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1. 发明公开

EP1295172A2 COLOR PHOTOTHERMOGRAPHIC ELEMENTS COMPRISING PHENOLIC THERMAL SOLVENTS 审中-公开
标题翻译：热显影彩色照相元件时，酚醛热SOLVENTS CONTAIN
公开(公告)号：EP1295172A2
公开(公告)日：2003-03-26
申请号：EP01939413.9
申请日：2001-05-24
申请人： EASTMAN KODAK COMPANY
发明人： YANG, Xiqiang , OWCZARCZYK, Zbyslaw, Roland , SOUTHBY, David, Thomas , IRVING, Mark, Edward , MERKEL, Paul, Barrett , IRVING, Lyn, Marie , LEVY, David, Howard
IPC分类号： G03C1/498 , G03C1/42 , G03C7/28 , G03C8/40
CPC分类号： G03C8/4013 , G03C1/42 , G03C1/498 , G03C1/49845 , G03C7/28 , G03C8/402 , G03C8/408 , G03C2200/43 , G03C2200/52 , G03C2200/60 , Y10S430/165
摘要： A color photothermographic element comprising at least three light-sensitive units which have their individual sensitivities in different wavelength regions, each of the units comprising at least one light-sensitive silver-halide emulsion, binder, and dye-providing coupler, and a blocked developer in the presence of a thermal solvent represented by the following structure:wherein the groups are as defined in the specification to promote the thermal development of the photothermographic element.

2. 发明公开

EP2191036A2 DELIVERY DEVICE FOR DEPOSITION 有权
标题翻译： FREISETZUNGSVORRICHTUNGFÜRABLAGERUNG
公开(公告)号：EP2191036A2
公开(公告)日：2010-06-02
申请号：EP08834008.8
申请日：2008-09-24
申请人： Eastman Kodak Company
发明人： KERR, Roger, Stanley , LEVY, David, Howard , MURRAY, James, T.
IPC分类号： C23C16/455
CPC分类号： B05B1/005 , C23C16/45551 , C23C16/45574 , Y10T29/494 , Y10T29/49432 , Y10T29/49826 , Y10T137/0318 , Y10T137/87249
摘要： A delivery device for thin-film material deposition has at least first, second, and third inlet ports for receiving a common supply for a first, a second and a third gaseous material, respectively. Each of the first, second, and third elongated emissive channels allow gaseous fluid communication with one of corresponding first, second, and third inlet ports. The delivery device can be formed from apertured plates, superposed to define a network of interconnecting supply chambers and directing channels for routing each of the gaseous materials from its corresponding inlet port to a corresponding plurality of elongated emissive channels. The delivery device comprises a diffusing channel formed by a relief pattern between facing plates. Also disclosed is a process for thin film deposition. Finally, more generally, a flow diffuser and a corresponding method of diffusing flow is disclosed.
摘要翻译：用于薄膜材料沉积的递送装置具有至少第一，第二和第三入口端口，用于分别接收第一，第二和第三气态材料的共同供应。第一，第二和第三细长发射通道中的每一个允许与对应的第一，第二和第三入口端口之一的气态流体连通。输送装置可以由孔板形成，叠加以形成互连的供应室的网络，并且引导通道，用于将每个气态材料从其对应的入口端口路由到相应的多个细长的发射通道。输送装置包括由相对板之间的浮雕图案形成的扩散通道。还公开了一种用于薄膜沉积的方法。最后，更一般地，公开了流扩散器和相应的扩散流的方法。

3. 发明公开

EP1290492A1 RECORD-SHIFTED SCANNING OF SILVER-HALIDE-CONTAINING COLOR PHOTOGRAPHIC AND PHOTOTHERMOGRAPHIC ELEMENTS 审中-公开
标题翻译：具有悬浮RECORDING含有卤化银的彩色照相和光热敏照相元件扫描
公开(公告)号：EP1290492A1
公开(公告)日：2003-03-12
申请号：EP01941831.8
申请日：2001-06-01
申请人： EASTMAN KODAK COMPANY
发明人： SZAJEWSKI, Richard, Peter,c/o EASTMAN KODAK CO. , LEVY, David, Howard
IPC分类号： G03C7/30 , G03C8/40 , G03C7/392
CPC分类号： G03C7/30 , G03C1/42 , G03C5/164 , G03C7/3003 , G03C7/3041 , G03C7/39224 , G03C8/4013 , G03C2007/3015 , G03C2007/3043
摘要： The present invention is directed to a method of scanning silver-halide-containing color photographic and photothermographic film. In particular, the present invention comprises record shifting by means by employing at least one infrared dye in a color unit of the film, thereby forming at least one image record in the infrared. This expedient leads to the formation of high quality images, especially when scanning photothermographic elements in which the silver halide, metallic silver, and/or any organic silver salts have not been removed.

4. 发明公开

EP2494092A1 FLUID DISTRIBUTION MANIFOLD INCLUDING COMPLIANT PLATES 审中-公开
标题翻译：使用符合板液体分布LINE
公开(公告)号：EP2494092A1
公开(公告)日：2012-09-05
申请号：EP10774064.9
申请日：2010-10-19
申请人： Eastman Kodak Company
发明人： KERR, Roger, Stanley , LEVY, David, Howard
IPC分类号： C23C16/54 , C23C16/455 , H01L21/314 , H01L51/00
CPC分类号： C23C16/545 , C23C16/45551 , C23C16/45574 , Y10T137/8593 , Y10T156/10
摘要： A fluid distribution manifold includes a first plate and a second plate. The first plate includes a length dimension, a width dimension, and a thickness that allows the first plate to be deformable over at least one of the length dimension and the width dimension of the first plate. The second plate includes a length dimension, a width dimension, and a thickness that allows the second plate to be deformable over at least one of the length dimension and the width dimension of the second plate. At least a portion of at least the first plate and the second plate define a relief pattern that defines a fluid flow directing path. The first plate and the second plate are bonded together to form a non-planar shape in a height dimension along at least one of the length dimension and the width dimension.

5. 发明公开

EP2217969A1 PROCESS USING COLORED MASK COMBINED WITH SELECTIVE AREA DEPOSITION 审中-公开
标题翻译：有色MASK使用过程中选择性面积沉积联合
公开(公告)号：EP2217969A1
公开(公告)日：2010-08-18
申请号：EP08851673.7
申请日：2008-11-12
申请人： Eastman Kodak Company
发明人： IRVING, Lyn, Marie , FREEMAN, Diane, Carol , COWDERY-CORVAN, Peter, Jerome , YANG, Cheng , LEVY, David, Howard
IPC分类号： G03F7/00 , G03F7/20 , H01L21/77
CPC分类号： H01L27/1288 , G03F7/0005 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/1292 , H01L29/66765 , H01L29/7869
摘要： The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.

6. 发明公开

EP2212744A1 MULTICOLOR MASK 审中-公开
标题翻译：多色MASK
公开(公告)号：EP2212744A1
公开(公告)日：2010-08-04
申请号：EP08853119.9
申请日：2008-11-10
申请人： Eastman Kodak Company
发明人： IRVING, Lyn, Marie , LEVY, David, Howard , IRVING, Mark, Edward , ELLINGER, Carolyn, Rae
IPC分类号： G03F7/00 , G03F7/20 , H01L21/77
CPC分类号： G03F7/0007 , G03F1/14 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/1288 , H01L29/66765 , H01L29/7869 , Y10T428/24802
摘要： The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible light to cure the layer curable by light in exposed portions to form a cured pattern.

7. 发明授权

EP2217740B1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS 有权
标题翻译：方法选择性分离区无机材料
公开(公告)号：EP2217740B1
公开(公告)日：2014-02-26
申请号：EP08833709.2
申请日：2008-09-16
申请人： Eastman Kodak Company
发明人： YANG, Cheng , IRVING, Lyn, Marie , LEVY, David, Howard , COWDERY-CORVAN, Peter, Jerome , FREEMAN, Diane, Carol
IPC分类号： C23C16/04 , C23C16/455 , H01L21/02 , H01L21/314 , H01L21/316 , H01L51/00
CPC分类号： C23C16/45551 , C23C16/042 , H01L21/02175 , H01L21/02178 , H01L21/0228 , H01L21/02304 , H01L21/3141 , H01L21/31616 , H01L51/0004

8. 发明公开

EP2494090A1 FLUID CONVEYANCE SYSTEM INCLUDING FLEXIBLE RETAINING MECHANISM 审中-公开
标题翻译：具有柔性约束机制LIQUID支持系统
公开(公告)号：EP2494090A1
公开(公告)日：2012-09-05
申请号：EP10768658.6
申请日：2010-10-12
申请人： Eastman Kodak Company
发明人： KERR, Roger, Stanley , LEVY, David, Howard , SUTTON, James, Edward
IPC分类号： C23C16/458 , C23C16/54 , C23C16/455
CPC分类号： C23C16/458 , C23C16/45551 , C23C16/545 , Y10T137/8593
摘要： A fluid conveyance system for thin film material deposition includes a fluid distribution manifold and a substrate transport mechanism. The fluid distribution manifold includes an output face that includes a plurality of elongated slots. The output face of the fluid distribution manifold is positioned opposite a first surface of the substrate such that the elongated slots face the first surface of the substrate and are positioned proximate to the first surface of the substrate. The substrate transport mechanism causes a substrate to travel in a direction and includes a flexible mechanism that contacts a second surface of the substrate in a region that is proximate to the output face of the fluid distribution manifold.

9. 发明公开

EP2217740A1 PROCESS FOR SELECTIVE AREA DEPOSITION OF INORGANIC MATERIALS 有权
标题翻译：方法选择性分离区无机材料
公开(公告)号：EP2217740A1
公开(公告)日：2010-08-18
申请号：EP08833709.2
申请日：2008-09-16
申请人： Eastman Kodak Company
发明人： YANG, Cheng , IRVING, Lyn, Marie , LEVY, David, Howard , COWDERY-CORVAN, Peter, Jerome , FREEMAN, Diane, Carol
IPC分类号： C23C16/455 , C23C16/04
CPC分类号： C23C16/45551 , C23C16/042 , H01L21/02175 , H01L21/02178 , H01L21/0228 , H01L21/02304 , H01L21/3141 , H01L21/31616 , H01L51/0004
摘要： An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organic compound or polymer; and patterning the deposition inhibitor material either after step (b) or simultaneously with applying the deposition inhibitor material to provide selected areas of the substrate effectively not having the deposition inhibitor material. An inorganic thin film material is substantially deposited only in the selected areas of the substrate not having the deposition inhibitor material.

10. 发明公开

EP2106459A1 PROCESS FOR ATOMIC LAYER DEPOSITION 审中-公开
标题翻译： VERFAHREN ZUR ATOMSCHICHTABLAGERUNG
公开(公告)号：EP2106459A1
公开(公告)日：2009-10-07
申请号：EP08705590.1
申请日：2008-01-14
申请人： Eastman Kodak Company
发明人： COWDERY-CORVAN, Peter, Jerome , LEVY, David, Howard , NELSON, Shelby, Forrester , FREEMAN, Diane, Carol , PAWLIK, Thomas, D.
IPC分类号： C23C16/40 , C23C16/455 , C23C16/54
CPC分类号： C23C16/407 , B33Y80/00 , C23C16/45551 , C23C16/545
摘要： The present invention relates to a process of making a zinc-oxide-based thin film semiconductor, for use in a transistor, comprising thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising at least first, second, and third gaseous materials, wherein the first gaseous material is a zinc-containing volatile material and the second gaseous material is reactive therewith such that when one of the first or second gaseous materials are on the surface of the substrate the other of the first or second gaseous materials will react to deposit a layer of material on the substrate and wherein the third gaseous material is inert with respect to reacting with the first or second gaseous materials.
摘要翻译：本发明涉及制造用于晶体管的基于氧化锌的薄膜半导体的方法，其包括在衬底上的薄膜沉积，包括提供多种气态材料，所述气态材料至少包括第一，第二和第三气态材料其中所述第一气态物质是含锌挥发性物质，并且所述第二气态物质与其反应，使得当所述第一或第二气态物质中的一种位于所述基材的表面上时，所述第一或第二气态物质中的另一种将反应以在衬底上沉积一层材料，并且其中第三气态材料相对于与第一或第二气态材料的反应是惰性的。

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