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    • 4. 发明授权
    • RETICLE POD
    • RETIKELHALTER
    • EP1928764B1
    • 2011-11-02
    • EP06815463.2
    • 2006-09-27
    • ENTEGRIS, INC.
    • KOLBOW, Steven, P.MCMULLEN, KevinTIEBEN, Anthony, M.KUSZ, MatthewANDERSEN, ChristianWANG, HuapingCISEWSKI, MichaelJOHNSON, Michael, L.HALBMAIER, David, L.LYSTAD, John
    • H01L21/67
    • B65D85/48G03F1/66H01L21/67353H01L21/67359H01L21/67383H01L21/67386
    • A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.
    • 提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触,其与晶片或掩模版配合以提供扩散屏障,以抵抗沉淀在晶片或掩模版的表面上的颗粒。 该容器包括具有平坦抛光表面的底座,该表面具有突出物,晶片或标线片搁置在该突起上。 这些突起具有诸如球体的几何形状,其赋予与晶片或掩模版的最小接触,并且将晶片或掩模版悬挂在基底上,从而在其间提供间隙。 间隙将晶片或掩模版与基底的平坦抛光表面隔离,但是其尺寸被设计成抑制颗粒迁移到间隙中,从而防止晶片或掩模版的敏感表面的污染。 扩散过滤器提供无过滤介质的压力均衡。 顶盖上的可移动分划板针可提供掩模版约束。 双重安全壳实施例提供了进一步的隔离和保护。