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1. 发明公开

EP4159700A1 HARDENING AID SOLUTION, SELF-HARDENING MATERIAL, AND HARDENED BODY, AND METHODS FOR PRODUCING SAME 审中-实审
公开(公告)号：EP4159700A1
公开(公告)日：2023-04-05
申请号：EP21813662.0
申请日：2021-05-14
申请人： Fujimi Incorporated , Obayashi Corporation , Nagoya Institute Of Technology
发明人： HAYAKAWA, Takashi , MIWA, Naoya , ASHITAKA, Keiji , HITOMI, Takashi , TAGUCHI, Nobuko , SHIRAI, Takashi , XIN, Yunzi
IPC分类号： C04B14/04 , C04B18/08 , C04B28/26
摘要： The present invention provides means capable of imparting high temporal stability to a hardening aid solution which serves as a raw material and capable of imparting high strength and high quality stability to a hardened body of the self-hardening material, in the hardened body of the self-hardening material that contains a ceramic powder containing Si element at least on the surface thereof. The present invention relates to a hardening aid solution containing Si element, an alkali, and a dispersing medium, wherein the dispersing medium contains water; a dissolution concentration of the Si element is 20000 mass ppm or more; the number of moles of the alkali present in 1 kg of the dispersing medium is 2 mol/kg or more; an absolute value of an amount of change in a dissolution concentration of Si element in a solution obtained by diluting the hardening aid solution by 2 times based on the mass using an aqueous KOH solution having a concentration of 3 mol/L is 2000 mass ppm or less, between before and after a heat dissolution test including heating the solution at a solution temperature of 80°C for 5 hours, and then allowing the solution to stand in an ambient environment at 25°C for 1 hour; and the hardening aid solution is used for hardening a powder containing a ceramic powder containing Si element at least on the surface thereof.

2. 发明公开

EP3984950A1 PRODUCTION METHOD FOR TITANIUM PHOSPHATE POWDER 审中-公开
公开(公告)号：EP3984950A1
公开(公告)日：2022-04-20
申请号：EP21214767.2
申请日：2018-03-20
申请人： Fujimi Incorporated
发明人： IWAKUNI, Mayumi , ASHITAKA, Keiji , MIWA, Naoya
IPC分类号： C01B25/37 , A61K8/29 , A61Q17/04 , C01G23/00 , C09C1/36 , A61K8/02 , A61Q1/02 , A61Q19/00
摘要： The titanium phosphate powder of the present invention includes plate-shaped crystalline particles of titanium phosphate, an average thickness of the plate-shaped crystalline particles is 0.01 µm or more and less than 0.10 µm, and an aspect ratio, which is a value obtained by dividing an average primary particle diameter of the plate-shaped crystalline particles by the average thickness, is 5 or more. In the method for producing a titanium phosphate powder of the present invention, a raw material containing titanium and phosphorus is caused to react by a hydrothermal synthesis method, and when the titanium phosphate powder including plate-shaped crystalline particles of titanium phosphate is produced, a mixture of titanium sulfate and phosphoric acid is used as the raw material.

3. 发明公开

EP3854753A1 WHITE PIGMENT FOR COSMETICS, AND COSMETIC 审中-公开
公开(公告)号：EP3854753A1
公开(公告)日：2021-07-28
申请号：EP19862336.5
申请日：2019-03-28
申请人： Fujimi Incorporated
发明人： IWAKUNI, Mayumi , ASHITAKA, Keiji , MIWA, Naoya
IPC分类号： C01B25/37 , A61K8/29 , A61Q1/12
摘要： Provided is a white pigment for cosmetics capable of giving a cosmetic that gives a coating film having less stickiness and higher long-lasting properties. A white pigment for cosmetics of the present invention includes a titanium phosphate powder, the titanium phosphate powder includes crystal particles of titanium phosphate, and a ratio (oil absorption value/specific surface area) of an oil absorption value (ml/100 g) to a specific surface area (m 2 /g) of the crystal particles is 2.0 or more.

4. 发明公开

EP3778534A1 DISPERSION FOR SILICON CARBIDE SINTERED BODY, GREEN SHEET FOR SILICON CARBIDE SINTERED BODY AND PREPREG MATERIAL FOR SILICON CARBIDE SINTERED BODY USING SAME, AND METHOD OF PRODUCING SAME 有权
公开(公告)号：EP3778534A1
公开(公告)日：2021-02-17
申请号：EP19777660.2
申请日：2019-03-26
申请人： Fujimi Incorporated
发明人： KAMOSHIDA, Keigo , TAGUCHI, Souma , ASHITAKA, Keiji , MIWA, Naoya
IPC分类号： C04B35/626 , C01B21/064 , C01B32/956 , C04B35/565 , C04B35/628 , C08K3/14 , C08K3/38 , C08K9/02 , C08K9/12 , C08L101/02 , C08L101/06
摘要： Provided are a dispersion for a silicon carbide sintered body having a small environmental load, high dispersibility, and excellent temporal stability, and a manufacturing method thereof.
The dispersion is a dispersion for a silicon carbide sintered body, containing: silicon carbide particles; boron nitride particles; a resin having a hydroxyl group; and water, wherein the dispersion has a pH at 25°C of less than or equal to 7.0, and the silicon carbide particles and the boron nitride particles have charges of the same sign. The dispersion is manufactured by a manufacturing method of a dispersion for a silicon carbide sintered body, including a mixing step of mixing a water dispersion containing silicon carbide particles, a water dispersion containing boron nitride particles, and an aqueous solution containing a resin having a hydroxyl group.

5. 发明公开

EP3127984A1 POLISHING COMPOSITION FOR HARD MATERIALS 审中-公开
标题翻译： POLIERZUSAMMENSETZUNGFÜRHARTE MATERIALIEN
公开(公告)号：EP3127984A1
公开(公告)日：2017-02-08
申请号：EP15774104.2
申请日：2015-04-02
申请人： Fujimi Incorporated
发明人： ASHITAKA, Keiji , TOUJINBARA, Kazuma , MIWA, Naoya
IPC分类号： C09K3/14 , B24B37/00 , H01L21/304
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1409 , C09K3/1463 , C23F3/06
摘要： This invention provides a polishing composition with which high-rate polishing is possible in an application where an object formed of a hard material is polished and also a method for producing a hard material, using the polishing composition. The polishing composition provided by this invention is characterized by that an abrasive formed of titanium diboride is dispersed in a dispersing medium. The hard material production method provided by this invention comprises a step of polishing a hard material surface with the polishing composition.
摘要翻译：本发明提供了一种抛光组合物，其中在由硬质材料形成的物体被抛光的应用中可以进行高速抛光，以及使用抛光组合物的硬质材料的制造方法。由本发明提供的抛光组合物的特征在于，由二硼化钛形成的研磨剂分散在分散介质中。本发明提供的硬质材料制造方法包括用抛光组合物研磨硬质材料表面的工序。

6. 发明公开

EP2628567A1 POLISHING COMPOSITION 有权
标题翻译：抛光组合物
公开(公告)号：EP2628567A1
公开(公告)日：2013-08-21
申请号：EP11832479.7
申请日：2011-10-06
申请人： Fujimi Incorporated
发明人： ASHITAKA, Keiji , MORINAGA, Hitoshi , YASUI, Akihito
IPC分类号： B24B37/00 , C09K3/14 , H01L21/304
CPC分类号： C09K3/1409 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition contains colloidal silica particles having protrusions on the surfaces thereof. The average of values respectively obtained by dividing the height of a protrusion on the surface of each particle belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles by the width of a base portion of the same protrusion is no less than 0.245. Preferably, the part of the colloidal silica particles that has larger particle diameter than the volume average particle diameter of the colloidal silica particles has an average aspect ratio of no less than 1.15. Preferably, the protrusions on the surfaces of particles belonging to the part of the colloidal silica particles that has larger particle diameters than the volume average particle diameter of the colloidal silica particles have an average height of no less than 3.5 nm.

7. 发明公开

EP4299512A1 TITANIUM PHOSPHATE POWDER AND PRODUCTION METHOD THEREOF 审中-公开
公开(公告)号：EP4299512A1
公开(公告)日：2024-01-03
申请号：EP23182482.2
申请日：2023-06-29
申请人： Fujimi Incorporated
发明人： NOMURA, Ryo , ASHITAKA, Keiji , MIWA, Naoya
IPC分类号： C01B25/26 , C01B25/37
摘要： A titanium phosphate powder containing plate-like particles with a reduced content ratio of byproducts other than the plate-like particles, and exhibiting crystallinity of titanium phosphate represented by a chemical formula Ti(HPO 4 ) 2 ·nH 2 O (0≤n≤1) is provided in the present disclosure. The present disclosure relates to a method for producing a titanium phosphate powder exhibiting crystallinity of titanium phosphate represented by a chemical formula Ti(HPO 4 ) 2 ·nH 2 O (0≤n≤1), and containing plate-like particles, the method comprising putting an acidic raw material aqueous solution containing phosphorus and titanium in a sealed vessel, and storing the sealed vessel containing the raw material aqueous solution for a period of 2 hours or more, with the ambient temperature of the sealed vessel maintained under a constant temperature condition within a range of 40°C or more and less than 100°C, wherein during the storage, the raw material aqueous solution is not stirred, or during the storage, the raw material aqueous solution is stirred, and in the case where the raw material aqueous solution is stirred during the storage, a swirl flow rate in stirring the raw material aqueous solution is within a range of more than 0 m/s and 0.30 m/s or less.

8. 发明公开

EP4011552A1 METHOD FOR FILTERING POLISHING-ADDITIVE-CONTAINING LIQUID, POLISHING-ADDITIVE-CONTAINING LIQUID, POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND FILTER 审中-实审
公开(公告)号：EP4011552A1
公开(公告)日：2022-06-15
申请号：EP20849840.2
申请日：2020-07-30
申请人： Fujimi Incorporated
发明人： FURUTA, Shinji , HAYAKAWA, Takashi , ASHITAKA, Keiji , MIWA, Naoya , TSUCHIYA, Kohsuke , TANSHO, Hisanori , AKIZUKI, Reiko
IPC分类号： B24B57/02 , C09G1/02 , B24B37/00 , H01L21/304
摘要： Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excellent defect reducing capability while maintaining a practical filter life. The method for filtering a polishing additive-containing liquid provided by the present invention includes the step of: filtering the polishing additive-containing liquid with a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 µm or less. (2) The pore diameter gradient (S in /S out ), which is the ratio of the inlet-side average pore diameter (Sin) to the outlet-side average pore diameter (S out ), both diameters being measured through observation with an SEM, is 3 or less.

9. 发明公开

EP3588536A1 METHOD FOR POLISHING SILICON CARBIDE SUBSTRATE 审中-公开
公开(公告)号：EP3588536A1
公开(公告)日：2020-01-01
申请号：EP18756763.1
申请日：2018-02-06
申请人： Fujimi Incorporated
发明人： TOUJINBARA, Kazuma , MIWA, Naoya , ASHITAKA, Keiji
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
摘要： The present invention addresses the problem of providing a polishing method for polishing a silicon carbide substrate, which is capable of increasing the polishing speed even when using a polishing pad that usually does not lead to an increase in polishing speed.
A polishing method for polishing a silicon carbide substrate, the polishing method including a primary polishing step of polishing with a polishing member A containing abrasive grains using a polishing pad, the primary polishing step being polishing performed in association with a solid-phase reaction between the abrasive grains and the silicon carbide substrate.

10. 发明公开

EP3330223A1 METHOD FOR PRODUCING SILICA SOL 审中-公开
公开(公告)号：EP3330223A1
公开(公告)日：2018-06-06
申请号：EP16832831.8
申请日：2016-07-25
申请人： Fujimi Incorporated
发明人： ASHITAKA, Keiji , ITO, Masaaki , SHINODA, Jun
IPC分类号： C01B33/145
CPC分类号： C01B33/145
摘要： [Problem] Provided is a method for producing a silica sol capable of providing consistent production of the silica sol having a uniform particle size of silica particles in any particle size of the silica particles.
[Solution] A method for producing a silica sol is a method including a step of mixing liquid (A) containing an alkaline catalyst, water, and a first organic solvent with liquid (B) containing an alkoxysilane or its condensate and a second organic solvent, and liquid (C1) having a pH of 5.0 or higher and lower than 8.0 and containing water or liquid (C2) containing water and being free of an alkaline catalyst to make a reaction liquid.

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