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1. 发明公开

EP2584408A2 Imprint method and imprint apparatus 有权
标题翻译： Druckverfahren und Druckvorrichtung
公开(公告)号：EP2584408A2
公开(公告)日：2013-04-24
申请号：EP13151571.0
申请日：2008-02-05
申请人： Canon Kabushiki Kaisha
发明人： Okushima, Shingo , Suehira, Nobuhito , Seki, Junichi , Kasumi, Kazuyuki
IPC分类号： G03F7/00 , G03F9/00
摘要： An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step.
摘要翻译：用于将设置在模具上的印模图案压印到形成在基板上的图案形成层上的印记方法由通过反馈控制来实现基板和模具之间的对准的第一步骤构成; 使模具和图案形成层彼此接触的第二步骤; 固化图案形成层的第三步骤; 以及增加基板和模具之间的间隙的第四步骤。压印方法还包括停止第一步骤和第二步骤之间和/或在第二步骤和第三步骤之间的反馈控制的步骤。

2. 发明公开

EP2478830A2 Optical coherence tomographic imaging method and apparatus 审中-公开
标题翻译：光学相干断层成像方法和设备
公开(公告)号：EP2478830A2
公开(公告)日：2012-07-25
申请号：EP11189104.0
申请日：2011-11-15
申请人： Canon Kabushiki Kaisha
发明人： Suehira, Nobuhito , Matsumoto, Kazuhiro , Tomatsu, Nobuhiro
IPC分类号： A61B3/10 , A61B3/00 , A61B3/12
CPC分类号： A61B3/102
摘要： In an OCT apparatus used in ophthalmology, if a working distance between an eye to be inspected and an objective lens varies, a shape of an obtained tomographic image is changed. This means that the OCT apparatus cannot be used for examining a variation of eyeball shapes. Provided is an optical coherence tomographic imaging method, including: acquiring a first distance between the eye to be inspected and the objective lens, corresponding to first tomographic image of the eye to be inspected; and correcting the first tomographic image to be second tomographic image corresponding to a second distance between the eye to be inspected and the objective lens, which is different from the first distance.
摘要翻译：在用于眼科的OCT设备中，如果待检眼与物镜之间的工作距离变化，则所获得的断层图像的形状改变。这意味着OCT设备不能用于检查眼球形状的变化。提供了一种光学相干断层成像方法，包括：获取与待检眼的第一断层图像相对应的被检眼与物镜之间的第一距离; 并且将第一断层图像校正为与被检眼和物镜之间的第二距离相对应的第二断层图像，该第二距离不同于第一距离。

3. 发明公开

EP2073059A1 Imprint method, imprint apparatus, and process for producing chip 有权
标题翻译：压印光刻方法，用于其的装置和方法，用于制造半导体芯片
公开(公告)号：EP2073059A1
公开(公告)日：2009-06-24
申请号：EP09151853.0
申请日：2006-10-16
申请人： Canon Kabushiki Kaisha
发明人： Seki, Junichi , Suehira, Nobuhito
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B29C43/56 , B82Y10/00 , B82Y40/00
摘要： An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure.

4. 发明公开

EP1731963A3 Mold, pattern forming method, and pattern forming apparatus 有权
标题翻译：印模结构形成用于图案形成的方法和装置
公开(公告)号：EP1731963A3
公开(公告)日：2007-08-22
申请号：EP06115087.6
申请日：2006-06-07
申请人： CANON KABUSHIKI KAISHA
发明人： Suehira, Nobuhito , Seki, Junichi , Majima, Masao , Terasaki, Atsunori , Ina, Hideki
IPC分类号： G03F7/00 , G03F9/00
CPC分类号： G03F9/7084 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076
摘要： A pattern forming method for forming a pattern includes: preparing a mold 104 provided with a first surface including a pattern area 1000, a second surface located opposite from the first surface, and an alignment mark 2070 provided at a position at which the alignment mark 2070 is away from the second surface and is close to the first surface; contacting the pattern area 1000 of the mold 104 with the coating material disposed on a substrate 5000; obtaining information about positions of the mold 104 and the substrate 5000 by using the alignment mark 2070 and a mark 5300 provided to the substrate 5000 in a state in which the coating material is disposed on the substrate 5000 at a portion where the alignment mark 2070 and the substrate 5000 are opposite to each other; and effecting alignment of the substrate 5000 with the mold 104 with high accuracy on the basis of the information.

5. 发明授权

EP1847875B1 Pattern transfer apparatus, imprint apparatus, and pattern transfer method 有权
标题翻译：图案转印设备，打印设备和图案转移过程
公开(公告)号：EP1847875B1
公开(公告)日：2012-07-18
申请号：EP07106423.2
申请日：2007-04-18
申请人： Canon Kabushiki Kaisha
发明人： Suehira, Nobuhito , Seki, Junichi , Ina, Hideki , Sentoku, Koichi
IPC分类号： G03F7/00 , G03F9/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088

6. 发明授权

EP1760526B1 Mold, imprint method, and process for producing chip 有权
标题翻译：压花模，压印光刻工艺和方法，用于生产芯片
公开(公告)号：EP1760526B1
公开(公告)日：2011-06-15
申请号：EP06120128.1
申请日：2006-09-05
申请人： CANON KABUSHIKI KAISHA
发明人： Okushima, Shingo , Terasaki, Atsunori , Ina, Hideki , Suehira, Nobuhito , Seki, Junichi
IPC分类号： G03F7/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042

7. 发明公开

EP2226608A1 Optical coherence tomography method and optical coherence tomography apparatus 有权
标题翻译：光学相干断层扫描方法和光学相干断层扫描仪
公开(公告)号：EP2226608A1
公开(公告)日：2010-09-08
申请号：EP10152652.3
申请日：2010-02-04
申请人： Canon Kabushiki Kaisha
发明人： Suehira, Nobuhito
IPC分类号： G01B9/02 , A61B3/12 , G01N21/47
CPC分类号： G01B9/02044 , A61B3/102 , G01B9/02063 , G01B9/02078 , G01B9/02085 , G01B9/02091
摘要： An optical coherence tomography method according to the present invention comprising the steps of dividing an object to be measured into a plurality of measurement regions adjacent to one another in a direction of irradiation of a measurement light, and acquiring a measurement image for every measurement region based on a wavelength spectrum of a coherent light and acquiring a tomographic image for every measurement region by removing a mirror image of a tomographic image of an adj acent region being adjacent to the measurement region of the measurement image from the measurement image.
摘要翻译：根据本发明的光学相干断层成像方法包括以下步骤：将测量对象分割成在测量光的照射方向上彼此相邻的多个测量区域，并且基于每个测量区域获取测量图像通过从测量图像中去除与测量图像的测量区域相邻的相邻区域的断层图像的镜像，从而针对每个测量区域获取断层图像。

8. 发明公开

EP2090928A3 Imprint apparatus, imprint method, and mold for imprint 审中-公开
标题翻译：打印装置，打印方法和打印形式
公开(公告)号：EP2090928A3
公开(公告)日：2009-11-04
申请号：EP09159207.1
申请日：2006-10-18
申请人： Canon Kabushiki Kaisha
发明人： Suehira, Nobuhito , Seki, Junichi , Ina, Hideki
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate comprises a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light, an optical system for guiding the light from said light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope and a spectroscope for dispersing the reflected lights guided by said optical system into a spectrum. Furthermore, it comprises an image sensor for observing the light dispersed by said spectroscope, an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate on the basis of information obtained by said image sensor, characterized in that said analyzer is adapted to analyze a first distance as a distance between the surface of the mold and a surface formed at a position away from the surface of the mold on the basis of information obtained from lights emitted from said light source and reflected by the surface of the mold and the surface formed at the position away from the surface of the mold. In addition, said analyzer is adapted to analyze a second distance as a distance between the surface formed at the position away from the surface of the mold and the surface of the substrate on the basis of information obtained from lights emitted from said light source and reflected by the surface formed at the position away from the surface of the mold and the surface of the substrate. Moreover, said analyzer is adapted to calculate the distance between the surface of the mold and the surface of the substrate by subtracting the first distance from the second distance.

9. 发明授权

EP1795959B1 Imprint method, imprint apparatus, and process for producing chip 有权转让
标题翻译：压印光刻方法，用于其的装置和方法，用于制造半导体芯片
公开(公告)号：EP1795959B1
公开(公告)日：2009-06-03
申请号：EP06122371.5
申请日：2006-10-16
申请人： CANON KABUSHIKI KAISHA
发明人： Seki, Junichi , Suehira, Nobuhito
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B29C43/56 , B82Y10/00 , B82Y40/00

10. 发明授权

EP2584408B1 Imprint method and imprint apparatus 有权
公开(公告)号：EP2584408B1
公开(公告)日：2020-10-07
申请号：EP13151571.0
申请日：2008-02-05
申请人： Canon Kabushiki Kaisha
发明人： Okushima, Shingo , Suehira, Nobuhito , Seki, Junichi , Kasumi, Kazuyuki
IPC分类号： G03F9/00 , G03F7/00 , B82Y40/00 , B82Y10/00

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