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1. 发明授权

EP1468785B1 Polishing pad and production method thereof 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：EP1468785B1
公开(公告)日：2015-03-18
申请号：EP04008869.2
申请日：2004-04-14
申请人： JSR Corporation
发明人： Sakurai, Fujio , Mihara, Iwao , Igarashi, Yoshinori , Hasegawa, Kou
IPC分类号： B24B37/24 , B24D18/00 , B24D3/34
CPC分类号： B24D18/00 , B24B37/24 , B24D3/342

2. 发明公开

EP1647359A1 Polishing pad 有权
标题翻译： Polierkissen
公开(公告)号：EP1647359A1
公开(公告)日：2006-04-19
申请号：EP05022097.9
申请日：2005-10-11
申请人： JSR Corporation
发明人： Sakurai, Fujio , Koumura, Tomoo , Igarashi, Yoshinori
IPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/00 , B24D3/34
CPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/002 , B24D3/34
摘要： A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 60°C of 2 to 15 and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 90°C of 4 to 20 and is made of a polyurethane or polyurethane-urea. This polishing pad suppresses the scratching of the surface to be polished and planarizes the surface efficiently. A polishing pad having a polishing layer containing water-soluble particles can achieve a higher removal rate.
摘要翻译：具有抛光层的抛光垫，其具有特定的组成，30℃下的储能弹性模量与60℃下的储能弹性模量的比例为2〜15，在30℃下的储存弹性模量与 90℃下的储能弹性模量为4〜20，由聚氨酯或聚氨酯 - 尿素构成。该抛光垫抑制待抛光表面的划伤并有效地平坦化表面。具有含有水溶性颗粒的研磨层的抛光垫可以实现更高的去除率。

3. 发明授权

EP1647359B1 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：EP1647359B1
公开(公告)日：2008-01-09
申请号：EP05022097.9
申请日：2005-10-11
申请人： JSR Corporation
发明人： Sakurai, Fujio , Koumura, Tomoo , Igarashi, Yoshinori
IPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/00 , B24D3/34
CPC分类号： B24B7/04 , B24B29/00 , B24B37/04 , B24D3/002 , B24D3/34

4. 发明授权

EP1468785B8 Polishing pad and production method thereof 有权
标题翻译：同一抛光垫及其制造方法的
公开(公告)号：EP1468785B8
公开(公告)日：2015-04-22
申请号：EP04008869.2
申请日：2004-04-14
申请人： JSR Corporation
发明人： Sakurai, Fujio , Mihara, Iwao , Igarashi, Yoshinori , Hasegawa, Kou
IPC分类号： B24B37/24 , B24D18/00 , B24D3/34
CPC分类号： B24D18/00 , B24B37/24 , B24D3/342

5. 发明公开

EP1468785A3 Polishing pad and production method thereof 有权
标题翻译：同一抛光垫及其制造方法的
公开(公告)号：EP1468785A3
公开(公告)日：2005-12-07
申请号：EP04008869.2
申请日：2004-04-14
申请人： JSR Corporation
发明人： Sakurai, Fujio , Mihara, Iwao , Igarashi, Yoshinori , Hasegawa, Kou
IPC分类号： B24B37/04 , B24D3/34 , B24D13/14
CPC分类号： B24D18/00 , B24B37/24 , B24D3/342
摘要： There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as β-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4'-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.

6. 发明公开

EP1468785A2 Polishing pad and production method thereof 有权
标题翻译： Polierkissen und Herstellungsverfahren desselben
公开(公告)号：EP1468785A2
公开(公告)日：2004-10-20
申请号：EP04008869.2
申请日：2004-04-14
申请人： JSR Corporation
发明人： Sakurai, Fujio , Mihara, Iwao , Igarashi, Yoshinori , Hasegawa, Kou
IPC分类号： B24B37/04 , B24D3/34
CPC分类号： B24D18/00 , B24B37/24 , B24D3/342
摘要： There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as β-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4'-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.
摘要翻译：本发明提供了一种研磨抛光稳定性优异且研磨时的浆料保持性良好，即使在修整后也能够有效地抑制研磨速度降低且平坦化被研磨基板的能力优异的抛光垫，抛光垫。该方法包括将水溶性颗粒如β-环糊精分散到交联剂例如聚丙二醇中，以获得分散体，将分散体与多异氰酸酯如4,4'-二苯基甲烷二异氰酸酯和/或异氰酸酯封端氨基甲酸酯预聚物，并使混合溶液反应，以获得具有分散在基质中的水溶性颗粒的抛光垫。

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