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1. 发明授权

EP2388119B1 An imprint lithography process 有权转让
标题翻译：印刷光刻工艺
公开(公告)号：EP2388119B1
公开(公告)日：2016-09-07
申请号：EP11176056.7
申请日：2003-07-10
申请人： Canon Nanotechnologies, Inc. , Molecular Imprints, Inc.
发明人： Choi, Byung, Jin , Sreenivasan, Sidlgata V. , Watts, Michael, P.C. , Schumaker, Norman, E. , Voisin, Ronald, D. , Meissl, Mario J. , Bonnecaze, Roger , Willson, C., Grant
IPC分类号： B29C33/42 , B29C33/60 , B29C35/08 , B29C35/12 , B29C41/02 , B29C59/02 , B29C59/16
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002

2. 发明授权

EP2261280B1 Process for imprint lithography 有权转让
标题翻译：一种压印光刻工艺
公开(公告)号：EP2261280B1
公开(公告)日：2014-10-08
申请号：EP10181754.2
申请日：2005-02-14
申请人： Canon Nanotechnologies, Inc. , Molecular Imprints, Inc. , Board of Regents, The University of Texas System
发明人： Xu, Frank Y. , Watts, Michael, P.C. , Stacey, Nicholas A.
IPC分类号： C08K5/54
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/101

3. 发明公开

EP2261966A3 A chucking system to hold a substrate and a lithographic system including the chucking system 有权
标题翻译：用于保持衬底和光刻系统具有夹紧系统的夹紧系统
公开(公告)号：EP2261966A3
公开(公告)日：2010-12-29
申请号：EP10183090.9
申请日：2003-11-12
申请人： MOLECULAR IMPRINTS, INC.
发明人： Choi, Byung, Jin , Voisin, Ronald, D. , Sreenivasan, Sidlgata, V. , Watts, Michael, P.C. , Babbs, Daniel, A. , Meissl, Mario J. , Bailey, Hillman, L. , Schumaker, Norman, E.
IPC分类号： H01L21/68 , B25B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/62 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L21/68714 , H01L21/68735
摘要： A chucking system to hold a substrate, said chucking system comprising: a chuck body (42) having first and second opposed sides (46, 48) with an edge surface (50) extending therebetween, said first side (46) including first and second spaced-apart recesses (52, 54) defining first and second spaced-apart support regions (58, 60), with said first support region (58) cincturing said second support region (60) and said first and second recesses (52, 54), and said second support region (60) cincturing said second recess (54), with a portion (62) of said chuck body (42) in superimposition with said second recess (54) being transparent to actinic radiation having a predetermined wavelength, said portion extending from said second side (48) and terminating proximate to said second recess (54), said second side and said edge surface defining exterior surfaces, with said chuck body (42) including a throughway (64, 66) extending through said chuck body placing one of said first and second recesses (52, 54) in fluid communication with one of said exterior surfaces.

4. 发明公开

EP2388119A1 An imprint lithography process 有权转让
标题翻译： Drucklithographieverfahren
公开(公告)号：EP2388119A1
公开(公告)日：2011-11-23
申请号：EP11176056.7
申请日：2003-07-10
申请人： Molecular Imprints, Inc.
发明人： Choi, Byung, Jin , Sreenivasan, Sidlgata V. , Watts, Michael, P.C. , Schumaker, Norman, E. , Voisin, Ronald, D. , Meissl, Mario J. , Bonnecaze, ROGER , Willson, C., Grant
IPC分类号： B29C33/42 , B29C33/60 , B29C35/08 , B29C35/12 , B29C41/02 , B29C59/02 , B29C59/16
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography process using a template (12) which includes a lower surface (566) with first recesses (562) having a first height (h1) and second recesses (564) having a second height (h2) greater than first height (h1) of first recesses, wherein curable liquid (40) is disposed in superimposition with the portions of template having recesses therein that are no greater than first height (h1) and is absent with respect to portions of template (12) having second height (h2).
摘要翻译：使用模板（12）的压印光刻工艺，其包括具有第一凹部（562）的下表面（566），所述第一凹部具有第一高度（h1）和具有大于第一高度（h1）的第二高度（h2）的第二凹部），其中可固化液体（40）与其中具有不大于第一高度（h1）的凹部的模板部分重叠设置，并且相对于具有第二高度（h2）的模板（12）的部分不存在）。

5. 发明公开

EP2272594A1 Imprint lithography method and imprint lithography system that minimize oxygen inhibition of polymerization 审中-公开
标题翻译： Verfahren und System bei Imprint-Lithographie zurDämpfungder Sauerstoffhemmung bei der Polymerisierung
公开(公告)号：EP2272594A1
公开(公告)日：2011-01-12
申请号：EP10189201.6
申请日：2005-09-13
申请人： Molecular Imprints, Inc.
发明人： Xu, Frank Y. , Fetcher, Edward, B. , Lad, Pankaj, B. , Watts, Michael, P.C.
IPC分类号： B05D3/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention includes a method and a system for solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia , an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerization process.
摘要翻译：本发明包括固化可聚合液体以在基材上形成薄膜的方法和系统，其特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生另外的自由基以促进聚合过程。

6. 发明授权

EP2099066B1 Method for modulating shapes of substrates 有权
标题翻译：一种用于形成基板，以调节方法
公开(公告)号：EP2099066B1
公开(公告)日：2012-01-04
申请号：EP09163924.5
申请日：2003-11-12
申请人： MOLECULAR IMPRINTS, INC.
发明人： Choi, Byung-Jin , Voisin, Ronald, D. , Sreenivasan, Sidlgata, V. , Watts, Michael, P.C. , Babbs, Daniel, A. , Meissl, Mario, J. , Bailey, Hillman, L. , Schumaker, Norman, E.
IPC分类号： H01L21/68 , B25B11/00 , G03F7/00 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/62 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L21/68714 , H01L21/68735

7. 发明公开

EP2261966A2 A chucking system to hold a substrate and a lithographic system including the chucking system 有权
标题翻译： Ein Lithographiesystem mit einem Halterungssystem
公开(公告)号：EP2261966A2
公开(公告)日：2010-12-15
申请号：EP10183090.9
申请日：2003-11-12
申请人： MOLECULAR IMPRINTS, INC.
发明人： Choi, Byung, Jin , Voisin, Ronald, D. , Sreenivasan, Sidlgata, V. , Watts, Michael, P.C. , Babbs, Daniel, A. , Meissl, Mario J. , Bailey, Hillman, L. , Schumaker, Norman, E.
IPC分类号： H01L21/68 , B25B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/62 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L21/68714 , H01L21/68735
摘要： A chucking system to hold a substrate, said chucking system comprising: a chuck body (42) having first and second opposed sides (46, 48) with an edge surface (50) extending therebetween, said first side (46) including first and second spaced-apart recesses (52, 54) defining first and second spaced-apart support regions (58, 60), with said first support region (58) cincturing said second support region (60) and said first and second recesses (52, 54), and said second support region (60) cincturing said second recess (54), with a portion (62) of said chuck body (42) in superimposition with said second recess (54) being transparent to actinic radiation having a predetermined wavelength, said portion extending from said second side (48) and terminating proximate to said second recess (54), said second side and said edge surface defining exterior surfaces, with said chuck body (42) including a throughway (64, 66) extending through said chuck body placing one of said first and second recesses (52, 54) in fluid communication with one of said exterior surfaces.
摘要翻译：一种用于固定基板的夹紧系统，所述夹持系统包括：卡盘体，其具有在其间延伸的边缘表面（50）的第一和第二相对侧（46,48），所述第一侧（46）包括第一和第二间隔开的凹口（52,54）限定第一和第二间隔开的支撑区域（58,60），所述第一支撑区域（58）使所述第二支撑区域（60）和所述第一和第二凹陷（52,54）），并且所述第二支撑区域（60）使所述第二凹部（54）成像，所述卡盘体（42）与所述第二凹部（54）重叠的部分（62）对于具有预定波长的光化辐射是透明的，所述部分从所述第二侧面（48）延伸并且靠近所述第二凹部（54）终止，所述第二侧面和所述边缘表面限定外表面，所述卡盘主体（42）包括延伸穿过所述第二凹槽（54）的通道（64,66）卡盘体放置所述第一和第二凹陷中的一个 s（52,54）与所述外表面之一流体连通。

8. 发明授权

EP2261966B1 A lithographic system including a chucking system 有权
标题翻译：的平版印刷系统与安装系统
公开(公告)号：EP2261966B1
公开(公告)日：2012-03-14
申请号：EP10183090.9
申请日：2003-11-12
申请人： MOLECULAR IMPRINTS, INC.
发明人： Choi, Byung, Jin , Voisin, Ronald, D. , Sreenivasan, Sidlgata, V. , Watts, Michael, P.C. , Babbs, Daniel, A. , Meissl, Mario J. , Bailey, Hillman, L. , Schumaker, Norman, E.
IPC分类号： H01L21/68 , B25B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/62 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L21/68714 , H01L21/68735

9. 发明公开

EP2261280A1 Process for imprint lithography 有权转让
标题翻译： Verfahrenfürdie Imprint-Lithografie
公开(公告)号：EP2261280A1
公开(公告)日：2010-12-15
申请号：EP10181754.2
申请日：2005-02-14
申请人： MOLECULAR IMPRINTS, INC. , Board of Regents, The University of Texas System
发明人： Xu, Frank Y. , Watts, Michael, P.C. , Stacey, Nicholas A.
IPC分类号： C08K5/54
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/101
摘要： The present invention is directed to a process for imprint lithography using a material that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.
摘要翻译：本发明涉及一种压印光刻方法，该方法使用特征在于具有与其相关的粘度的组合物的材料，并且包括响应于刺激物的表面活性剂，可聚合组分和引发剂以响应于其而改变粘度，在液态下，具有低于约100厘泊的粘度，小于约20托的蒸气压，并且在固体固化状态下，拉伸模量大于约100MPa，断裂应力大于约3 MPa，断裂伸长率大于约2％。

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