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1. 发明公开

EP1510870A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1510870A1
公开(公告)日：2005-03-02
申请号：EP04254910.5
申请日：2004-08-16
申请人： ASML Netherlands B.V.
发明人： Sengers, Timotheus Franciscus , van de Kerkhof, Marcus Adrianus , Kroon, Mark , van Weert, Kees
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70341 , G03F7/70483 , G03F7/707 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate (W), and a sensor (20) at substrate level comprising a radiation-receiving element, a transmissive plate supporting said radiation-receiving element, and a radiation-detecting means, wherein said sensor at substrate level is arranged to avoid loss of radiation between said radiation-receiving element (18) and the final element (40) of said radiation-detecting means.
摘要翻译：一种光刻设备，包括：配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束; 衬底台，构造成保持衬底; 被配置为将图案化的辐射束投影到衬底（W）的目标部分上的投影系统以及衬底级上的传感器（20），该传感器包括辐射接收元件，支撑所述辐射接收元件的透射板和辐射 - 检测装置，其中所述基底层上的传感器被设置为避免所述辐射接收元件（18）和所述辐射检测装置的最终元件（40）之间的辐射损失。

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