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1. 发明授权

EP2991121B1 ARRAY SUBSTRATE, METHOD FOR MANUFACTURING ARRAY SUBSTRATE AND DISPLAY DEVICE 有权
公开(公告)号：EP2991121B1
公开(公告)日：2020-04-01
申请号：EP13856064.4
申请日：2013-10-31
申请人： BOE Technology Group Co., Ltd.
发明人： KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol , CHOI, Seungjin
IPC分类号： H01L29/786 , H01L27/12 , G02F1/1362 , G02F1/1368

2. 发明公开

EP2991121A1 ARRAY SUBSTRATE, METHOD FOR MANUFACTURING ARRAY SUBSTRATE AND DISPLAY DEVICE 有权
标题翻译： ARRAYSUBSTRAT，VERFAHREN ZUR HERSTELLUNG EINES ARRAYSUBSTRATS UND ANZEIGEVORRICHTUNG DAMIT
公开(公告)号：EP2991121A1
公开(公告)日：2016-03-02
申请号：EP13856064.4
申请日：2013-10-31
申请人： BOE Technology Group Co., Ltd.
发明人： KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol , CHOI, Seungjin
IPC分类号： H01L29/786 , H01L27/12 , H01L21/77 , G02F1/1362 , G02F1/1368
CPC分类号： H01L27/124 , G02F1/1362 , G02F1/136227 , G02F1/1368 , G02F2201/40 , H01L21/283 , H01L21/32133 , H01L21/76802 , H01L23/3171 , H01L27/1248 , H01L27/1259 , H01L27/1288 , H01L29/1033 , H01L29/41733 , H01L29/4175 , H01L29/66765 , H01L29/78696 , H01L2924/0002 , H01L2924/00
摘要： An array substrate, a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a plurality of data lines (16), formed on the substrate and extending in a first direction; a plurality of gate lines (15), formed on the substrate (1), crossing the plurality of data lines (15), and extending in a second direction perpendicular to the first direction; a plurality of pixel regions, defined by the plurality of gate lines (15) and the plurality of data lines (15) crossing each other and arranged in a matrix form, wherein each of the pixel regions is provided with a thin film transistor and a pixel electrode (12), wherein, the thin film transistor comprises: a gate electrode (2), connected with one of the plurality of gate lines (15); a gate insulating layer (3), provided above the gate line (15) and the gate electrode (2); an active layer (5), formed on the gate insulating layer (3) and disposed corresponding to the gate electrode (2); a drain electrode (8) and a source electrode (9), disposed opposite to each other above the active layer (5) and having a channel region of the thin film transistor therebetween; a filling layer (4), provided between the gate electrode (2) and the gate line (15) connected with the gate electrode, and the drain and source electrodes (8) and (9); and a passivation layer (10), provided on the source electrode (9), the drain electrode (8) and the active layer (5), wherein at a position directly facing the gate line (15), the passivation layer (10) is provided with a passivation layer through hole (11) configured to perform a connection between the drain electrode (8) and the pixel electrode (12).
摘要翻译：提供阵列基板，其制造方法和显示装置，并且阵列基板包括：基板（1）; 多个数据线（16），形成在所述基板上并沿第一方向延伸; 形成在所述基板（1）上的与所述多条数据线（15）交叉并沿垂直于所述第一方向的第二方向延伸的多条栅极线（15）由多个栅极线（15）和多个数据线（15）限定的多个像素区域彼此交叉并以矩阵形式布置，其中每个像素区域设置有薄膜晶体管和像素电极（12），其中，所述薄膜晶体管包括：栅电极（2），与所述多条栅极线（15）之一连接; 栅极绝缘层（3），设置在栅极线（15）和栅电极（2）之上; 形成在所述栅极绝缘层（3）上并与所述栅电极（2）对应设置的有源层（5）; 漏电极（8）和源电极（9），其在有源层（5）上方相对设置并且在其间具有薄膜晶体管的沟道区域; 设置在与栅电极连接的栅电极（2）和栅极线（15）之间的填充层（4）以及漏极和源电极（8）和（9）; 以及设置在源电极（9），漏电极（8）和有源层（5）上的钝化层（10），其中在直接面对栅极线（15）的位置处，钝化层（10）设置有被配置为执行漏电极（8）和像素电极（12）之间的连接的钝化层通孔（11）。

3. 发明授权

EP2975642B1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS 有权
公开(公告)号：EP2975642B1
公开(公告)日：2020-05-06
申请号：EP13857663.2
申请日：2013-10-12
申请人： BOE Technology Group Co., Ltd.
发明人： CHOI, Seungjin , YOO, Seongyeol , SONG, Youngsuk
IPC分类号： H01L27/12 , G02F1/1368 , G02F1/1343 , G03F7/00 , H01L29/786 , H01L29/423 , H01L29/49 , G02F1/1333

4. 发明公开

EP2876676A1 MANUFACTURING METHOD OF ARRAY SUBSTRATE AND ARRAY SUBSTRATE AND DISPLAY DEVICE 有权
标题翻译： VERFAHREN ZUR HERSTELLUNG EINES ARRAYSUBSTRATS SOWIE ARRAYSUBSTRAT UND ANZEIGEVORRICHTUNG
公开(公告)号：EP2876676A1
公开(公告)日：2015-05-27
申请号：EP12861051.6
申请日：2012-12-13
申请人： BOE Technology Group Co., Ltd.
发明人： CHOI, Seungjin , KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol
IPC分类号： H01L21/77
CPC分类号： H01L29/7869 , G02F1/134363 , G02F2001/134372 , G02F2001/136231 , H01L21/02565 , H01L21/02664 , H01L27/1203 , H01L27/1225
摘要： A method for fabricating array substrate, an array substrate and a display device. The method for fabricating the array substrate comprises forming a thin film transistor, a first transparent electrode (14) and a second transparent electrode (19), wherein a multi dimensional electric field is created by the first transparent electrode (17) and the second transparent electrode (19), wherein forming the first transparent electrode (17) comprises: forming a metal oxide film presenting semiconductor properties; forming the first transparent electrode (17) by subjecting a portion of the metal oxide film to metallization treatment, and forming a semiconductor active layer (141) from a portion which is not subjected to the metallization treatment.
摘要翻译：阵列基板，阵列基板和显示装置的制造方法。制造阵列基板的方法包括：形成薄膜晶体管，第一透明电极（14）和第二透明电极（19），其中由第一透明电极（17）和第二透明电极（17）产生多维电场电极（19），其中形成所述第一透明电极（17）包括：形成呈现半导体性质的金属氧化物膜; 通过对金属氧化物膜的一部分进行金属化处理来形成第一透明电极（17），以及从未进行金属化处理的部分形成半导体活性层（141）。

5. 发明公开

EP3622558A1 DISPLAY SUBSTRATE, DISPLAY APPARATUS, AND METHOD OF FABRICATING DISPLAY SUBSTRATE 审中-实审
公开(公告)号：EP3622558A1
公开(公告)日：2020-03-18
申请号：EP17885445.1
申请日：2017-11-02
申请人： BOE Technology Group Co., Ltd.
发明人： LIU, Fengjuan , SONG, Youngsuk
IPC分类号： H01L27/32 , H01L51/52 , H01L51/56

6. 发明授权

EP3089213B1 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE 有权
公开(公告)号：EP3089213B1
公开(公告)日：2019-08-28
申请号：EP14856805.8
申请日：2014-05-29
申请人： BOE Technology Group Co., Ltd.
发明人： KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol , CHOI, Seungjin
IPC分类号： H01L29/423 , H01L29/786 , H01L29/417 , H01L27/12 , H01L29/66

7. 发明授权

EP2876676B1 MANUFACTURING METHOD OF ARRAY SUBSTRATE AND ARRAY SUBSTRATE AND DISPLAY DEVICE 有权
公开(公告)号：EP2876676B1
公开(公告)日：2019-02-06
申请号：EP12861051.6
申请日：2012-12-13
申请人： BOE Technology Group Co., Ltd.
发明人： CHOI, Seungjin , KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol
IPC分类号： G02F1/1343 , H01L27/12 , G02F1/1362 , H01L21/02

8. 发明授权

EP3128553B1 METHOD FOR FABRICATION OF AN ARRAY SUBSTRATE 有权
公开(公告)号：EP3128553B1
公开(公告)日：2019-01-16
申请号：EP14861185.8
申请日：2014-07-11
申请人： BOE Technology Group Co., Ltd.
发明人： CHOI, Seungjin , KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol
IPC分类号： G02F1/1362 , H01L27/12 , G02F1/1343

9. 发明公开

EP3128553A1 ARRAY SUBSTRATE AND METHOD FOR FABRICATION AND DISPLAY DEVICE THEREOF 有权
标题翻译： ARRAYSUBSTRAT UND VERFAHREN ZUR HERSTELLUNG UND ANZEIGEVORRICHTUNGDAFÜR
公开(公告)号：EP3128553A1
公开(公告)日：2017-02-08
申请号：EP14861185.8
申请日：2014-07-11
申请人： BOE Technology Group Co., Ltd.
发明人： CHOI, Seungjin , KIM, Heecheol , SONG, Youngsuk , YOO, Seongyeol
IPC分类号： H01L27/12 , H01L21/77 , G02F1/1362
CPC分类号： G02F1/134309 , G02F1/133345 , G02F1/134363 , G02F1/13439 , G02F1/136227 , G02F1/136286 , G02F2001/134318 , G02F2001/134372 , G02F2001/136295 , G02F2201/121 , G02F2201/123 , H01L21/02244 , H01L21/02255 , H01L21/77 , H01L27/12 , H01L27/124 , H01L27/1259
摘要： The embodiments of the invention disclose an array substrate, a manufacturing method thereof and a display device. Due to the fact that the surfaces of a source electrode, a drain electrode and a data line which are arranged on the same layer are provided with an oxide film which is formed after annealing treatment is conducted on the source electrode, the drain electrode and the data line, in the process that the pattern of a pixel electrode is formed on the source electrode, the drain electrode and the data line by the adoption of a composition technology, the oxide film can protect the source electrode and the data line under the oxide film from being corroded by an etching agent when the pattern of the pixel electrode is formed by etching, and the display quality of a display panel will not be affected; meanwhile, a connecting portion enables the drain electrode to be electrically connected with the pixel electrode through a first via hole arranged over the drain electrode and penetrating through the oxide film, therefore the normal display function of the display panel can be ensured.
摘要翻译：本发明的实施例公开了阵列基板，其制造方法和显示装置。由于在同一层上设置的源电极，漏电极和数据线的表面设置有在退火处理后形成的氧化膜，在源电极，漏电极和在通过采用组合技术在源电极，漏电极和数据线上形成像素电极的图案的过程中，氧化膜可以保护源电极和氧化物下的数据线当通过蚀刻形成像素电极的图案时，由蚀刻剂腐蚀的膜不会影响显示面板的显示质量; 同时，连接部能够通过布置在漏极上的第一通孔使漏电极与像素电极电连接，贯通氧化膜，能够确保显示面板的正常显示功能。

10. 发明公开

EP2660651A1 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY DEVICE 有权
标题翻译： ARRAYSUBSTRAT，HERSTELLUNGSVERFAHRENDAFÜRUND ANZEIGEVORRICHTUNG
公开(公告)号：EP2660651A1
公开(公告)日：2013-11-06
申请号：EP12837626.6
申请日：2012-12-23
申请人： Boe Technology Group Co. Ltd.
发明人： SONG, Youngsuk , HUI, Guanbao , YOO, Seongyeol , CHOI, Seungjin , ZHANG, Feng
IPC分类号： G02F1/1362 , G02F1/1343 , G02F1/133
CPC分类号： H01L27/124 , G02F1/1343 , G02F1/1362 , G02F1/136209 , G02F2001/134318 , G02F2001/134372 , G02F2001/136222 , G02F2203/01 , G02F2203/02 , H01L27/1259
摘要： Embodiments of the invention relate to an array substrate, a manufacturing method thereof and a display device comprising the array substrate. The array substrate comprises a gate line and a data line which define a pixel region, the pixel region comprises a thin film transistor region and an electrode pattern region, a gate electrode, a gate insulation layer, an active layer, a source electrode, a drain electrode and a passivation layer are formed in the thin film transistor region, the gate insulation layer, a pixel electrode, the passivation layer and a common electrode are formed in the electrode pattern region, and the common electrode and the pixel electrode form a multi-dimensional electric field. A color resin layer is formed between the gate insulation layer and the pixel electrode.
摘要翻译：本发明的实施例涉及阵列基板，其制造方法和包括阵列基板的显示装置。阵列基板包括限定像素区域的栅极线和数据线，像素区域包括薄膜晶体管区域和电极图案区域，栅极电极，栅极绝缘层，有源层，源极电极，漏电极和钝化层形成在薄膜晶体管区域中，在电极图案区域中形成栅极绝缘层，像素电极，钝化层和公共电极，并且公共电极和像素电极形成多个维电场。在栅极绝缘层和像素电极之间形成着色树脂层。

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