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1. 发明公开

EP2317535A3 Pattern definition device with multiple multibeam array 有权转让
标题翻译：具有多个多波束阵列的结构，其限定装置
公开(公告)号：EP2317535A3
公开(公告)日：2014-07-16
申请号：EP10015402.0
申请日：2010-12-07
申请人： IMS Nanofabrication AG
发明人： Platzgummer, Elmar , Löschner, Hans
IPC分类号： H01J37/04 , H01J37/28 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3174 , H01J2237/0437 , H01J2237/0458 , H01J2237/1501 , H01J2237/1502
摘要： A multi-beam pattern definition device (102) for use in a particle-beam processing or inspection apparatus is configured to be irradiated with a beam (lp,bp) of electrically charged particles so as to form a number of beamlets to be imaged to a target. An aperture array means (202) comprises at least two sets of apertures (221, 222) for defining respective beamlets (b1-b5), wherein the sets of apertures comprise a plurality of apertures arranged in interlacing arrangements and the apertures of different sets are offset to each other by a common displacement vector (d12). An opening array means (201) has a plurality of openings (210) configured for the passage of a subset of beamlets corresponding to one of the sets of apertures but lacking openings (being opaque to the beam) at locations corresponding to the other sets of apertures. A positioning means shifts the aperture array means relative to the opening array means in order to selectively bring one of the sets of apertures into alignment with the openings in the opening array means.

2. 发明公开

EP2317535A2 Pattern definition device with multiple multibeam array 有权转让
标题翻译： Strukturdefinitionsvorrichtung mit mehreren Mehrstrahlarrays
公开(公告)号：EP2317535A2
公开(公告)日：2011-05-04
申请号：EP10015402.0
申请日：2010-12-07
申请人： IMS Nanofabrication AG
发明人： Platzgummer, Elmar , Löschner, Hans
IPC分类号： H01J37/04 , H01J37/28 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3174 , H01J2237/0437 , H01J2237/0458 , H01J2237/1501 , H01J2237/1502
摘要： A multi-beam pattern definition device (102) for use in a particle-beam processing or inspection apparatus is configured to be irradiated with a beam (lp,bp) of electrically charged particles so as to form a number of beamlets to be imaged to a target. An aperture array means (202) comprises at least two sets of apertures (221, 222) for defining respective beamlets (b1-b5), wherein the sets of apertures comprise a plurality of apertures arranged in interlacing arrangements and the apertures of different sets are offset to each other by a common displacement vector (d12). An opening array means (201) has a plurality of openings (210) configured for the passage of a subset of beamlets corresponding to one of the sets of apertures but lacking openings (being opaque to the beam) at locations corresponding to the other sets of apertures. A positioning means shifts the aperture array means relative to the opening array means in order to selectively bring one of the sets of apertures into alignment with the openings in the opening array means.
摘要翻译：用于粒子束处理或检查装置的多光束图案定义装置（102）被配置为用带电粒子的束（lp，bp）照射，以形成若干待成像的子束一个目标孔阵列装置（202）包括用于限定相应子束（b1-b5）的至少两组孔（221,222），其中所述孔组包括布置在隔行布置中的多个孔，并且不同组的孔是通过公共位移矢量（d12）彼此偏移。开口阵列装置（201）具有多个开口（210），所述多个开口（210）构造成用于通过对应于所述一组孔的子束的子集，但是在对应于其它组的位置的位置处缺少开口（对于不透明的）孔。定位装置相对于开口阵列装置移动孔阵列装置，以选择性地使这组孔中的一个孔与开口阵列装置中的开口对准。

3. 发明授权

EP2317535B1 Pattern definition device with multiple multibeam array 有权转让
标题翻译：具有多个多波束阵列的结构，其限定装置
公开(公告)号：EP2317535B1
公开(公告)日：2015-03-25
申请号：EP10015402.0
申请日：2010-12-07
申请人： IMS Nanofabrication AG
发明人： Platzgummer, Elmar , Löschner, Hans
IPC分类号： H01J37/04 , H01J37/28 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3174 , H01J2237/0437 , H01J2237/0458 , H01J2237/1501 , H01J2237/1502

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