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1. 发明授权

EP0548944B1 Chemical vapor deposition apparatus making use of liquid starting material 失效
标题翻译：用于化学沉积从气相下为液体的原料使用的装置
公开(公告)号：EP0548944B1
公开(公告)日：1999-08-04
申请号：EP92121888.9
申请日：1992-12-23
申请人： CANON KABUSHIKI KAISHA
发明人： Hayakawa, Yukihiro, c/o Canon Kabushiki Kaisha , Kawasumi, Yasushi, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha , Kataoka, Yuzo, c/o Canon Kabushiki Kaisha
IPC分类号： C23C16/44 , C23C16/18
CPC分类号： C23C16/4557 , C23C16/20 , C23C16/4481 , C23C16/4485 , C23C16/452 , Y10S438/935

2. 发明公开

EP0750990A3 Liquid ejecting printing head, production method thereof and production method for base body employed for liquid ejecting printing head 失效
标题翻译：打印流体喷射头，一个基体的这样的打印头及其制造方法和制造方法
公开(公告)号：EP0750990A3
公开(公告)日：1998-04-01
申请号：EP96110391.8
申请日：1996-06-27
申请人： CANON KABUSHIKI KAISHA
发明人： Kubota, Masahiko, c/o Canon Kabushiki Kaisha , Sugitani, Hiroshi, c/o Canon Kabushiki Kaisha , Matsumoto, Shigeyuki, c/o Canon Kabushiki Kaisha , Ikeda, Masami, c/o Canon Kabushiki Kaisha , Naruse, Yasuhiro, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha , Ozaki, Teruo, c/o Canon Kabushiki Kaisha , Izumida, Masaaki , Tamura, Seiichi, c/o Canon Kabushiki Kaisha
IPC分类号： B41J2/14 , B41J2/16
CPC分类号： B41J2/1642 , B41J2/14129 , B41J2/1604 , B41J2/1631 , B41J2/1646 , B41J2202/13
摘要： A printing head is intended to achieve high reliability and a production method of the printing head is intended to achieve high yield at low cost. A liquid ejecting printing head employs a base body, in which an electrothermal transducer element, a driving functional element for driving the electrothermal transducer element, a wiring electrode connecting between the electrothermal transducer element and the driving functional element, an insulation layer provided on the wiring electrode are formed on a substrate (100). The electrothermal transducer element has a heat generating resistor (108) formed of a material selected from a group consisting TaN, HfB 2 , Poly-Si,Ta-Al, Ta-Ir, Au and Ag. A protective layer (106) above the heat generating body is formed of an insulative compound deposited to be low density to high density in order. The protective layer (106) is formed by depositing the insulative material in the electrothermal transducer element or the wiring electrode with elevating the temperature of the base body from low temperature to high temperature.

3. 发明公开

EP0750990A2 Liquid ejecting printing head, production method thereof and production method for base body employed for liquid ejecting printing head 失效
标题翻译：打印流体喷射头，一个基体的这样的打印头及其制造方法和制造方法
公开(公告)号：EP0750990A2
公开(公告)日：1997-01-02
申请号：EP96110391.8
申请日：1996-06-27
申请人： CANON KABUSHIKI KAISHA
发明人： Kubota, Masahiko, c/o Canon Kabushiki Kaisha , Sugitani, Hiroshi, c/o Canon Kabushiki Kaisha , Matsumoto, Shigeyuki, c/o Canon Kabushiki Kaisha , Ikeda, Masami, c/o Canon Kabushiki Kaisha , Naruse, Yasuhiro, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha , Ozaki, Teruo, c/o Canon Kabushiki Kaisha , Izumida, Masaaki , Tamura, Seiichi, c/o Canon Kabushiki Kaisha
IPC分类号： B41J2/14 , B41J2/16
CPC分类号： B41J2/1642 , B41J2/14129 , B41J2/1604 , B41J2/1631 , B41J2/1646 , B41J2202/13
摘要： A printing head is intended to achieve high reliability and a production method of the printing head is intended to achieve high yield at low cost. A liquid ejecting printing head employs a base body, in which an electrothermal transducer element, a driving functional element for driving the electrothermal transducer element, a wiring electrode connecting between the electrothermal transducer element and the driving functional element, an insulation layer provided on the wiring electrode are formed on a substrate (100). The electrothermal transducer element has a heat generating resistor (108) formed of a material selected from a group consisting TaN, HfB 2 , Poly-Si,Ta-Al, Ta-Ir, Au and Ag. A protective layer (106) above the heat generating body is formed of an insulative compound deposited to be low density to high density in order. The protective layer (106) is formed by depositing the insulative material in the electrothermal transducer element or the wiring electrode with elevating the temperature of the base body from low temperature to high temperature.
摘要翻译：的打印头的目的是实现高可靠性和打印头的制造方法的目的是实现低成本高收率。一种液体喷射记录头使用的基体，在电热换能器元件，用于驱动电热换能器元件的驱动功能元件的哪一个，设置在布线的布线电极的电热换能器元件和驱动功能元件之间的连接，以绝缘层形成的电极是在基板（100）上。电热换能器元件形成了从一组由TaN，HFB 2，多晶硅，钽 - 铝，钽，铱，Au和Ag中选择的材料制成的发热电阻器（108）。发热体上方的保护层（106）被形成沉积以低密度到高密度，以便绝缘化合物。所述保护层（106）是通过在电热换能器元件或与来自低温升降基体的温度升高到高温下的布线电极上沉积所述绝缘材料形成。

4. 发明公开

EP0548990A3 Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practising said method 失效
标题翻译：使用液体原料形成沉积膜的化学蒸气沉积方法和适用于实施方法的装置
公开(公告)号：EP0548990A3
公开(公告)日：1993-09-01
申请号：EP92122039.8
申请日：1992-12-28
申请人： CANON KABUSHIKI KAISHA
发明人： Asaba, Tetsuo, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha
IPC分类号： C23C16/44 , C23C16/18 , C23C16/20 , C23C16/40
CPC分类号： C23C16/402 , C23C16/18 , C23C16/4486
摘要： A chemical vapor deposition method for forming a deposited film on a substrate using a film-forming liquid raw material (A) in which said film-forming liquid raw material is pulverizing into liquid fine particles and said liquid fine particles are heated together with a gas to produce a film-forming raw material gas; said film-forming raw material gas is introduced into a reaction chamber (106); and said film-forming raw material gas is chemically reacted with a surface of a substrate (108) disposed in said reaction chamber. A chemical vapor deposition apparatus suitable for practicing said chemical vapor deposition method, characterized by a liquid pulverizing mechanism capable of pulverizing a film-forming liquid raw material into liquid fine particles while precisely adjusting the amount of the film-forming liquid raw material to be supplied thereinto and a liquid gasifying mechanism capable of efficiently gasifying the liquid fine particles to produce a film-forming raw material gas into a reaction chamber (106) in which a deposited film is to be formed on a substrate (108).

5. 发明授权

EP0548990B1 Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practising said method 失效
标题翻译：通过CVD来制造的沉积层的过程中，采用液体原料加合适的装置
公开(公告)号：EP0548990B1
公开(公告)日：1997-03-12
申请号：EP92122039.8
申请日：1992-12-28
申请人： CANON KABUSHIKI KAISHA
发明人： Asaba, Tetsuo, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha
IPC分类号： C23C16/44 , C23C16/18 , C23C16/20 , C23C16/40
CPC分类号： C23C16/402 , C23C16/18 , C23C16/4486

6. 发明公开

EP0548990A2 Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practising said method 失效
标题翻译：通过CVD来制造的沉积层的过程中，采用液体原料加一个合适的装置。
公开(公告)号：EP0548990A2
公开(公告)日：1993-06-30
申请号：EP92122039.8
申请日：1992-12-28
申请人： CANON KABUSHIKI KAISHA
发明人： Asaba, Tetsuo, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha
IPC分类号： C23C16/44 , C23C16/18 , C23C16/20 , C23C16/40
CPC分类号： C23C16/402 , C23C16/18 , C23C16/4486
摘要： A chemical vapor deposition method for forming a deposited film on a substrate using a film-forming liquid raw material (A) in which said film-forming liquid raw material is pulverizing into liquid fine particles and said liquid fine particles are heated together with a gas to produce a film-forming raw material gas; said film-forming raw material gas is introduced into a reaction chamber (106); and said film-forming raw material gas is chemically reacted with a surface of a substrate (108) disposed in said reaction chamber.
A chemical vapor deposition apparatus suitable for practicing said chemical vapor deposition method, characterized by a liquid pulverizing mechanism capable of pulverizing a film-forming liquid raw material into liquid fine particles while precisely adjusting the amount of the film-forming liquid raw material to be supplied thereinto and a liquid gasifying mechanism capable of efficiently gasifying the liquid fine particles to produce a film-forming raw material gas into a reaction chamber (106) in which a deposited film is to be formed on a substrate (108).
摘要翻译：用于使用在所述薄膜形成用原料液的成膜原料液上的衬底形成淀积电影A的化学气相沉积法被粉碎成液体微粒和所述液体微粒与产生的气体一起加热膜形成原料气体; 所述膜形成原料气体引入到反应室中; 和Said成膜原料气体进行化学与所述反应室设置在基板的表面反应。适用于实施所述化学气相沉积法的化学气相沉积装置中，通过能够粉碎成膜液体原料变成液态微粒而精确地调整成膜液体原料的量的液体粉碎机构的特征在于将被供应其中，并能够有效地气化所述液态微粒，以产生膜形成原料气体引入反应室中，其中，沉积的电影是在基板中形成的液体气化机构。

7. 发明公开

EP0548944A1 Chemical vapor deposition method and apparatus making use of liquid starting material 失效
标题翻译：用于从汽相下使用液体原料的化学沉积方法和设备。
公开(公告)号：EP0548944A1
公开(公告)日：1993-06-30
申请号：EP92121888.9
申请日：1992-12-23
申请人： CANON KABUSHIKI KAISHA
发明人： Hayakawa, Yukihiro, c/o Canon Kabushiki Kaisha , Kawasumi, Yasushi, c/o Canon Kabushiki Kaisha , Makino, Kenji, c/o Canon Kabushiki Kaisha , Kataoka, Yuzo, c/o Canon Kabushiki Kaisha
IPC分类号： C23C16/44 , C23C16/18
CPC分类号： C23C16/4557 , C23C16/20 , C23C16/4481 , C23C16/4485 , C23C16/452 , Y10S438/935
摘要： A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.
摘要翻译：用于从液体中形成的气态原料起始原料和气态原料送入CVD装置，包括一个反应室的原料气供给装置; 容器确实保持液体原料，减压装置，用于降低所述容器内的压力，和加热装置，用于加热开始在容器保持材料的液体; 煮沸的液体起始材料。

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