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1. 发明公开

EP2580626A1 OPTICAL SYSTEM 审中-公开
标题翻译：光学系统
公开(公告)号：EP2580626A1
公开(公告)日：2013-04-17
申请号：EP11726128.9
申请日：2011-06-14
申请人： Carl Zeiss SMT GmbH
发明人： EHM, Dirk Heinrich , WEISS, Markus , ZACZEK, Christoph , HACKL, Tobias , SEITZ, Wolfgang
IPC分类号： G03F7/20
CPC分类号： G21K5/04 , G03F7/70233 , G03F7/70916
摘要： To prevent reflective optical elements (2) for EUV lithography from getting electrically charged as they are irradiated with EUV radiation (4), an optical system for EUV lithography is proposed, comprising a reflective optical element (2), including a substrate (21) with a highly reflective coating (22) emitting secondary electrons when irradiated with EUV radiation (4), and a source (3) of electrically charged particles, which is arranged in such a manner that electrically charged particles can be applied to the reflective optical element (2), wherein the source (3) is a flood gun applying electrons to the reflective optical element (2) as only means for charge carrier compensation.
摘要翻译：为了防止用于EUV光刻的反射光学元件（2）在被EUV辐射（4）照射时被带电，提出了一种用于EUV光刻的光学系统，其包括反射光学元件（2），其包括衬底（21）具有当用EUV辐射（4）照射时发射二次电子的高反射涂层（22）和带电粒子的源（3），其以这样的方式排列，使得可以将带电粒子施加到反射光学元件（2），其中所述源（3）是作为用于电荷载流子补偿的唯一装置将电子施加到所述反射光学元件（2）的泛光枪。

2. 发明授权

EP3014316B1 SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING 有权
公开(公告)号：EP3014316B1
公开(公告)日：2019-11-13
申请号：EP14729020.9
申请日：2014-06-11
申请人： Carl Zeiss SMT GmbH
发明人： DIER, Oliver , HACKL, Tobias , STICKEL, Franz-Josef , LÖRING, Ulrich , AßMUS, Tilmann , MÜLLER, Jürgen , KAMENOV, Vladimir , RENNON, Siegfried
IPC分类号： G02B5/08 , G21K1/06

3. 发明公开

EP3014316A1 SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING 有权
标题翻译：去耦涂层反射镜表面校正
公开(公告)号：EP3014316A1
公开(公告)日：2016-05-04
申请号：EP14729020.9
申请日：2014-06-11
申请人： Carl Zeiss SMT GmbH
发明人： DIER, Oliver , HACKL, Tobias , STICKEL, Franz-Josef , LÖRING, Ulrich , AßMUS, Tilmann , MÜLLER, Jürgen , KAMENOV, Vladimir , RENNON, Siegfried
IPC分类号： G02B5/08 , G21K1/06
摘要： A mirror (1) for EUV lithography includes a substrate (2) and a reflective coating (3, 4). The reflective coating has a first group (3) of layers (3a, 3b) and a second group (4) of layers (4a, 4b), wherein the first group and second group of layers (3a, 3b; 4a, 4b) reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating (6) is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer (5) having a layer thickness variation for correcting the surface form of the mirror.

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