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1. 发明授权

EP0703596B1 Method and apparatus for energy beam machining 失效
标题翻译：对于能量束加工方法和装置
公开(公告)号：EP0703596B1
公开(公告)日：2003-04-23
申请号：EP95114979.8
申请日：1995-09-22
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Nakao, Masayuki , Hatamura, Yotaro
IPC分类号： H01J37/305 , H01J37/31 , C03C23/00
CPC分类号： H01J37/3056 , H01J2237/3114

2. 发明公开

EP0703596A2 Method and apparatus for energy beam machining 失效
标题翻译： Verfahren undGerätzur Energiestrahlbearbeitung
公开(公告)号：EP0703596A2
公开(公告)日：1996-03-27
申请号：EP95114979.8
申请日：1995-09-22
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Nakao, Masayuki , Hatamura, Yotaro
IPC分类号： H01J37/305
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece (12) through a beam transmission hole (14a) defined in a mask (14). At that time, a relative position between an energy beam source (13) and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which corresponds to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths can be very easily made and further the product can be machined to desired depths with a high accuracy by a single machining operation in a short time.
摘要翻译：通过限定在掩模（14）中的光束透射孔（14a）将能量束照射到工件（12）。此时，能量束源（13）与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，这对应于照射量的能量束。通过这种方法，可以非常容易地制造具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以以高精度将产品加工成期望的深度。

3. 发明公开

EP0703596A3 Method and apparatus for energy beam machining 失效
标题翻译：对于能量束加工方法和装置
公开(公告)号：EP0703596A3
公开(公告)日：1999-01-07
申请号：EP95114979.8
申请日：1995-09-22
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Nakao, Masayuki , Hatamura, Yotaro
IPC分类号： H01J37/305
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece (12) through a beam transmission hole (14a) defined in a mask (14). At that time, a relative position between an energy beam source (13) and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which corresponds to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths can be very easily made and further the product can be machined to desired depths with a high accuracy by a single machining operation in a short time.

4. 发明公开

EP0731490A2 Ultra-fine microfabrication method using an energy beam 失效
标题翻译：超新星Mikroherstellungsverfahren unter Verwendung einesEnergiebündel
公开(公告)号：EP0731490A2
公开(公告)日：1996-09-11
申请号：EP96102976.6
申请日：1996-02-28
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Hatamura, Yotaro
IPC分类号： H01L21/033 , G03F7/00
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micronmeter sized micro-particles to produce a variety of three-dimensional fine-structures which have not been possible to produce by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of energy beam and shielding is combined with a shield positioning technique using magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particles beams or solutions, fine-structures of very high aspect ratios can be produced with precision. Applications of devices having the fine-structure produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.
摘要翻译：使用能量束的超微细微细加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生不可能通过传统光刻技术产生的各种三维微结构，基本上设计用于生产二维结构。当能量束和屏蔽辐射的基本技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不伴随反应气体粒子束或解决方案提供的附加化学效应时，非常高的方面的精细结构比率可以精确地生产。通过该方法制造的具有精细结构的器件的应用包括光通信中的波长偏移，量子效应器件和强激光器件。

5. 发明授权

EP0735564B1 Micro-processing apparatus and method therefor 失效
标题翻译：微机械加工的装置和方法
公开(公告)号：EP0735564B1
公开(公告)日：2003-11-05
申请号：EP96105077.0
申请日：1996-03-29
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Kajiyama, Masaaki , Tsuzuki, Takashi , Hatamura, Yotaro , Nakao, Masayuki
IPC分类号： H01J37/30 , H01J37/20
CPC分类号： H01J37/3005 , H01J37/20

6. 发明授权

EP0732624B1 Fabrication method with energy beam 失效
标题翻译： Herstellungsverfahren mit einemEnergiebündel
公开(公告)号：EP0732624B1
公开(公告)日：2001-10-10
申请号：EP96104171.2
申请日：1996-03-15
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Hatamura, Yotaro , Nakao, Masayuki
IPC分类号： G03F7/00 , H01L21/033 , H01L21/266 , G03F7/20 , H01J37/30
CPC分类号： H01L21/3086 , G03F7/001 , G03F7/2037 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337

7. 发明公开

EP0732624A3 Fabrication method with energy beam and fabrication apparatus therewith 失效
标题翻译： Herstellungsverfahren mit einemEnergiebündelund Einrichtungdafür
公开(公告)号：EP0732624A3
公开(公告)日：1998-03-11
申请号：EP96104171.2
申请日：1996-03-15
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Hatamura, Yotaro , Nakao, Masayuki
IPC分类号： G03F7/00 , H01L21/033
CPC分类号： H01L21/3086 , G03F7/001 , G03F7/2037 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337
摘要： A method and apparatus are presented for producing a three-dimensional ultra-fine micro-fabricated structures of the order of µm and less for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or array of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films on a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surface with grooved structure can be used as friction reduction means for bearing components. The fine groove dimensions of the order of nm is possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused beam is used, a technique of reduced projection imaging can be utilized to produce a fine-structure of the order of nm.
摘要翻译：本发明提供一种用于制造用于先进光通信系统和量子效应器件的数量级以下的三维超微细微结构的方法和装置。基本部件是能量束源，掩模构件和样品台。由于掩模构件是独立的部件，所以可以高精度地制造掩模构件相对于射束轴线和/或工件的相对运动的各种组合，以在工件上产生弯曲或倾斜的表面，从而产生多条线或阵列的凸或微型微透镜。精细结构的其他实例包括在多线图案或阵列图案中沉积薄膜。由于制造方法和制造材料的灵活性，具有带槽结构的曲面的迷宫式密封件可用作轴承部件的摩擦减小装置。 nm的细槽尺寸是可能的。能量束可以是快速原子束，离子束，电子束，激光束，辐射束，X射线束和自由基粒子束中的任何一种。通常使用平行光束，但是当使用聚焦光束时，可以利用减小投影成像的技术来产生nm数量级的精细结构。

8. 发明公开

EP0710057A1 Energy beam source and film deposit forming method therewith 失效
标题翻译： Energiestrahlquelle und Verfahren zur Schichtbildung mittels einer solchen Quelle
公开(公告)号：EP0710057A1
公开(公告)日：1996-05-01
申请号：EP95116425.0
申请日：1995-10-18
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kobata, Tadasuke , Hatamura, Yotaro , Nakao, Masayuki
IPC分类号： H05H3/02 , H01J37/305 , H01J37/317
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source presented is for use in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed in any location of the workpiece. Different types of particle beam, such as positive and negative ion beams, highspeed neutral atomic beam, radical particle beam, electron beam can be produced from the beam source by judicious choice of operating parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication tasks can be carried out on any surface and any location of a workpiece in a three-dimensional space. The availability of the compact energy beam source is expected to open a new path to such leading-edge industries as repair of semiconductor devices, circuit alteration/repair and micro-machining of ultrasmall components for various fields.
摘要翻译：提供的能量束源用于微加工任务，例如制造特定图案，原位粘合，电路径的修复，连接和断开，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源被制造成紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料（其可以是工艺气体）从束源产生不同类型的粒子束，例如正离子和负离子束，高速中性原子束，自由基粒子束，电子束或施加的涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务可以在三维空间中的工件的任何表面和任何位置上进行。预计紧凑型能量束源的可用性将为诸如半导体器件的修复，电路改变/修复以及用于各种领域的超小型部件的微加工等前沿行业开辟新路。

9. 发明公开

EP0731490A3 Ultra-fine microfabrication method using an energy beam 失效
标题翻译：使用的能量束的超细微细加工方法
公开(公告)号：EP0731490A3
公开(公告)日：1998-03-11
申请号：EP96102976.6
申请日：1996-02-28
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Hatamura, Yotaro
IPC分类号： H01L21/033 , G03F7/00
CPC分类号： H01L21/3086 , G03F7/00 , G03F7/001 , G03F7/2065 , G03F7/70358 , H01J9/025 , H01J2209/0223 , H01L21/0331 , H01L21/0337
摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micronmeter sized micro-particles to produce a variety of three-dimensional fine-structures which have not been possible to produce by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of energy beam and shielding is combined with a shield positioning technique using magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particles beams or solutions, fine-structures of very high aspect ratios can be produced with precision. Applications of devices having the fine-structure produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

10. 发明公开

EP0735564A3 Micro-processing apparatus and method therefor 失效
标题翻译：微机械加工的装置和方法
公开(公告)号：EP0735564A3
公开(公告)日：1998-01-14
申请号：EP96105077.0
申请日：1996-03-29
申请人： EBARA CORPORATION , Hatamura, Yotaro
发明人： Hatakeyama, Masahiro , Ichiki, Katsunori , Kato, Takao , Kajiyama, Masaaki , Tsuzuki, Takashi , Hatamura, Yotaro , Nakao, Masayuki
IPC分类号： H01J37/30 , H01J37/20
CPC分类号： H01J37/3005 , H01J37/20
摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while observing the progress of work in real-time under at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions, thus offering a spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to demonstrate the production of micron-sized parts for use in advanced applications of optical and electronic devices.

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