834591.7
申请日：2006-12-13
申请人： JSR Corporation
发明人： NAGAI, Tomoki , EBATA, Takuma , MATSUMURA, Nobuji
IPC分类号： C07C381/12 , C08F220/28 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397

2. 发明公开

EP2088467A1 RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
标题翻译： STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG
公开(公告)号：EP2088467A1
公开(公告)日：2009-08-12
申请号：EP07831581.9
申请日：2007-11-09
申请人： JSR Corporation
发明人： NAGAI, Tomoki , EBATA, Takuma , SHIMIZU, Makoto
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern.

wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译：辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。辐射敏感性树脂组合物作为辐射敏感性酸发生剂具有优异的性能，包括仅在很小程度上不利地影响环境和人体的树脂，并且可以形成具有高分辨率并形成优异的抗蚀剂图案。其中R 1表示氢原子等，M +表示特定阳离子，n表示1〜5的整数。

3. 发明公开

EP1855159A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：组成为抗拒的下层膜和制造工艺及其
公开(公告)号：EP1855159A1
公开(公告)日：2007-11-14
申请号：EP06714631.6
申请日：2006-02-24
申请人： JSR Corporation
发明人： KONNO, Keiji , TANAKA, Masato , ISHII, Momoko , TAKAHASHI, Junichi , NAGAI, Tomoki
IPC分类号： G03F7/11 , H01L21/027
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A),

R 1 b R 2 c Si(OR 3 ) 4-a (A)

wherein R 1 is a monovalent organic group having at least one unsaturated bond, R 2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R 3 individually represents a monovalent organic group, R 1 is a group other than OR 3 , a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：一种用于抗蚀剂下层组合物，被膜上设置。该组合物具有优异的储存稳定性，并能形成一个抗蚀剂图案的抗蚀剂下层膜具有优异的粘附性的抗蚀剂电影，可提高再现性和在去除抗蚀剂过程中发展和氧灰化使用的碱性液体抗性。该组合物包括水解产物和/或下式的硅烷化合物的缩合物（A），€€ƒƒƒ€€€ƒƒƒ€€€ƒƒR1 B r的2 C的Si（OR 3）4- 一个€ƒ€ƒ€ƒ€ƒ€ƒ（A）worin R 1为具有至少一个不饱和键，R 2独立darstellt氢原子，卤素原子或一价有机基团，R为单价有机基团3独立darstellt 一价有机基团，R 1不是OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c是0〜2的整数，条件做了= b + C ，

4. 发明公开

EP3141958A3 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD 审中-公开
标题翻译：化学增强型抗蚀剂材料和抗蚀剂图案形成方法
公开(公告)号：EP3141958A3
公开(公告)日：2017-06-28
申请号：EP16188033.1
申请日：2016-09-09
申请人： JSR Corporation
发明人： NAKAGAWA, Hisashi , NARUOKA, Takehiko , NAGAI, Tomoki
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , C08F220/24 , C08F228/02 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/203 , G03F7/322 , G03F7/38
摘要： A chemically amplified resist material contains: (1) a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; (2) a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the polymer component (1) contains a first polymer having a first structural unit that includes a fluorine atom and does not include a salt structure, or a second polymer having a second structural unit that includes a fluorine atom and a salt structure, and wherein the component (2) contains component (a), any two of components (a) to (c), or all of components (a) to (c).
摘要翻译：化学放大型抗蚀剂材料含有：（1）通过酸的作用能够溶解或不溶于显影液中的聚合物成分; （2）能够在曝光时产生辐射敏感性敏化剂和酸的组分，其中所述聚合物组分（1）含有第一聚合物，所述第一聚合物具有包含氟原子的第一结构单元并且不包含盐结构（2）中含有成分（a），成分（a）〜成分（c）中的任意两种成分或成分（a）成分或全部成分 a）至（c）。

5. 发明公开

EP2128706A1 RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN 审中-公开
标题翻译： HARZZUSAMMENSETZZZZZUULLICHMACHUNG EINES RESISTMUSTERS电阻器
公开(公告)号：EP2128706A1
公开(公告)日：2009-12-02
申请号：EP08721759.2
申请日：2008-03-11
申请人： JSR Corporation
发明人： NAKAMURA, Atsushi , NAGAI, Tomoki , ABE, Takayoshi , KAKIZAWA, Tomohiro
IPC分类号： G03F7/40 , H01L21/027
CPC分类号： G03F7/70466 , G03F7/0035 , G03F7/0392 , G03F7/40 , H01L21/0274
摘要： A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first resist pattern by coating the first resist pattern with a resist pattern insolubilizing resin composition, baking or curing with UV, and developing the resist pattern insolubilizing resin composition, (3) a step of forming a second resist layer on the insolubilized resist pattern and selectively exposing the second resist layer to radiation through a mask, and (4) a step of developing the exposed second resist layer to form a second resist pattern.
摘要翻译：抗蚀剂图案形成方法包括：（1）形成第一抗蚀剂图案的步骤，该第一抗蚀剂图案包括在基板上形成第一抗蚀剂层，通过掩模选择性地将第一抗蚀剂层暴露于辐射，以及使曝光的第一抗蚀剂层显影）通过用抗蚀剂图案不溶化树脂组合物涂布第一抗蚀剂图案，用UV烘烤或固化并使抗蚀剂图案不溶化树脂组合物显影来使第一抗蚀剂图案不溶化的步骤，（3）在第二抗蚀剂图案上形成第二抗蚀剂层的步骤所述不溶解的抗蚀剂图案并且通过掩模选择性地暴露所述第二抗蚀剂层，以及（4）使所述暴露的第二抗蚀剂层显影以形成第二抗蚀剂图案的步骤。

6. 发明公开

EP3141958A2 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD 审中-公开
标题翻译： VERFAHREN ZUR RESISTSTRUKTURFORMUNG化学品
公开(公告)号：EP3141958A2
公开(公告)日：2017-03-15
申请号：EP16188033.1
申请日：2016-09-09
申请人： JSR Corporation
发明人： NAKAGAWA, Hisashi , NARUOKA, Takehiko , NAGAI, Tomoki
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , C08F220/24 , C08F228/02 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/203 , G03F7/322 , G03F7/38
摘要： A chemically amplified resist material contains: (1) a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; (2) a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the polymer component (1) contains a first polymer having a first structural unit that includes a fluorine atom and does not include a salt structure, or a second polymer having a second structural unit that includes a fluorine atom and a salt structure, and wherein the component (2) contains component (a), any two of components (a) to (c), or all of components (a) to (c).
摘要翻译：化学放大抗蚀剂材料包含：（1）能够通过酸的作用使其可溶于或不溶于显影剂溶液的聚合物组分; （2）能够在曝光时产生辐射敏感性敏化剂和酸的成分，其中，所述聚合物成分（1）含有具有第一结构单元的第一聚合物，所述第一结构单元包含氟原子，并且不包含盐结构或具有包含氟原子和盐结构的第二结构单元的第二聚合物，并且其中组分（2）含有组分（a），组分（a）至（c）中的任意两种或全部组分（ a）至（c）。

7. 发明授权

EP2080774B1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN 有权转让
标题翻译：聚合的磺酸鎓和树脂
公开(公告)号：EP2080774B1
公开(公告)日：2014-01-15
申请号：EP07831580.1
申请日：2007-11-09
申请人： JSR Corporation , Central Glass Co., Ltd.
发明人： NAGAI, Tomoki , EBATA, Takuma , SHIMIZU, Makoto , JODRY, Jonathan Joachim , NARIZUKA, Satoru , FUJIWARA, Masaki
IPC分类号： C08F20/38 , C07C309/12 , C07C381/12 , G03F7/004 , G03F7/039
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392

8. 发明公开

EP2080774A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN 有权转让
标题翻译： POLYMERISIERBARESSULFONSÄURE-ONIUMSALZ UND HARZ
公开(公告)号：EP2080774A1
公开(公告)日：2009-07-22
申请号：EP07831580.1
申请日：2007-11-09
申请人： JSR Corporation , Central Glass Co., Ltd.
发明人： NAGAI, Tomoki , EBATA, Takuma , SHIMIZU, Makoto , JODRY, Jonathan Joachim , NARIZUKA, Satoru , FUJIWARA, Masaki
IPC分类号： C08F20/38 , C07C309/12 , C07C381/12 , G03F7/004
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body.

wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n is an integer from 1 to 5.
摘要翻译：包含下式（10）所示的重复单元的树脂作为辐射敏感性酸产生剂具有优异的性能，并且对环境和人体仅表现出小的不利影响。其中R 1表示氢原子等，M +表示特定的阳离子，n为1〜5的整数。

9. 发明公开

EP1897869A1 NOVEL COMPOUND, POLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
标题翻译： NEER VERBINDUNG，POLYMER UND STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG
公开(公告)号：EP1897869A1
公开(公告)日：2008-03-12
申请号：EP06746255.6
申请日：2006-05-11
申请人： JSR Corporation
发明人： NAGAI, Tomoki , SHIMOKAWA, Tsutomu , SUGIURA, Makoto , KAWAKAMI, Takanori , EBATA, Takuma , YONEDA, Eiji , SHIMIZU, Makoto
IPC分类号： C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/02 , C08F220/12 , C08L33/04 , C08L41/00 , G03F7/039 , H01L21/027
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2),

wherein R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f s represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
摘要翻译：提供了对辐射具有高透明度的优异的辐射敏感性树脂组合物，作为抗敏剂，例如灵敏度，分辨率和图案形状的基本性能优异，特别是提供宽DOF的高分辨率辐射敏感性树脂组合物，优秀的LER。还提供了可用于组合物中的聚合物和用于合成聚合物的新型化合物。该新化合物由下式（2）表示，其中R 4表示甲基，三氟甲基或氢原子，R fs中的至少一个表示氟原子或具有1个的直链或支链全氟烷基至10个碳原子，A表示二价有机基团或单键，G表示具有氟原子或单键的二价有机基团，M m +表示金属离子或鎓阳离子，m表示1〜3的整数，p为1〜8的整数。

10. 发明公开

EP3926637A1 DATA PROCESSING METHOD, DATA PROCESSING DEVICE, AND DATA PROCESSING SYSTEM 审中-公开
公开(公告)号：EP3926637A1
公开(公告)日：2021-12-22
申请号：EP20754877.7
申请日：2020-02-06
申请人： JSR Corporation
发明人： ONISHI, Yuya , NAGAI, Tomoki
IPC分类号： G16C60/00
摘要： A data processing method according to the present invention acquires a first calculated value by a first calculation method as a physical property value and a second calculated value by a second calculation method as the physical property value of each of a plurality of first compounds whose true value of the physical property value is known, generates a first correction model for correcting the first calculated value to the true value and a second correction model for correcting the second calculated value to the true value, and stores, in a database, a corrected value corrected by the first correction model of a calculated value as the true value, the calculated value being acquired by the first calculation method as a physical property value of a second compound whose true value of the physical property value is unknown and acquired in a region including a region in which at least the first calculation method can obtain a calculation result, and stores, in the database, a corrected value corrected by the second correction model of a calculated value as the true value, the calculated value being acquired by the second calculation method as the physical property value of the second compound in a region including a region in which at least the first calculation method cannot obtain a calculation result.

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