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    • 1. 发明公开
    • DIFFERENTIAL PRESSURE TYPE FLOWMETER AND DIFFERENTIAL PRESSURE TYPE FLOWMETER CONTROLLER
    • STRÖMUNGSMESSERDES DIFFERENZDRUCKTYPS UNDSTRÖMUNGSMESSERSTEUERUNGDES DIFFERENZDRUCKTYPS
    • EP1643218A1
    • 2006-04-05
    • EP04746098.5
    • 2004-06-18
    • FUJIKIN INCORPORATEDOHMI, Tadahiro
    • OHMI, TadahiroSUGIYAMA, KazuhikoUNO, TomioIKEDA, NobukazuNISHINO, KoujiNAKAMURA, OsamuDOHI, RyousukeMATSUMOTO, Atsushi
    • G01F1/42G01F1/50G01F7/00
    • G01F1/50G01F1/42G05D7/0635
    • A cost reduction can be achieved by making a differential pressure type flowmeter simple in structure, and highly accurate flow rate measurements can be attained over the wide flow rate range of 100%-1 % with errors E of less than 1 (%SP) both in real time and in a state of inline.
      To achieve the ends, a differential pressure type flowmeter comprises an orifice, a detector to detect a fluid pressure P 1 on the upstream side of an orifice, a detector to detect a fluid pressure P 2 on the downstream side of an orifice, a detector to detect a fluid temperature T on the upstream side of an orifice, and a control computation circuit to compute a fluid's flow rate Q passing through an orifice by using the pressure P 1 , pressure P 2 and temperature T detected with the aforementioned detectors, and the aforementioned fluid's flow rate Q is computed with the equation Q=C1 · P1/√T· ((P 2 /P 1 ) m - (P 2 /P 1 ) n ) ½ (where C 1 is a proportional constant, and m and n are constants).
    • 通过使差压式流量计结构简单,可以实现成本降低,并且可以在100%-1%的宽流量范围内实现高精度的流量测量,误差E小于1(%SP) 在实时和处于内联状态。 为了达到目的,差压式流量计包括孔口,用于检测孔口上游侧的流体压力P 1的检测器,检测孔口下游侧的流体压力P 2的检测器,检测器 以检测孔口上游侧的流体温度T;以及控制运算电路,通过使用利用上述检测器检测出的压力P 1,压力P 2和温度T来计算通过孔口的流体流量Q,以及 上述流体的流量Q用等式Q = C1·P1 /šT·((P 2 / P 1)m - (P 2 / P 1)n)1/2来计算,其中C 1是比例常数,m 和n是常数)。
    • 3. 发明公开
    • GAS SUPPLY EQUIPMENT WITH PRESSURE TYPE FLOW RATE CONTROL DEVICE
    • GASVERSORGUNGSEINRICHTUNG MITDRUCKABHÄNGIGERDURCHFLUSSREGLUNGSVORRICHTUNG
    • EP1001326A1
    • 2000-05-17
    • EP99922553.5
    • 1999-05-27
    • Fujikin Inc.TOKYO ELECTRON LIMITEDOHMI, Tadahiro
    • OHMI, TadahiroKAGATSUME, SatoshiIKEDA, NobukazuNISHINO, KoujiYOSHIKAWA, KazuhiroIDETA, EijiDOHI, RyousukeUNO, TomioYAMAJI, Michio
    • G05D7/06
    • G05D7/0635Y10T137/7759Y10T137/7761
    • An improved and reduced-size low-cost gas supply system equipped with a pressure-type flow control used as in semiconductor manufacturing facilities. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, raising the flow rate control accuracy and reliability of facilities. That eliminates the quality ununiformity of products or semiconductors and raises the production efficiency.
      To illustrate, the gas supply system equipped with a pressure-type flow control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc = KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.
    • 一种改进且尺寸较小的低成本气体供应系统,配备有与半导体制造设备一样使用的压力型流量控制。 提高瞬态流量特性,防止气体开始时气体过冲,提高流量控制精度和设施可靠性。 这消除了产品或半导体的质量不均匀性并提高了生产效率。 为了说明,配置有压力型流量控制单元的气体供给系统被构造成使得在孔口的上游侧的压力保持为比下游压力高大约两倍或更多的气体,气体流量被控制以供应 气体通过孔口相关阀进入气体使用过程,所述气体供应系统包括用于接收来自气体供应源的气体的控制阀,设置在控制阀的下游侧的孔附件阀,设置有压力检测器 在控制阀和节流阀相关阀之间,设置在节流阀相关阀的阀机构的下游侧的孔口和计算控制单元,其中基于由压力检测器检测到的压力P1,流量 用公式Qc = KP1(K:常数)计算Qc,然后输入流量指定信号Qs和计算流量Qc之间的差作为控制符号 在控制阀的驱动中,由此调节用于调节压力P1的控制阀的打开,从而可以控制供给气体的流量。
    • 5. 发明公开
    • CAM VALVE
    • EP2058568A1
    • 2009-05-13
    • EP07790376.3
    • 2007-08-21
    • Fujikin Incorporated
    • DOHI, RyousukeNISHINO, KoujiIKEDA, NobukazuSAWADA, Yohei
    • F16K31/524F16K1/00F16K7/16F16K31/04F16K41/10
    • F16K31/04F16K7/16F16K31/52491
    • An actuator composed of a step motor and a cam mechanism is finely adjusted vertically so as to perform zero-point adjustment of a valve easily and readily.
      In a step motor driven cam valve 1 a stem 7 is disposed to freely ascend and descend within a body 2 having an in-low passage 2a, an out-flow passage 2b, a valve chamber 2c, and a valve seat 2d. The stem 7 is descended by an actuator disposed at a position above the stem 7 and composed of a step motor 9 and a cam mechanism 10 that changes a rotational motion of the step motor 9 to a linear motion and transmits the linear motion to the stem 7. A diaphragm 3 disposed within a valve chamber 2c or a valve body 30 arranged at a lower end part of the stem 7 rests on the valve seat 2d. A lift support mechanism 11 that supports the actuator to freely ascend and descend is arranged at a bonnet 5 that covers the valve chamber 2c of the body 2. A height fine-adjustment mechanism 12 finely adjusts the height of the actuator relative to the stem 7 and is arranged at the lift supporting mechanism 11.
    • 由步进电机和凸轮机构构成的致动器被垂直地精细调节,以便容易且容易地执行阀的零点调节。 在步进马达驱动的凸轮阀1中,杆7设置成在具有低位通道2a,流出通道2b,阀室2c和阀座2d的主体2内自由地上升和下降。 杆7由设置在杆7上方的致动器下降,并由步进电机9和凸轮机构10构成,该凸轮机构10将步进电机9的旋转运动变为线性运动并将线性运动传递到杆 布置在阀室2c内的隔膜3或布置在阀杆7的下端部处的阀体30搁置在阀座2d上。 支承致动器自由升降的升降支承机构11设置在覆盖本体2的阀室2c的阀盖5上。高度微调机构12对致动器相对于阀杆7的高度进行微调 并配置在升降支撑机构11上。
    • 6. 发明公开
    • METHOD OF DETECTING MALFUNCTION OF RESTRICTION MECHANISM DOWNSTREAM SIDE VALVE OF PRESSURE FLOW CONTROL DEVICE
    • 方法导致失败的一面阀随压力流量控制装置的制约机制检测
    • EP2037345A1
    • 2009-03-18
    • EP07766937.2
    • 2007-06-13
    • Fujikin Incorporated
    • NAGASE, MasaakiDOHI, RyousukeIKEDA, NobukazuNISHINO, KoujiHIRATA, KaoruSUGITA, KatsuyukiMATSUMOTO, Atsushi
    • G05D7/06
    • G05D7/0635G01F1/36G01F15/005G01F15/022
    • It has been found to be disadvantageous that, with a conventional pressure type flow control apparatus, it is not possible to determine the state of a valve on the downstream side of a throttle mechanism with a flow rate output signal due to the structural reason of the apparatus. To overcome the difficulty, the determination of whether a valve on the downstream side of a throttle mechanism is open is achieved at ease using the state of changes of a flow rate output signal while a pressure type flow control apparatus is in operation.
      With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe to be inputted to a pressure type flow control apparatus is changed to detect the magnitude ΔV of changes of a flow rate output signal Qo from a pressure type flow control apparatus while said flow rate setting value Qe changes so that it is determined either that a valve on the downstream side of a throttle mechanism is opening normally in the case that the magnitude ΔV of changes of said flow rate output signal Qo is found to be above the predetermined value, or that the releasing operations are malfunctioning in the case that the magnitude ΔV of changes is found to be below the predetermined value.
    • 已发现不利的是,在以往的压力式流量控制装置,它是不可能的确定性矿上用的流量输出信号的节流机构下游侧阀的状态由于该结构的原因 设备。 为了克服困难,是否上的节流机构下游侧阀打开使用流量输出信号的变化的状态,同时压力式流量控制装置是在操作放心实现该确定。 用压力式流量控制装置,在节流机构下游侧阀被释放,并且流量设定值Qe以输入到一个压力式流量控制装置被改变,以检测流量的变化幅度“V 率输出信号QO来自压力式流量控制装置,而所述流量设定值Qe变动,从而做到了为确定性开采无论做了节流机构下游侧阀的情况下正常地打开并的变化幅度“V 上述流量输出信号QO被发现是高于预定值,或做的开放动作是的情况下故障确实大小“的变化的V被认为是低于预定值。
    • 8. 发明公开
    • GASKET TYPE ORIFICE AND PRESSURE TYPE FLOW CONTROLLER USING THE SAME
    • DICHTUNGSÄHNLICHEÖFFNUNGUND DRUCKFLUSSREGLER DAMIT
    • EP1918799A1
    • 2008-05-07
    • EP06746185.5
    • 2006-05-10
    • FUJIKIN INCORPORATEDNational University Corporation Tohoku Unversity
    • OHMI, TadahiroNISHINO, KoujiDOHI, RyousukeIKEDA, NobukazuNAGASE, MasaakiHIRATA, KaoruSUGITA, KatsuyukiSHINOHARA, TsutomuHIROSE, TakashiIMAI, TomokazuYOSHIDA, ToshihideTANAKA, Hisashi
    • G05D7/06F16K27/00F16L55/00G01F1/42
    • F16K27/003F16L55/02718G01F1/36G01F15/001G01F15/005G05D7/0635
    • The present invention makes it possible for a flow rate to be controlled to be switched easily by means of an orifice being changed conveniently without disassembling or assembling a pressure type flow rate control apparatus.
      An orifice changeable pressure type flow rate control apparatus of the present invention is so constituted that a valve body (23) of a control valve (2) for a pressure type flow rate control apparatus (A) is installed between an inlet side fitting block (39) provided with a coupling part of a fluid supply pipe and an outlet side fitting block (43) provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body (23) and the afore-mentioned inlet side fitting block (39), and also a fluid outlet side of the afore-mentioned valve body (23) and the afore-mentioned outlet side fitting block (43) are detachably and hermitically connected, respectively, so that a flow passage for gases through the afore-mentioned control valve (2) is formed; and, a gasket type orifice (38) for a pressure type flow rate control apparatus (A) is removably inserted between a gasket type orifice insertion hole (42c) provided on the outlet side of the afore-mentioned valve body (23) and a gasket type orifice insertion hole (43b) of the outlet side fitting block (43b).
    • 本发明通过在不拆卸或组装压力式流量控制装置的情况下方便地改变孔口,可以容易地控制流量的切换。 本发明的节流孔可变压力型流量控制装置的特征在于,在压力式流量控制装置(A)的控制阀(2)的阀体(23)之间, 39)设置有流体供给管的联接部和设置有流体取出管的联接部的出口侧配件块(43) 阀体(23)和前述入口侧配件块(39)的流体入口侧以及上述阀体(23)的流体出口侧和上述出口侧配件块( 43)分别可拆卸地和隐蔽地连接,从而形成用于通过上述控制阀(2)的气体的流动通道; 并且用于压力式流量控制装置(A)的垫圈型孔口(38)可移除地插入设置在上述阀体(23)的出口侧的垫圈型孔插入孔(42c)和 出口侧装配块(43b)的垫圈型孔插入孔(43b)。
    • 9. 发明公开
    • VARIABLE FLOW RATE RATIO TYPE FLUID SUPPLY DEVICE
    • FLUSIIGITSAUSGABEVORRICHTUNG MIT VARIABLER FLUSSRATE
    • EP2034379A1
    • 2009-03-11
    • EP07766936.4
    • 2007-06-13
    • Fujikin Incorporated
    • HIRATA, KaoruSAWADA, YoheiDOHI, RyousukeNISHINO, KoujiIKEDA, Nobukazu
    • G05D7/06
    • G05D7/0664Y10T137/85938Y10T137/87314Y10T137/87539
    • A flow rate ratio variable type diverted gas supply apparatus with which a gas is supplied to a chamber of semiconductor manufacturing facilities achieves a substantial reduction in size and cost, and makes it possible that a flow rate ratio is regulated at ease and with high accuracy.
      With a flow rate ratio variable type fluid supply apparatus with which a gas of a flow rate Q supplied from a flow rate control system 6 is diverted and flowed to a No. 1 flow diverting pipe passage 1 and a No. 2 flow diverting pipe passage 2 with prescribed flow rates Q 1 /Q 0 so that the gas of flow rate Q is supplied to a chamber through both flow diverting pipe passages 1, 2, and the No. 1 orifice 3 having an opening area S 1 is installed on the aforementioned No. 1 flow diverting pipe passage 1, and the aforementioned No. 2 flow diverting pipe passage 2 is made to be a pipe passage to which a plurality of branch pipe passages 2a-2n are connected in parallel, and orifices 4a-4n having opening area S 2 a~S 2 n are installed on the aforementioned branch pipe passages 2a-2n respectively, and open/close valves Vb-Vn are installed on all, or some of, the aforementioned branch pipe passages, thus making it possible that gas of a flow rate Q is diverted and flowed to the flow diverting pipe passages 1, 2 with the flow rate ratio Q 1 /Q 0 equivalent to the ratio of the No. 1 orifice 3 of the aforementioned No. 1 flow diverting pipe passage1 and the total opening area S 2 o of the flow passable orifices of the aforementioned No. 2 flow diverting pipe passage 2 by means of regulating the total opening area S 2 o of flow passable orifices of the No. 2 flow diverting pipe passage by opening/closing operations of said open/close valves Vb-Vn.
    • 向半导体制造装置的室供给气体的流量比可变型转向气体供给装置实现了大幅度的尺寸和成本的降低,能够容易且准确地调节流量比。 利用流量比可变型流体供给装置,将从流量控制系统6供给的流量Q的气体转向并流向1号分流管路1和2号分流管路 2,具有规定的流量Q 1 / Q 0,使得流量Q的气体通过两个分流管路1,2供应到室,并且具有开口面积S1的1号孔3安装在 上述1号分流管路1和上述2号分流管路2成为多个分支管路2a-2n并联连接的管路,并且具有 开口区域S 2 a〜S 2 n分别安装在上述分支管路2a-2n上,并且开闭阀Vb-Vn安装在上述分支管道的全部或一部分上,从而使得 流量Q的气体被转向并流向流向分流管pi pe通道1,2,其流量比Q 1 / Q 0相当于上述1号分流管通道1的1号孔3的比例和流通通孔的总开口面积S 2 o 上述2号分流管路2,通过开闭阀Vb-Vn的开闭动作,调节2号分流管路的流通通路的总开口面积S 2 o。
    • 10. 发明公开
    • VAPORIZER/SUPPLIER OF MATERIAL AND AUTOMATIC PRESSURE REGULATOR FOR USE THEREIN
    • 蒸发/喂食材料和使用自动稳压器THEREIN
    • EP2034047A1
    • 2009-03-11
    • EP07766935.6
    • 2007-06-13
    • Fujikin Incorporated
    • HIRATA, KaoruNAGASE, MasaakiHIDAKA, AtsushiMATSUMOTO, AtsushiDOHI, RyousukeNISHINO, KoujiIKEDA, Nobukazu
    • C23C16/455H01L21/205
    • C23C16/4481C23C16/52G05D16/2013Y10T137/7737
    • Simplification and downsizing of the structure of an evaporation supply apparatus for the raw material used in manufacturing a semiconductor by the MODVC method are implemented. At the same time, stabilization and improvement of the quality of the semiconductor are implemented by highly accurately controlling the amount of raw material supplied to the process chamber.
      The evaporation supply apparatus of the present invention includes: a source tank in which a raw material is pooled; a flow rate control device that, while regulating the flow rate of carrier gas at a constant flow rate from a carrier gas supply source, supplies the carrier gas into the raw material in the source tank; a primary piping path for feeding mixed gas G 0 , made up of raw material vapor G 4 and carrier gas G 1 , pooled in an upper space of the source tank; an automatic pressure regulating device that regulates the opening degree of a control valve, interposed in the tail end of the primary piping path, based on the detected values of the pressure and temperature of mixed gas G 0 in the primary piping path to regulate the cross-sectional area of the passage through which the mixed gas G 0 is distributed so as to hold a pressure of the mixed gas G 0 inside the source tank at a constant value; and a constant-temperature heating unit for heating the source tank and parts excluding an arithmetic control unit of the automatic pressure regulating device to a set temperature, in which the mixed gas G 0 is supplied to a process chamber while controlling the pressure inside the source tank to a desired pressure.
    • 用于制造由该方法MODVC一个半导体中使用的原料的气化供给装置的结构的简化和小型化实现的。 与此同时,稳定和半导体的质量的提高是通过高度精确地设定控制原料供给到处理腔室的量实施。 本发明的蒸发供应设备包括:其中将原料汇集源罐; 一流量控制装置,虽然在从载气供给源的恒定流速调节载气的流量,载体气体供给到在源箱中的原料; 用于供给混合气体G 0的主配管路径,由原料蒸气G 4与载气G 1,在原料容器的上部空间中汇集的; 的自动压力调节装置做调控的控制阀的开度,在主配管路径的尾端插入,基于在主配管路径中的压力,并混合气体G 0的温度来调节交叉的检测值 通过该混合气G 0被分配,以保持混合气体G 0为恒定值的原料容器内的压力通道的截面面积; 以及用于加热源罐和不包括自动压力调节装置,以设定温度,其中,所述混合气体G 0,同时控制源的内部的压力被供给到处理腔室的运算控制部的各部分的恒温加热部 坦克所需的压力。