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1. 发明公开

EP2513686A1 REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY 有权
标题翻译： OPTISCHES REFLEXIONSELEMENTFÜREUV-LITHOGRAPHIE
公开(公告)号：EP2513686A1
公开(公告)日：2012-10-24
申请号：EP10796337.3
申请日：2010-12-13
申请人： Carl Zeiss SMT GmbH
发明人： WEBER, Jörn
IPC分类号： G02B5/08 , G03F7/20
CPC分类号： G02B5/0891 , B82Y30/00 , G02B1/10 , G02B1/105 , G02B1/14 , G02B5/0816 , G03F7/70233 , G03F7/70316 , G03F7/70958
摘要： A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system (4) of at least two alternating materials (41, 42) having different real parts of the refractive index at the working wavelength on a substrate (2), which exerts a layer stress on the substrate (2), and comprising a second multilayer system (6) of at least two alternating materials (61, 62) on a substrate (2), which exerts an opposed layer stress on the substrate (2) and is arranged between the first multilayer system (4) and the substrate (2), wherein a first (61) of the at least two materials of the second multilayer system (6) is interrupted by layers (62) having a thickness of up to 1 nm of the at least one further material of the second multilayer system (6) at such distances that the first material is present in an amorphous state.
摘要翻译：用于在软X射线和极紫外波长范围内的工作波长的应力减小反射光学元件包括：至少两个交替材料（41,42）的第一多层体系（4），其具有不同的实部折射率衬底（2）上的工作波长，其在衬底（2）上施加层应力，并且包括在衬底（2）上的至少两个交替材料（61,62）的第二多层系统（6），其中在所述基板（2）上施加相对的层应力，并且布置在所述第一多层体系（4）和所述基板（2）之间，其中所述第二多层体系（6）的所述至少两种材料中的第一（61）由第二层叠系统（6）的至少一种其它材料的厚度高达1nm的层（62）以这样的距离间隔使第一材料以非晶状态存在。

2. 发明公开

EP3449291A1 OPTISCHES ELEMENT UND OPTISCHE ANORDNUNG DAMIT 有权
公开(公告)号：EP3449291A1
公开(公告)日：2019-03-06
申请号：EP17714188.4
申请日：2017-03-28
申请人： Carl Zeiss SMT GmbH
发明人： GRASSE, Christian , DIER, Oliver , WEBER, Jörn , WINTER, Ralf
IPC分类号： G02B1/16 , G21K1/06 , G02B5/08 , G03F7/20

3. 发明公开

EP3323019A1 VERFAHREN ZUM HERSTELLEN EINES SPIEGELS, INSBESONDERE FÜR EINE MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE 有权
公开(公告)号：EP3323019A1
公开(公告)日：2018-05-23
申请号：EP16734227.8
申请日：2016-06-22
申请人： Carl Zeiss SMT GmbH
发明人： DIER, Oliver , GRASSE, Christian , WEBER, Jörn , SIX, Stephan
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70316 , G03F7/70958 , G21K1/062
摘要： The invention relates to a method for producing a mirror and to a mirror, in particular for a microlithographic projection exposure apparatus. In a method according to the invention, a mirror substrate is coated in a coating apparatus by applying a predefined layer structure for achieving a predefined target layer thickness profile of the mirror, wherein the method comprises the following steps: visually subdividing the predefined layer structure into at least two layer systems (610, 710, 620, 720, 730), and coating the mirror substrate (605, 705) by applying the at least two layer systems with different individual target layer thickness profiles being provided for said layer systems, wherein said individual target layer thickness profiles are chosen such that each of the deviations of the individual target layer thickness profiles from the predefined target layer thickness profile at least partially compensates in the contribution thereof to the wavefront effect of the mirror.

4. 发明授权

EP3449291B1 OPTISCHES ELEMENT UND OPTISCHE ANORDNUNG DAMIT 有权
公开(公告)号：EP3449291B1
公开(公告)日：2020-09-16
申请号：EP17714188.4
申请日：2017-03-28
申请人： Carl Zeiss SMT GmbH
发明人： GRASSE, Christian , DIER, Oliver , WEBER, Jörn , WINTER, Ralf
IPC分类号： G02B1/16 , G21K1/06 , G02B5/08 , G03F7/20

5. 发明授权

EP2513686B1 REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY 有权
公开(公告)号：EP2513686B1
公开(公告)日：2019-04-10
申请号：EP10796337.3
申请日：2010-12-13
申请人： Carl Zeiss SMT GmbH
发明人： WEBER, Jörn
IPC分类号： G02B5/08 , G03F7/20

6. 发明公开

EP3438744A1 METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELENGTH RANGE, METHOD FOR PRODUCING SAME, AND TREATING APPARATUS 有权
公开(公告)号：EP3438744A1
公开(公告)日：2019-02-06
申请号：EP18183568.7
申请日：2018-07-13
申请人： Carl Zeiss SMT GmbH
发明人： GRASSE, Christian , HERMANN, Martin , SIX, Stephan , WEBER, Jörn , WINTER, Ralf , DIER, Oliver , SHKLOVER, Vitaliy , HILD, Kerstin , STROBEL, Sebastian
IPC分类号： G03F1/24 , G03F1/52 , G02B5/08 , G02B1/12 , G21K1/06
摘要： A method and an apparatus for treating a reflective optical element (104) for the EUV wavelength range comprising a reflective coating on a substrate is proposed, wherein the reflective optical element (104) in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 µs and 1 s, wherein irradiation is carried out by means of at least one radiation source (102) and the at least one radiation source (102) and the reflective optical element (104) perform a relative movement with respect to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or EUV inspection of masks or wafers, for example.

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