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1. 发明公开

EP0503472A3 Exposure apparatus and method 失效
标题翻译：曝光装置及方法
公开(公告)号：EP0503472A3
公开(公告)日：1993-02-24
申请号：EP92103749.5
申请日：1992-03-05
申请人： HITACHI, LTD.
发明人： Noguchi, Minori , Kenbo, Yukio , Oshida, Yoshitada , Shiba, Masataka , Yoshitake, Yasuhiro , Murayama, Makoto
IPC分类号： G03F7/20
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An exposure apparatus and method wherein a mask (100) is illuminated with light and one of light transmitted through and light reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of this light from the illuminated mask is partially inhibited. More particularly, a spatial filter (3302) is utilized for inhibiting at least a portion of 0-order diffraction light.

2. 发明公开

EP0265917A2 Illumination apparatus for exposure 失效
标题翻译： BeleuchtungsapparatfürBelichtung。
公开(公告)号：EP0265917A2
公开(公告)日：1988-05-04
申请号：EP87115792.1
申请日：1987-10-27
申请人： HITACHI, LTD.
发明人： Yoshitake, Yasuhiro , Oshida, Yoshitada , Shiba, Masataka , Nakashima, Naoto
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/2006 , G03F7/70041 , G03F7/70058
摘要： An illumination apparatus is disclosed which is suitable for use in a projection/exposure system for projecting an image of a circuit pattern of a reticle (4) on a semiconductor wafer (6) through a projection lens (5). The illumination apparatus includes an excimer laser (1) for emitting a pulsed laser beam, an optical system (3) for illuminating the reticle (4) with a plurality of laser pulses emitted from the excimer laser (1) so that laser pulses having passed through the reticle (4) impinge on the semiconductor wafer (6) in different directions through the projection lens (5), and a light intensity control device (2) for controlling the light intensity of each of the laser pulses so that the laser pulses equally contribute to the reaction of a light sensitive material which is provided on the semiconductor wafer (6), with light.
摘要翻译：公开了一种适用于投影/曝光系统的照明装置，用于通过投影透镜（5）将半导体晶片（6）上的标线片（4）的电路图案的图像投影到投影/曝光系统中。照明装置包括用于发射脉冲激光束的准分子激光器（1），用于从准分子激光器（1）发射的多个激光脉冲照射标线片（4）的光学系统（3），使得激光脉冲已经通过通过所述标线片（4）通过所述投影透镜（5）在不同方向上撞击所述半导体晶片（6），以及光强度控制装置（2），用于控制所述激光脉冲的光强度，使得所述激光脉冲同样有助于提供在半导体晶片（6）上的光敏材料与光的反应。

3. 发明授权

EP0265917B1 Illumination apparatus for exposure 失效
标题翻译：照明用照明装置
公开(公告)号：EP0265917B1
公开(公告)日：1993-04-28
申请号：EP87115792.1
申请日：1987-10-27
申请人： HITACHI, LTD.
发明人： Yoshitake, Yasuhiro , Oshida, Yoshitada , Shiba, Masataka , Nakashima, Naoto
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/2006 , G03F7/70041 , G03F7/70058

4. 发明公开

EP0148477A3 Exposure apparatus and method of aligning exposure mask with workpiece 失效
标题翻译：曝光装置和工作接触掩模的方法
公开(公告)号：EP0148477A3
公开(公告)日：1985-09-04
申请号：EP84115889
申请日：1984-12-20
申请人： HITACHI, LTD.
发明人： Oshida, Yoshitada , Shiba, Masataka , Nakata, Toshihiko , Koizumi, Mitsuyoshi , Nakashima, Naoto
IPC分类号： G03B41/00
CPC分类号： G03F9/7049
摘要： An exposure apparatus comprises a light source (4), a mask plate (1) having an exposure pattern area section (11) and an alignment/reflection area section (30; 60), a projection lens (3), a movable stage (7) for holding a workpiece (2) having a workpiece alignment mark (22,22'), an alignment control (5, 80) and a driver for the movable stage. Before the exposure pattern area section (11) is illuminated by the light source (4) to be projected through the projection lens (3) onto the workpiece (2), the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section (30; 60) is on that surface of the mask plate (1) which does not face the light source (4) and includes a reflection portion for conducting light from another light source (503; 521-524; 51"; 90) to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion for providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.

5. 发明公开

EP0066295A1 Reflection type optical focusing apparatus 失效
标题翻译：光学反射器聚焦装置。
公开(公告)号：EP0066295A1
公开(公告)日：1982-12-08
申请号：EP82104828.7
申请日：1982-06-02
申请人： Hitachi, Ltd.
发明人： Shiba, Masataka , Oshida, Yoshitada
IPC分类号： G02B17/00 , G02B19/00
CPC分类号： G03F7/70358 , G02B19/0023 , G02B19/0047 , G02B19/0095
摘要： A reflection-type optical focusing apparatus comprising an optical focusing system including at least two 4th-degree surface reflectors (30, 31) with their revolving symmetric axis formed by a line connecting the position of a point source (A1) and the point source focusing position (A2), said reflectors being used in combination so that the light emitted from a point source placed at the point source position is focused to form a virtual point source at the point source focusing position, and a 4th-degree surface reflector (32) with its cross-section, on a plane including the revolving symmetric axis, forming a part of an ellipse with its major axis having a certain inclination with respect to the revolving symmetric axis, said virtual point source being located at one focal point (A2) of the ellipse so that a light image in the shape of an arc band (12) is obtained.

6. 发明授权

EP0503472B1 Exposure apparatus and method 失效
标题翻译：装置和方法用于曝光
公开(公告)号：EP0503472B1
公开(公告)日：2001-10-24
申请号：EP92103749.5
申请日：1992-03-05
申请人： Hitachi, Ltd.
发明人： Noguchi, Minori , Kenbo, Yukio , Oshida, Yoshitada , Shiba, Masataka , Yoshitake, Yasuhiro , Murayama, Makoto
IPC分类号： G03F7/20
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146

7. 发明授权

EP0182251B1 Alignment method for reduction projection type aligner 失效
标题翻译：减少投影类型对准器的对准方法
公开(公告)号：EP0182251B1
公开(公告)日：1989-10-18
申请号：EP85114364.4
申请日：1985-11-12
申请人： HITACHI, LTD.
发明人： Nakata, Toshihiko , Shiba, Masataka , Oshida, Yoshitada , Uto, Sachio , Yoshizaki, Atsuhiro
IPC分类号： H01L21/68 , G03F9/00 , G03B27/53 , G02B27/00
CPC分类号： G03F9/7076

8. 发明公开

EP0182251A1 Alignment method for reduction projection type aligner 失效
标题翻译：用于Ausrichtprojektor还原类型的调整过程。
公开(公告)号：EP0182251A1
公开(公告)日：1986-05-28
申请号：EP85114364.4
申请日：1985-11-12
申请人： HITACHI, LTD.
发明人： Nakata, Toshihiko , Shiba, Masataka , Oshida, Yoshitada , Uto, Sachio , Yoshizaki, Atsuhiro
IPC分类号： H01L21/68 , G03F9/00 , G03B27/53 , G02B27/00
CPC分类号： G03F9/7076
摘要： An alignment method for reduction projection type aligner is disclosed in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle (1) and the fine detection of reticle position in the wafer alignment for the alignment between a wafer (3) and the reticle (1) are performed automatically by the same reticle alignment pattern (18) and the same optical alignment detection system (38). A plurality of one- or two-dimensional Fresnel zone plates (19, 20) having different shapes of diffraction patterns formed outside of a reticle circuit pattern (16) and arranged at a position outward of the entrance pupil (2') of the reduction projection lens (2) are used as a a reticle alignment pattern (18) to detect the absolute position of the reticle (1). The detection field of view of the optical alignment detection system (38) is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern (18) and the same optical alignment detection system (38) are used for rough detection of reticle position in reticle alignment and fine detection of reti- cie position in wafer alignment. In the optical alignment detection system (38), on the other hand, the image position of the diffraction pattern (39a to 39c) from the reticle alignment pattern (18) and the image position of the wafer alignment pattern (14) are located at the same distance from the recticle surface.

9. 发明公开

EP0503472A2 Exposure apparatus and method 失效
标题翻译： Vorrichtung und Verfahren zur Belichtung。
公开(公告)号：EP0503472A2
公开(公告)日：1992-09-16
申请号：EP92103749.5
申请日：1992-03-05
申请人： HITACHI, LTD.
发明人： Noguchi, Minori , Kenbo, Yukio , Oshida, Yoshitada , Shiba, Masataka , Yoshitake, Yasuhiro , Murayama, Makoto
IPC分类号： G03F7/20
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An exposure apparatus and method wherein a mask (100) is illuminated with light and one of light transmitted through and light reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of this light from the illuminated mask is partially inhibited. More particularly, a spatial filter (3302) is utilized for inhibiting at least a portion of 0-order diffraction light.
摘要翻译：一种曝光装置和方法，其中用光照射掩模（100），并且透射透过的光中的一种和从照射的掩模反射的光被成像到基板上。至少在成像期间，部分地抑制来自照射的掩模的这种光的透射。更具体地，利用空间滤波器（3302）来抑制0次衍射光的至少一部分。

10. 发明授权

EP0148477B1 Exposure apparatus and method of aligning exposure mask with workpiece 失效
标题翻译：曝光装置和工件曝光掩模的方法
公开(公告)号：EP0148477B1
公开(公告)日：1991-09-04
申请号：EP84115889.2
申请日：1984-12-20
申请人： HITACHI, LTD.
发明人： Oshida, Yoshitada , Shiba, Masataka , Nakata, Toshihiko , Koizumi, Mitsuyoshi , Nakashima, Naoto
IPC分类号： G03B41/00
CPC分类号： G03F9/7049

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