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1. 发明公开

EP0871071A3 Method and apparatus for charged particle beam exposure 失效
标题翻译： Verfahren undGerätzur Belichtung mittels geladenen Teilchenstrahlen
公开(公告)号：EP0871071A3
公开(公告)日：2000-04-19
申请号：EP97308800.8
申请日：1997-11-03
申请人： FUJITSU LIMITED , Advantest Corporation
发明人： Kawakami, Kenichi , Susa, Masahiko , Yamashita, Koichi , Katsuhiko, Kobayashi , Yamada, Akio , Nishio, Naoki
IPC分类号： G03F7/20 , H01J37/302
CPC分类号： H01J37/3023 , H01J2237/31766
摘要： The present invention is a method of charged particle beam exposure wherein an area of an exposure pattern is exposed by irradiating a sample (36) with a charged particle beam while moving said sample, comprising: a step of generating speed data including the speed distribution in a direction of movement of the sample in accordance with secondary data which is generated from a pattern data including at least data (37) of the exposure pattern and data (38) of an exposure position, and includes at least density information of the exposure pattern; and a step of irradiating the sample (36) with the charged particle beam in accordance with the pattern data while being moved at variable speed in accordance with the speed data. According to the invention, the through-put is improved very much without any defect of the exposure.
摘要翻译：本发明是一种带电粒子束曝光的方法，其中通过在移动所述样品的同时照射具有带电粒子束的样品（36）来曝光曝光图案的区域，包括：产生包括速度分布的速度数据的步骤根据从包括曝光图案的数据（37）和曝光位置的数据（38））的图案数据生成的二次数据的样本的移动方向，并且至少包括曝光图案的浓度信息 ; 以及根据速度数据以可变速度移动，根据图案数据照射具有带电粒子束的样品（36）的步骤。根据本发明，绝对改善非常大，没有任何曝光缺陷。

2. 发明公开

EP0871071A2 Method and apparatus for charged particle beam exposure 失效
标题翻译： Verfahren undGerätzur Belichtung mittels geladener Teilchenstrahlen
公开(公告)号：EP0871071A2
公开(公告)日：1998-10-14
申请号：EP97308800.8
申请日：1997-11-03
申请人： FUJITSU LIMITED , Advantest Corporation
发明人： Kawakami, Kenichi , Susa, Masahiko , Yamashita, Koichi , Katsuhiko, Kobayashi , Yamada, Akio , Nishio, Naoki
IPC分类号： G03F7/20
CPC分类号： H01J37/3023 , H01J2237/31766
摘要： The present invention is a method of charged particle beam exposure wherein an area of an exposure pattern is exposed by irradiating a sample (36) with a charged particle beam while moving said sample, comprising: a step of generating speed data including the speed distribution in a direction of movement of the sample in accordance with secondary data which is generated from a pattern data including at least data (37) of the exposure pattern and data (38) of an exposure position, and includes at least density information of the exposure pattern; and a step of irradiating the sample (36) with the charged particle beam in accordance with the pattern data while being moved at variable speed in accordance with the speed data. According to the invention, the through-put is improved very much without any defect of the exposure.
摘要翻译：本发明是一种带电粒子束曝光的方法，其中通过在移动所述样品的同时照射具有带电粒子束的样品（36）来曝光曝光图案的区域，包括：产生包括速度分布的速度数据的步骤根据从包括曝光图案的数据（37）和曝光位置的数据（38））的图案数据生成的二次数据的样本的移动方向，并且至少包括曝光图案的浓度信息 ; 以及根据速度数据以可变速度移动，根据图案数据照射具有带电粒子束的样品（36）的步骤。根据本发明，绝对改善非常大，没有任何曝光缺陷。

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