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1. 发明公开

EP1647359A1 Polishing pad 有权
标题翻译： Polierkissen
公开(公告)号：EP1647359A1
公开(公告)日：2006-04-19
申请号：EP05022097.9
申请日：2005-10-11
申请人： JSR Corporation
发明人： Sakurai, Fujio , Koumura, Tomoo , Igarashi, Yoshinori
IPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/00 , B24D3/34
CPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/002 , B24D3/34
摘要： A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 60°C of 2 to 15 and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 90°C of 4 to 20 and is made of a polyurethane or polyurethane-urea. This polishing pad suppresses the scratching of the surface to be polished and planarizes the surface efficiently. A polishing pad having a polishing layer containing water-soluble particles can achieve a higher removal rate.
摘要翻译：具有抛光层的抛光垫，其具有特定的组成，30℃下的储能弹性模量与60℃下的储能弹性模量的比例为2〜15，在30℃下的储存弹性模量与 90℃下的储能弹性模量为4〜20，由聚氨酯或聚氨酯 - 尿素构成。该抛光垫抑制待抛光表面的划伤并有效地平坦化表面。具有含有水溶性颗粒的研磨层的抛光垫可以实现更高的去除率。

2. 发明授权

EP1647359B1 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：EP1647359B1
公开(公告)日：2008-01-09
申请号：EP05022097.9
申请日：2005-10-11
申请人： JSR Corporation
发明人： Sakurai, Fujio , Koumura, Tomoo , Igarashi, Yoshinori
IPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/00 , B24D3/34
CPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/002 , B24D3/34

3. 发明授权

EP1369204B1 Polishing pad and process for manufacturing a polishing pad 有权
标题翻译：抛光垫及其制造方法的抛光垫
公开(公告)号：EP1369204B1
公开(公告)日：2006-10-11
申请号：EP03012509.0
申请日：2003-06-02
申请人： JSR Corporation
发明人： Kawahashi, Nobuo , Hasegawa, Kuo , Shiho, Hiroshi , Koumura, Tomoo , Kawahara, Kouji , Hosaka, Yukio
IPC分类号： B24D13/12 , B24D13/14 , B24B37/04
CPC分类号： B24B37/26

4. 发明公开

EP1369204A1 Polishing pad and multi-layer polishing pad 有权
标题翻译： Polierkissen und Verfahren zur Herstellung eines Polierkissens
公开(公告)号：EP1369204A1
公开(公告)日：2003-12-10
申请号：EP03012509.0
申请日：2003-06-02
申请人： JSR Corporation
发明人： Kawahashi, Nobuo , Hasegawa, Kuo , Shiho, Hiroshi , Koumura, Tomoo , Kawahara, Kouji , Hosaka, Yukio
IPC分类号： B24D13/12 , B24D13/14 , B24B37/04
CPC分类号： B24B37/26
摘要： The present invention intends to provide a polishing pad and a multi-layer polishing pad (1) that can particularly effectively suppress scratch from occurring. The polishing pad (1) of the invention comprises at least one part selected from a groove (a) having at least one kind of shape selected from annular, lattice-like and spiral form on a polishing surface side, a concave portion (b) and a through hole (c). In the above, surface roughness of an inner surface of the part is 20 µm or less and the polishing pad (1) is used for chemical mechanical polishing.
摘要翻译：本发明旨在提供一种可以特别有效地抑制刮擦发生的抛光垫和多层抛光垫（1）。本发明的抛光垫（1）包括从抛光表面侧具有选自环形，格子状和螺旋形的至少一种形状的凹槽（a）中的至少一个部分，凹部（b）和通孔（c）。在上述中，该部件的内表面的表面粗糙度为20μm以下，抛光垫（1）用于化学机械研磨。

5. 发明授权

EP1201368B1 Polishing pad comprising a water-insoluble substance and method for producing thereof 有权
标题翻译：含有研磨垫及其制造方法相同的化合物Wasserumlöslichen
公开(公告)号：EP1201368B1
公开(公告)日：2008-01-16
申请号：EP01125161.8
申请日：2001-10-23
申请人： JSR Corporation
发明人： Hasegawa, Kou , Koumura, Tomoo , Kobayashi, Yutaka
IPC分类号： B24D3/32 , B24B37/04
CPC分类号： B24D3/32 , B24B37/24

6. 发明公开

EP1201368A3 Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof 有权
标题翻译：同一抛光垫组件，交联剂体的抛光垫，该抛光垫及其制造方法
公开(公告)号：EP1201368A3
公开(公告)日：2004-02-11
申请号：EP01125161.8
申请日：2001-10-23
申请人： JSR Corporation
发明人： Hasegawa, Kou , Koumura, Tomoo , Kobayashi, Yutaka
IPC分类号： B24D3/32 , B24B37/04
CPC分类号： B24D3/32 , B24B37/24
摘要： It is an object of the invention to provide a composition for forming a polishing pad comprising substances having specific functional groups exhibiting excellent hydrophilic properties and the like, a crosslinked body for polishing pad as well as a polishing pad with excellent water resisting and durability which exhibits excellent polishing performance including a high removal rate and method for producing thereof. The composition for forming a polishing pad comprises a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups. And a water-soluble substance such as cyclodextrin may be contained. A polishing pad can be manufactured using the composition above or the crosslinked body for polishing pad, and porous polishing pads may also be obtained.
摘要翻译：它是本发明的一个目的是提供一种组合物，用于形成的抛光垫，其包括具有表现出优异的亲水性能的特定官能团和类似物，用于抛光垫的交联体以及具有优良的耐水性和耐用性表现出的抛光垫的物质优良的抛光性能包括高去除速率和方法及其制造。用于形成抛光垫的组合物包含具有可交联的弹性体没有羧基，氨基，羟基，环氧基，磺酸和磷酸基团，和具有选自羧基，氨基中选择的至少一种官能团的水不溶性物质，羟基，环氧基，磺酸和磷酸基团。和水溶性物质：如环糊精可被包含。一种抛光垫，可以使用上述组合物或交联体用于抛光垫制造，并且多孔抛光垫可因此而获得。

7. 发明公开

EP1201368A2 Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof 有权
标题翻译：含有研磨垫及其制造方法相同的化合物Wasserumlöslichen
公开(公告)号：EP1201368A2
公开(公告)日：2002-05-02
申请号：EP01125161.8
申请日：2001-10-23
申请人： JSR Corporation
发明人： Hasegawa, Kou , Koumura, Tomoo , Kobayashi, Yutaka
IPC分类号： B24D3/32 , B24B37/04
CPC分类号： B24D3/32 , B24B37/24
摘要： It is an object of the invention to provide a composition for forming a polishing pad comprising substances having specific functional groups exhibiting excellent hydrophilic properties and the like, a crosslinked body for polishing pad as well as a polishing pad with excellent water resisting and durability which exhibits excellent polishing performance including a high removal rate and method for producing thereof. The composition for forming a polishing pad comprises a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups. And a water-soluble substance such as cyclodextrin may be contained. A polishing pad can be manufactured using the composition above or the crosslinked body for polishing pad, and porous polishing pads may also be obtained.
摘要翻译：它是本发明的一个目的是提供一种组合物，用于形成的抛光垫，其包括具有表现出优异的亲水性能的特定官能团和类似物，用于抛光垫的交联体以及具有优良的耐水性和耐用性表现出的抛光垫的物质优良的抛光性能包括高去除速率和方法及其制造。用于形成抛光垫的组合物包含具有可交联的弹性体没有羧基，氨基，羟基，环氧基，磺酸和磷酸基团，和具有选自羧基，氨基中选择的至少一种官能团的水不溶性物质，羟基，环氧基，磺酸和磷酸基团。和水溶性物质：如环糊精可被包含。一种抛光垫，可以使用上述组合物或交联体用于抛光垫制造，并且多孔抛光垫可因此而获得。

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