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    • 9. 发明公开
    • MIRROR SYSTEM FOR A PROJECTION APPARATUS
    • EP3978985A1
    • 2022-04-06
    • EP20199157.7
    • 2020-09-30
    • Imec VZW
    • SAITO, DaisukeROCHUS, Veronique
    • G02B26/08G03B21/00
    • The invention relates to a mirror system (10) for a projection apparatus (60), wherein the projection apparatus (60) comprises a light source (61) and an aperture (62), wherein the mirror system (10) comprises a support surface (11) and a plurality of mirrors (12) arranged on the support surface (11), wherein each of the plurality of mirrors (12) is arranged to be tiltable between a first and a second tilting position, wherein the first and the second tilting positions are discrete positions, wherein each mirror (12) in the first tilting position is arranged to reflect a light beam (63) that is emitted from the light source (61) towards the aperture (62), wherein each mirror (12) in the second tilting position is arranged to reflect the light beam (63) that is emitted from the light source (61) away from the aperture (62), and wherein at least some of the mirrors (12) that are arranged in the second tilting position form a blazed grating for the light beam (63), wherein the angle at which the light beam (63) is reflected off the at least some of the mirrors (12) in the second tilting position corresponds to a blaze angle of the blazed grating.