会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明公开
    • Exposure apparatus and method of aligning exposure mask with workpiece
    • 曝光装置和工作接触掩模的方法
    • EP0148477A3
    • 1985-09-04
    • EP84115889
    • 1984-12-20
    • HITACHI, LTD.
    • Oshida, YoshitadaShiba, MasatakaNakata, ToshihikoKoizumi, MitsuyoshiNakashima, Naoto
    • G03B41/00
    • G03F9/7049
    • An exposure apparatus comprises a light source (4), a mask plate (1) having an exposure pattern area section (11) and an alignment/reflection area section (30; 60), a projection lens (3), a movable stage (7) for holding a workpiece (2) having a workpiece alignment mark (22,22'), an alignment control (5, 80) and a driver for the movable stage. Before the exposure pattern area section (11) is illuminated by the light source (4) to be projected through the projection lens (3) onto the workpiece (2), the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section (30; 60) is on that surface of the mask plate (1) which does not face the light source (4) and includes a reflection portion for conducting light from another light source (503; 521-524; 51"; 90) to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion for providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.
    • 6. 发明公开
    • Alignment method for reduction projection type aligner
    • 用于Ausrichtprojektor还原类型的调整过程。
    • EP0182251A1
    • 1986-05-28
    • EP85114364.4
    • 1985-11-12
    • HITACHI, LTD.
    • Nakata, ToshihikoShiba, MasatakaOshida, YoshitadaUto, SachioYoshizaki, Atsuhiro
    • H01L21/68G03F9/00G03B27/53G02B27/00
    • G03F9/7076
    • An alignment method for reduction projection type aligner is disclosed in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle (1) and the fine detection of reticle position in the wafer alignment for the alignment between a wafer (3) and the reticle (1) are performed automatically by the same reticle alignment pattern (18) and the same optical alignment detection system (38). A plurality of one- or two-dimensional Fresnel zone plates (19, 20) having different shapes of diffraction patterns formed outside of a reticle circuit pattern (16) and arranged at a position outward of the entrance pupil (2') of the reduction projection lens (2) are used as a a reticle alignment pattern (18) to detect the absolute position of the reticle (1). The detection field of view of the optical alignment detection system (38) is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern (18) and the same optical alignment detection system (38) are used for rough detection of reticle position in reticle alignment and fine detection of reti- cie position in wafer alignment. In the optical alignment detection system (38), on the other hand, the image position of the diffraction pattern (39a to 39c) from the reticle alignment pattern (18) and the image position of the wafer alignment pattern (14) are located at the same distance from the recticle surface.
    • 9. 发明公开
    • Photoacoustic signal detecting device
    • Vorrichtung zur Detektion eines photoakustischen信号。
    • EP0352789A2
    • 1990-01-31
    • EP89113875.2
    • 1989-07-27
    • HITACHI, LTD.
    • Nakata, ToshihikoKembo, Yukio
    • G01N21/17G01N29/00
    • G01N21/1702G01N2021/1782
    • A photoacoustic signal detecting device irradiates a modulated light on a sample (170) using focusing means (300, 400), detects a photoacoustic signal created in the sample using light interference detection means (310, 410) and finally displays the information relative to the surface and inside of the sample. The focusing means (300, 400) and light interference detection means (310, 410) are constructed in a confocal optical system, respectively, and a pin-­hole(s) is used to remove unnecessary high order dif­fraction light components around the light spot of the modulated light so that the photoacoustic signal can be detected with a high accuracy. Further, an auto-­focusing function (330, 430) is added to the photoacoustic signal detection so that the photoacoustic signal can be detected with a high accuracy also for a sample with rugged surface.
    • 光声信号检测装置使用聚焦装置(300,400)将调制光照射在样品(170)上,使用光干涉检测装置(310,410)检测样品中产生的光声信号,并最终显示关于 表面和样品内部。 聚焦装置(300,400)和光干涉检测装置(310,410)分别构造在共焦光学系统中,并且使用针孔来去除光点周围的不必要的高阶衍射光分量 的调制光,使得可以高精度地检测光声信号。 此外,将自动对焦功能(330,430)添加到光声信号检测中,使得对于具有粗糙表面的样品,可以以高精度检测光声信号。