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1. 发明公开

EP3279537A1 FLEXIBLE SEALING ELEMENT 审中-公开
标题翻译：柔性密封元件
公开(公告)号：EP3279537A1
公开(公告)日：2018-02-07
申请号：EP16182728.2
申请日：2016-08-04
申请人： Atotech Deutschland GmbH
发明人： Weinhold, Ray , Scheuerer, Michael , Rauenbusch, Ralph
IPC分类号： F16L5/10 , F16L5/02 , H05K3/00 , C25D17/00
CPC分类号： F16L5/10 , C25D17/004 , C25D17/02 , F16L5/025 , H05K3/007
摘要： The present invention refers to a sealing element (1) containing several fastening elements (8, 10) and at least one structural weakness (9, 12) to provide a flexible and reversible connection of a second device element (6) containing a pipe (7) and a first device element (4) containing an opening (5). Furthermore, the present invention refers to methods of connecting such first device element and second device element and uses of such sealing element. Additionally the present invention refers to modules and treatment devices containing such sealing element.
摘要翻译：本发明涉及包含多个紧固元件（8,10）和至少一个结构弱点（9,12）的密封元件（1），以提供包含管道的第二装置元件（6）的柔性且可逆连接 7）和包含开口（5）的第一装置元件（4）。此外，本发明涉及连接这种第一装置元件和第二装置元件的方法以及这种密封元件的使用。另外，本发明涉及包含这种密封元件的模块和处理装置。

2. 发明授权

EP3034657B1 SUBSTRATE HOLDER FOR VERTICAL GALVANIC METAL DEPOSITION 有权
公开(公告)号：EP3034657B1
公开(公告)日：2019-02-27
申请号：EP14199449.1
申请日：2014-12-19
申请人： Atotech Deutschland GmbH
发明人： Fendel, Arnulf , Rauenbusch, Ralph , Bussenius, Tobias
IPC分类号： H01L21/288 , H01L21/67 , H01L21/687 , C25D17/00 , C25D17/06

3. 发明授权

EP2746433B1 Device for vertical galvanic metal, preferably copper, deposition on a substrate and a container suitable for receiving such a device 有权
标题翻译：装置的金属，优选为铜，在基板上的垂直电镀沉积和用于接收这样的装置合适的容器
公开(公告)号：EP2746433B1
公开(公告)日：2016-07-20
申请号：EP12075143.3
申请日：2012-12-20
申请人： Atotech Deutschland GmbH
发明人： Rauenbusch, Ralph , Thomas, Christian , Weinhold, Ray , Klingl, Heinz
IPC分类号： C25D17/00 , C25D17/12 , H01L21/768 , C25D17/06 , C25D5/08
CPC分类号： C25D17/001 , C25D5/08 , C25D7/123 , C25D17/004 , C25D17/06 , C25D17/12

4. 发明公开

EP2746433A1 Device for vertical galvanic metal, preferably copper, deposition on a substrate and a container suitable for receiving such a device 有权
标题翻译：装置的金属，优选为铜，在基板上的垂直电镀沉积和用于接收这样的装置合适的容器
公开(公告)号：EP2746433A1
公开(公告)日：2014-06-25
申请号：EP12075143.3
申请日：2012-12-20
申请人： Atotech Deutschland GmbH
发明人： Rauenbusch, Ralph , Thomas, Christian , Weinhold, Ray , Klingl, Heinz
IPC分类号： C25D17/00 , C25D17/12 , H01L21/768 , C25D17/08
CPC分类号： C25D17/001 , C25D5/08 , C25D7/123 , C25D17/004 , C25D17/06 , C25D17/12
摘要： The present invention is related to a device for vertical galvanic metal, preferably copper, deposition on a substrate, a container suitable for receiving such a device and a substrate holder, which is suitable for receiving a substrate to be treated, and the use of such a device inside of such a container for electroplating. The device comprises a detachable anode having at least a though going conduit connected to a carrier elemet, a fastening means and an electrical connecting element, said fastening means and said electrical connecting element being arranged on the backside of the carrier element.
摘要翻译：本发明涉及一种用于垂直电镀金属，优选铜，沉积在基材，适合于接收搜索装置和衬底固定器的容器中，所有这些都适合于容纳一个基片被处理，并且使用搜索的设备容器搜索电镀的内部的装置。该装置包括具有至少连接到载体elemet，一个紧固装置和在电连接元件虽然打算导管的可拆卸的阳极，所述紧固装置和所述电连接元件被布置在所述载体元件的背面侧。

5. 发明公开

EP3034657A1 SUBSTRATE HOLDER FOR VERTICAL GALVANIC METAL DEPOSITION 有权
标题翻译： SUBSTRATHALTER ZUR VERTIKALEN GALVANISCHEN METALLABLAGERUNG
公开(公告)号：EP3034657A1
公开(公告)日：2016-06-22
申请号：EP14199449.1
申请日：2014-12-19
申请人： Atotech Deutschland GmbH
发明人： Fendel, Arnulf , Rauenbusch, Ralph , Bussenius, Tobias
IPC分类号： C25D17/00 , C25D17/06
CPC分类号： C25D17/06 , C25D17/001 , C25D17/004 , C25D17/005 , H01L21/2885 , H01L21/67126 , H01L21/68721 , H01L21/68757 , H01L21/68764
摘要： The present invention is related to a substrate holder for vertical galvanic metal, preferably copper, deposition on a substrate to be treated comprising a first substrate holder part and a second substrate holder part, wherein both substrate holder parts comprise an inner metal comprising part and an outer non-metallic part characterized in that the substrate holder further comprises
i) At least one hanging element in each substrate holder part for mechanically connecting the substrate holder to a treatment container,
ii) At least one first sealing element in each substrate holder part arranged between the substrate to be treated and the respective substrate holder part,
iii) At least one single second sealing element for the entire substrate holder arranged between the inner metal comprising part of the substrate holder and the outer non-metallic part of the substrate holder,
iv) At least one fastening system for detachably fastening both substrate holder parts to each other for holding the substrate to be treated,
v) At least one first contact element in each substrate holder part for forwarding current from an outer source through the hanging element to the at least second contact element, and
vi) At least one second contact element in each substrate holder part for forwarding current from the at least first contact element to the substrate to be treated.
摘要翻译：本发明涉及用于垂直电流金属的衬底保持器，优选铜，待处理衬底上的沉积，包括第一衬底保持器部分和第二衬底保持器部分，其中两个衬底保持器部件包括内部金属部分和外部非金属部件，其特征在于，所述基板支架还包括i）每个基板保持器部分中的至少一个悬挂元件，用于将所述基板保持器机械连接到处理容器，ii）每个基板保持器部分中的至少一个第一密封元件布置在待处理基板和相应的基板保持器部分之间，iii）至少一个用于整个基板保持器的单个第二密封元件，其布置在包括基板保持器的一部分的内部金属和基板保持器的外部非金属部分之间， iv）至少一个紧固系统，用于可拆卸地将两个基板保持器部分彼此固定以保持处理待处理的衬底，v）每个衬底保持器部分中的至少一个第一接触元件，用于将电流从外部源通过悬挂元件转移到至少第二接触元件，以及vi）每个中至少一个第二接触元件用于将电流从至少第一接触元件转移到待处理的衬底的衬底保持器部分。

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