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1. 发明公开

EP2213764A3 Sensor system for semiconductor manufacturing apparatus 有权
标题翻译：用于半导体制造装置的传感器系统
公开(公告)号：EP2213764A3
公开(公告)日：2012-11-14
申请号：EP10151935.3
申请日：2010-01-28
申请人： Applied Materials, Inc.
发明人： Schauer, Ronald Vern , Dascoli, Raphael , Bhargava, Shivan
IPC分类号： C23C14/50 , C23C16/458 , H01L21/00 , G05B23/02 , H01L21/68 , H01L21/683 , H01L21/67 , G01N21/21 , H01L21/311 , H01L21/687
CPC分类号： H01L21/67259 , C23C14/505 , G01P3/00 , G01P13/00 , G05B19/418 , G05B2219/45031 , H01L21/67115 , H01L21/681 , H01L21/6838 , H01L21/68764 , H01L21/68792
摘要： A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.

2. 发明授权

EP2213764B1 Sensor system for semiconductor manufacturing apparatus 有权
公开(公告)号：EP2213764B1
公开(公告)日：2019-07-03
申请号：EP10151935.3
申请日：2010-01-28
申请人： Applied Materials, Inc.
发明人： Schauer, Ronald Vern , Dascoli, Raphael , Bhargava, Shivan
IPC分类号： G01P13/00 , G05B19/418 , C23C14/50 , H01L21/67 , H01L21/68 , H01L21/687 , H01L21/683 , G01P3/00

3. 发明公开

EP2213764A2 Sensor system for semiconductor manufacturing apparatus 有权
标题翻译： Sensorsystemfüreine Halbleiterherstellungsvorrichtung
公开(公告)号：EP2213764A2
公开(公告)日：2010-08-04
申请号：EP10151935.3
申请日：2010-01-28
申请人： Applied Materials, Inc.
发明人： Schauer, Ronald Vern , Dascoli, Raphael , Bhargava, Shivan
IPC分类号： C23C14/50 , C23C16/458 , H01L21/00 , G05B23/02
CPC分类号： H01L21/67259 , C23C14/505 , G01P3/00 , G01P13/00 , G05B19/418 , G05B2219/45031 , H01L21/67115 , H01L21/681 , H01L21/6838 , H01L21/68764 , H01L21/68792
摘要： A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an illustrative embodiment, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In this and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.
摘要翻译：室监视系统可以包括其中单个传感器控制系统耦合到多个不同处理室控制板传感器线的并行结构。在说明性实施例中，诸如转速计的单个旋转传感器可以驻留在远离处理室的中央控制单元中，使得旋转数据可以由单个系统处理，然后根据各种不同的网络通信协议被路由到主系统控制器，工厂接口或两者兼容。在该实施例和其他实施例中，中央控制单元和室控制板中的上拉网络匹配，以便减少电信号异常，例如撬棍效应。中央控制单元可以经由主系统控制器来编程，以根据用户定义的参数进行操作，这进而可以使系统区分某些操作状态。

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