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1. 发明公开

EP4163951A1 RADIO-FREQUENCY ANTENNA 审中-实审
公开(公告)号：EP4163951A1
公开(公告)日：2023-04-12
申请号：EP22210192.5
申请日：2021-04-14
申请人： EMD Corporation , Tomoegawa Co., Ltd.
发明人： Ebe, Akinori , Tsuda, Hajime , Moriuchi, Hideki
IPC分类号： H01J37/32 , H01Q1/00
摘要： [OBJECT] To provide a radio-frequency antenna through which a high amount of current can be efficiently passed even at a radio-frequency level for plasma generation, as well as a plasma processing device utilizing the radio-frequency antenna.
[MEANS FOR SOLVING PROBLEM] A radio-frequency antenna (10) according to the present invention includes a metal fiber sheet. A plasma processing device according to the present invention includes: a vacuum container (21) including a wall (211) having an opening (213); a radio-frequency antenna (10) including a metal fiber sheet and located at the opening (213); and a dielectric protection plate (12) located closer to the interior of the vacuum container (21) than the radio-frequency antenna (10) and configured to close the opening (213) in a gas-tight manner. The radio-frequency antenna (10) including a metal fiber sheet has a larger surface area and an accordingly lower impedance to a radio-frequency current than a radio-frequency antenna including a metal plate having the same outer shape. Therefore, it allows a radio-frequency current commonly used for plasma generation (e.g., at a frequency of 13.56 MHz) to be more efficiently passed through in large amounts.

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